Browsing by Author "Sah, Kaushik"
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Publication Advanced PnR Logic Patterning Enabled by High-NA EUV Lithography
Proceedings paper2025, 2025 Conference on Optical and EUV Nanolithography, 2025-04-22, p.1342410-1Publication Connected component analysis of review-SEM images for sub-10nm node process verification
Proceedings paper2017, Metrology, Inspection, and Process Control for Microlithography XXXI, 25/02/2017, p.101451YPublication Deep learning-based defect detection using large FOV SEM for 28 nm pitch BEOL layer patterned with 0.33NA single exposure EUV
Proceedings paper2021, International Conference on Extreme Ultraviolet Lithography, SEP 27-OCT 01, 2021, p.118540YPublication Defect characterization of EUV Self-Aligned Litho-Etch Litho-Etch (SALELE) patterning scheme for advanced nodes
Proceedings paper2021, Metrology, Inspection, and Process Control for Microlithography XXXV, 22/02/2021, p.116112HPublication DSA materials contributions to the defectivity performance of the 14nm half-pitch LiNe flow @ imec
; ; Publication EUV based multi-patterning schemes for advanced DRAM nodes
Proceedings paper2022, Conference on Advances in Patterning Materials and Processes XXXIX Part of SPIE Advanced Lithography and Patterning Conference, APR 24-MAY 27, 2022, p.Art. 1205503Publication EUV reticle print verification with advanced broadband optical wafer inspection and e-beam review systems
Proceedings paper2017, Photomask Technology, 11/09/2017, p.104510LPublication EUV stochastic defect monitoring with advanced broadband optical wafer inspection and e-beam review systems
Proceedings paper2018, International Conference on Extreme Ultraviolet Lithography, 17/09/2018, p.1080909Publication High sensitivity repeater detection with broadband plasma optical wafer inspection for mask defect qualification
Publication Hotspot discovery and variability analysis for advanced EUV processes
Publication In-device high resolution and high throughput optical metrology for process development and monitoring
Proceedings paper2020, 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC), AUG 24-26, 2020Publication Influence of Wafer Topography on Focus Control and Defectivity in EUV Lithography
Publication Inspection challenges for triple patterning at sub-14 nm nodes with broadband plasma inspection platforms
Proceedings paper2015, 26th Annual SEMI Advanced Semiconductor Manufacturing Conference - ASMC, 3/05/2015, p.19-22Publication Massive metrology for process development and monitoring applications
Proceedings paper2020, Metrology, Inspection, and Process Control for Microlithography XXXIV, 23/03/2020, p.1132528Publication Process window discovery, expansion and control of design hotspots susceptible to overlay failures
Proceedings paper2017, 28th Annual SEMI Advanced Semiconductor Manufacturing Conference - ASMC, 15/05/2017Publication Pushing the Boundaries of random logic metal patterning with Low-n EUV Single Exposure
Proceedings paper2024, Optical and EUV Nanolithography XXXVII, 2024-02-26, p.129530XPublication Resolution improvement and dose reduction in logic and memory applications from low NA to high NA
Proceedings paper2025, 2025 Conference on Optical and EUV Nanolithography, 2025-04-22, p.1Publication Single Mask Solution to Pattern BLP and SNLP using 0.33NA EUV for Next Generation DRAM Manufacturing
; ; ; Kim, Ryan Ryoung hanProceedings paper2022, International Conference on Extreme Ultraviolet Lithography, SEP 26-29, 2022, p.Art. 122920WPublication stochastic defect monitoring with advanced broadband optical wafer inspection and e-Beam review systems
Proceedings paper2018, International Conference on Extreme Ultraviolet Lithography 2018, 17/09/2018, p.1080909Publication Wafer Edge Defectivity and Its Correlation to Process Parameters