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Browsing by Author "Yu, Hao"

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    1.5×10-9 Ω·cm² Contact Resistivity on Highly Doped Si:P Using Ge Pre-amorphization and Ti Silicidation

    Yu, Hao  
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    Schaekers, Marc  
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    Rosseel, Erik  
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    Peter, Antony  
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    Lee, Joon-Gon
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    Song, Woo-Bin
    Proceedings paper
    2015, IEEE International Electron Devices Meeting - IEDM, 7/12/2015, p.592-595
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    A defect characterization technique for the sidewall surface of Nano-ridge and Nanowire based Logic and RF technologies

    Hsu, B.
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    Syshchyk, O.
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    Vais, Abhitosh  
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    Yu, Hao  
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    Alian, AliReza  
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    Mols, Yves  
    Proceedings paper
    2021, IEEE International Reliability Physics Symposium (IRPS), MAR 21-24, 2021
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    A simplified method for (circular) transmission line model simulation and ultralow contact resistivity extraction

    Yu, Hao  
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    Schaekers, Marc  
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    Schram, Tom  
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    Collaert, Nadine  
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    De Meyer, Kristin  
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    Horiguchi, Naoto  
    Journal article
    2014, IEEE Electron Device Letters, (35) 9, p.957-959
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    A snapshot review on metal-semiconductor contact exploration for 7-nm CMOS technology and beyond

    Yu, Hao  
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    Schaekers, Marc  
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    Everaert, Jean-Luc
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    Horiguchi, Naoto  
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    De Meyer, Kristin  
    Journal article review
    2022-11-21, MRS ADVANCES, (7) 36, p.1369-1379
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    Advanced metal semiconductor contacts for 14nm CMOS technology and beyond

    Yu, Hao  
    PHD thesis
    2019-09
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    Advanced transistors for high frequency applications

    Parvais, Bertrand  
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    Peralagu, Uthayasankaran  
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    Alian, AliReza  
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    Vais, Abhitosh  
    Proceedings paper
    2020, 237th ECS Spring Meeting - Advanced CMOS-compatible Semiconductor Devices 19, 10/05/2020, p.27-38
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    Back Barrier Trapping Induced Resistance Dispersion in GaN HEMT: Mechanism, Modeling, and Solutions

    Yu, Hao  
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    Parvais, Bertrand  
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    Peralagu, Uthayasankaran  
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    ElKashlan, Rana Y.  
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    Rodriguez, Raul  
    Proceedings paper
    2022-12-01, International Electron Devices Meeting (IEDM), DEC 03-07, 2022
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    Beyond-Si materials and devices for more Moore and more than Moore applications

    Collaert, Nadine  
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    Alian, AliReza  
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    Arimura, Hiroaki  
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    Boccardi, Guillaume  
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    Eneman, Geert  
    Proceedings paper
    2016, International Conference on IC Design and Technology - ICICDT, 27/06/2016, p.1-5
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    Characterization of ultra-thin nickel-silicide films synthesized using the solid state reaction of Ni with an underlying Si:P substrate (P: 0.7 to 4.0%)

    Peter, Antony  
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    Yu, Hao  
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    Dutta, Shibesh
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    Rosseel, Erik  
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    Van Elshocht, Sven  
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    Paulussen, Kris  
    Journal article
    2016, Microelectronic Engineering, 157, p.52-59
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    Charge Trapping and Emission during Bias Temperature Stressing of Schottky Gate GaN-on-Silicon HEMT Structures Targeting RF/mm Wave Power Amplifiers

    O'Sullivan, Barry  
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    Rathi, Aarti  
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    Alian, Alireza
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    Yadav, Sachin  
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    Yu, Hao  
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    Sibaja-Hernandez, Arturo  
    Journal article
    2024, MICROMACHINES, (15) 8, p.Art. 951
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    Comprehensive study of Ga Activation in Si, SiGe and Ge and 5 x 10-10 $Xcm2 contact resistivity achieved on Ga doped Ge using nanosecond laser activation

    Wang, Linlin
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    Yu, Hao  
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    Schaekers, Marc  
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    Everaert, Jean-Luc
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    Franquet, Alexis  
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    Douhard, Bastien  
    Proceedings paper
    2017, IEEE International Electron Devices Meeting - IEDM, 2/12/2017, p.550-552
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    Contact resistivities of metal-insulator-semiconductor contacts and metal-semiconductor contacts

    Yu, Hao  
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    Schaekers, Marc  
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    Barla, Kathy  
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    Horiguchi, Naoto  
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    Collaert, Nadine  
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    Thean, Aaron  
    Journal article
    2016, Applied Physics Letters, (108) 17, p.171602
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    DC and RF Characterization of Nano-ridge HBT Technology Integrated on 300 mm Si Substrates

    Yadav, Sachin  
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    Vais, Abhitosh  
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    ElKashlan, Rana Y.  
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    Witters, Liesbeth  
    Proceedings paper
    2021, 15th European Microwave Integrated Circuits Conference (EuMIC) / 50th European Microwave Conference (EuMC), JAN 10-15, 2021, p.89-92
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    Deep-level transient spectroscopy of GaAs nanoridge diodes grown on Si substrates

    Syshchyk, Olga  
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    Hsu, Brent  
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    Yu, Hao  
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    Motsnyi, Vasyl  
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    Vais, Abhitosh  
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    Kunert, Bernardette  
    Journal article
    2020, Physical Review Applied, (14) 2, p.24093
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    Effective contact resistivity reduction for Mo/Pd/n-In0.53Ga0.47As contact

    Zhang, Jian  
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    Wang, Linlin
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    Yu, Hao  
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    Merckling, Clement  
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    Mols, Yves  
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    Vais, Abhitosh  
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    Ramesh, Siva  
    Journal article
    2019, IEEE Electron Device Letters, (40) 11, p.1800-1803
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    Electron traps at sidewalls of vertical n+-GaAs/n--InGaP/p+-GaAs diodes detected with deep-level transient spectroscopy

    Yu, Hao  
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    Hsu, Brent  
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    Vais, Abhitosh  
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    Simoen, Eddy  
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    Waldron, Niamh  
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    Collaert, Nadine  
    Proceedings paper
    2019-06, 2019 19th International Workshop on Junction Technology (IWJT), 6/06/2019
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    Epitaxial SiGe:B for advanced p-MOS contacts: low contact resistivities achieved by optimizing strain in SiGe and thermal treatments applied to contacts

    Huang, Yan-Hua
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    Porret, Clément  
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    Hikavyy, Andriy  
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    Rengo, Gianluca  
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    Yu, Hao  
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    Schaekers, Marc  
    Meeting abstract
    2019, 2019 EMRS fall meeting, 16/09/2019
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    ESD HBM Discharge Model in RF GaN-on-Si (MIS)HEMTs

    Wu, Wei-Min  
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    Chen, Shih-Hung  
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    Sibaja-Hernandez, Arturo  
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    Yadav, Sachin  
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    Peralagu, Uthayasankaran  
    Proceedings paper
    2021, IEEE International Electron Devices Meeting (IEDM), DEC 11-16, 2021
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    ESD HBM Discharge Model in RF GaN-on-Si (MIS)HEMTs

    Wu, Wei-Min  
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    Ker, Ming-Dou
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    Chen, Shih-Hung  
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    Sibaja-Hernandez, Arturo  
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    Yadav, Sachin  
    Journal article
    2022-01-25, IEEE TRANSACTIONS ON ELECTRON DEVICES, (69) 4, p.2180-2187
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    Fabrication challenges and opportunities for high-mobility materials: from CMOS applications to emerging derivative technologies

    Collaert, Nadine  
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    Alian, AliReza  
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    De Jaeger, Brice  
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    Peralagu, Uthayasankaran  
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    Vais, Abhitosh  
    Proceedings paper
    2019-03, Advanced Etch Technology for Nanopatterning VIII, 24/02/2019, p.1096305
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