Browsing by Author "Roussel, Philippe"
- Results per page
- Sort Options
Publication 6Å EOT Si0.45Ge0.55 pMOSFET with optimized reliability (VDD=1V): Meeting the NBTI lifetime target at ultra-thin EOT
Proceedings paper2010, IEEE International Electron Devices Meeting - IEDM, 6/12/2010, p.70-73Publication A brief overview of gate oxide defect properties and their relation to MOSFET instabilities and device and circuit time-dependent variability
Journal article2018, Microelectronics Reliability, 81, p.186-194Publication A compact model for the grounded-gate nMOS behaviour under CDM ESD stress
Proceedings paper1996, Proceedings of 18th Annual Electrical Overstress/Electrostatic Discharge Symposium, 10/09/1996, p.302-315Publication A compact model for the grounded-gate nMOS transistor behaviour under CDM ESD stress
Journal article1998, Journal of Electrostatics, (42) 4, p.351-381Publication A compact NBTI model for accurate analog integrated circuit reliability simulation
Proceedings paper2011, European Solid State Device Research Conference - ESSDERC, 12/09/2011, p.147-150Publication A comprehensive LER-aware TDDB lifetime model for advanced Cu interconnects
Journal article2011, IEEE Transactions on Device and Materials Reliability, (11) 2, p.278-289Publication A consistent model for oxide trap profiling with the trap spectroscopy by charge injection and sensing (TSCIS) technique
;Cho, Moon Ju; ; ; ; Zahid, MohammedJournal article2010, Solid-State Electronics, (54) 11, p.1384-1391Publication A consistent model for the hard breakdown distribution including digital soft breakdown: the noble art of area scaling
Journal article2007, Microelectronic Engineering, (84) 9_10, p.1925-1925Publication A new analytic model for the description of the intrinsic oxide breakdown statistics of ultra-thin oxides
Journal article1996, Microelectronics and Reliability, 36, p.1639-1642Publication A new model for the field dependence of intrinsic and extrinsic time-dependent dielectric breakdown
Journal article1998, IEEE Trans. Electron Devices, (45) 2, p.472-481Publication A new physically-based model for temperature acceleration of time-to-breakdown
Oral presentation1998, 29th IEEE Semiconductor Interface Specialists Conference - SISC; 3-5 Dec. 1998; San Diego, CA, USA.Publication A new polarity dependence of the reduced trap generation during high-field degradation of nitrided oxides
Proceedings paper1996, International Electron Devices Meeting. Technical Digest - IEDM, 8/12/1996, p.327-330Publication A new quantitative model to predict SILC-related disturb characteristics in Flash E2PROM devices
Proceedings paper1996, International Electron Devices Meeting - IEDM, 8/12/1996, p.343-346Publication A new statistical model for fitting bimodal oxide breakdown distributions at different field conditions
Journal article1996, Microelectronics and Reliability, 36, p.1651-1654Publication A new TDDB reliability prediction methodology accounting for multiple SBD and wear out
Journal article2009, IEEE Transactions on Electron Devices, (56) 7, p.1424-1432Publication A physics-aware compact modeling framework for transistor aging in the entire bias space
Proceedings paper2019, IEEE International Electron Devices Meeting - IEDM, 7/12/2019, p.494-497Publication A pragmatic network-aware paradigm for system-level electromigration predictions at scale
Proceedings paper2023, 61st IEEE International Reliability Physics Symposium (IRPS), MAR 26-30, 2023Publication A statistical approach to microdose induced degradation in FinFET devices
Journal article2009, IEEE Transactions on Nuclear Science, (56) 6_1, p.3285-3292Publication Abrupt breakdown in dielectric/metal gate stacks: a potential reliability limitation?
Journal article2005, IEEE Electron Device Letters, (26) 10, p.773-775Publication Accelerated Capture and Emission (ACE) measurement pattern for efficient BTI characterization and modeling
; ; ; ;Rzepa, Gerhard; Proceedings paper2019, 2019 IRPS IEEE International Reliability Physics Symposium - IRPS, 31/03/2019, p.1-7