Browsing by author "Ercken, Monique"
Now showing items 1-20 of 106
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157nm resist process performance and integration challenges on a full field scanner
Goethals, Mieke; Gronheid, Roel; List, Scott; Ercken, Monique; Van Roey, Frieda; Van Den Heuvel, Dieter; Locorotondo, Sabrina; Ronse, Kurt (2004) -
193-nm contact photoresist reflow feasibility study
Lucas, Kevin; Slezak, Mark; Ercken, Monique; Van Roey, Frieda (2001) -
21 nm Pitch dual-damascene BEOL process integration with full barrierless Ru metallization
Vega Gonzalez, Victor; Wilson, Chris; Paolillo, Sara; Decoster, Stefan; Mao, Ming; Versluijs, Janko; Blanco, Victor; Kesters, Els; Le, Quoc Toan; Lorant, Christophe; Varela Pedreira, Olalla; Lesniewska, Alicja; Heylen, Nancy; El-Mekki, Zaid; van der Veen, Marleen; Webers, Tomas; Vats, Hemant; Rynders, Luc; Cupak, Miroslav; Lee, Jae Uk; Drissi, Youssef; Halipre, Luc; Charley, Anne-Laure; Verdonck, Patrick; Witters, Thomas; Van Gompel, Sander; Kimura, Yosuke; Jourdan, Nicolas; Ciofi, Ivan; Contino, Antonino; Boccardi, Guillaume; Lariviere, Stephane; De Wachter, Bart; Vancoille, Eric; Lazzarino, Frederic; Ercken, Monique; Kim, Ryan Ryoung han; Trivkovic, Darko; Croes, Kristof; Leray, Philippe; Pardons, Katrien; Barla, Kathy; Tokei, Zsolt (2019) -
22nm node imaging and beyond: a comparison of EUV and ArFi double patterning
van Setten, Eelco; Mouraille, O.; Wittebrood, F.; Dusa, Mircea; van Ingen-Schenau, Koen; Finders, Jo; Feenstra, Kees; Bekaert, Joost; Laenens, Bart; Philipsen, Vicky; Ercken, Monique; Hendrickx, Eric; Vandenberghe, Geert (2010) -
22nm node imaging and beyond: When will EUV take over?
van Setten, Eelco; Mouraille, Orion; Wittebrood, Friso; Dusa, Mircea; van Ingen-Schenau, Koen; Finders, Jo; Feenstra, Kees; Bekaert, Joost; Laenens, Bart; Philipsen, Vicky; Ercken, Monique; Hendrickx, Eric; Vandenberghe, Geert (2010) -
A 0.314mm2 6T-SRAM cell built with tall triple-gate devices for 45nm node applications using 0.75NA 193nm lithography
Nackaerts, Axel; Ercken, Monique; Demuynck, Steven; Lauwers, Anne; Baerts, Christina; Bender, Hugo; Boullart, Werner; Collaert, Nadine; Degroote, Bart; Delvaux, Christie; de Marneffe, Jean-Francois; Dixit, Abhisek; De Meyer, Kristin; Hendrickx, Eric; Heylen, Nancy; Jaenen, Patrick; Laidler, David; Locorotondo, Sabrina; Maenhoudt, Mireille; Moelants, Myriam; Pollentier, Ivan; Ronse, Kurt; Rooyackers, Rita; Van Aelst, Joke; Vandenberghe, Geert; Vandervorst, Wilfried; Vandeweyer, Tom; Vanhaelemeersch, Serge; Van Hove, Marleen; Van Olmen, Jan; Verhaegen, Staf; Versluijs, Janko; Vrancken, Christa; Wiaux, Vincent; Jurczak, Gosia; Biesemans, Serge (2004-12) -
Advanced CD-SEM metrology to improve total process control performance for hyper-NA lithography
Osaki, Mayuka; Tanaka, Maki; Shishido, Chie; Ishimoto, Toru; Hasegawa, Norio; Sekiguchi, Kohei; Watanabe, Kenji; Cheng, Shaunee; Laidler, David; Ercken, Monique; Altamirano Sanchez, Efrain (2008) -
Application of immersion lithography inside the MEDEA+ LIQUID project
Massin, Jean; Kupers, Michiel; Thony, Philippe; Postnikov, Sergei; Ercken, Monique; Morton, Rob (2005) -
Applying design-based metrology for calibrating an OPC model for FinFET pattering
Vandeweyer, Tom; Lorusso, Gian; Delvaux, Christie; De Backer, Johan; Jandhyala, Radhika; Azordegan, Amir; Abott, Gordon; Kaliblotzky, Zeev; Ercken, Monique (2005) -
ArF lithography options for 100-nm technologies
Vandenberghe, Geert; Kim, Young-Chang; Delvaux, Christie; Lucas, Kevin; Choi, Sang-Jun; Ercken, Monique; Ronse, Kurt; Vleeming, Bert (2001) -
ArF lithography options for 100nm technologies
Vandenberghe, Geert; Kim, Young-Chang; Delvaux, Christie; Lucas, Kevin; Choi, Sang-Jun; Ercken, Monique; Ronse, Kurt; Vleeming, Bert (2001) -
Challenges and opportunities of vertical FET devices using 3D circuit design layouts
Veloso, Anabela; Huynh Bao, Trong; Rosseel, Erik; Paraschiv, Vasile; Devriendt, Katia; Vecchio, Emma; Delvaux, Christie; Chan, BT; Ercken, Monique; Tao, Zheng; Li, Waikin; Altamirano Sanchez, Efrain; Versluijs, Janko; Brus, Stephan; Matagne, Philippe; Waldron, Niamh; Ryckaert, Julien; Mocuta, Dan; Collaert, Nadine (2016) -
Challenges building a 22nm node 6T-SRAM cell using immersion lithography
Ercken, Monique; Altamirano Sanchez, Efrain; Baerts, Christina; Brus, Stephan; De Backer, Johan; Demand, Marc; Delvaux, Christie; Horiguchi, Naoto; Locorotondo, Sabrina; Vandeweyer, Tom; Veloso, Anabela; Verhaegen, Staf (2009) -
Challenges in patterning 45nm node multiple-gate devices and SRAM cells
Ercken, Monique; Delvaux, Christie; Baerts, Christina; Locorotondo, Sabrina; Degroote, Bart; Wiaux, Vincent; Nackaerts, Axel; Rooyackers, Rita; Verhaegen, Staf; Pollentier, Ivan (2004) -
Challenges in setting up the patterning processes for a 16nm node SRAM cell
Ercken, Monique; Vandeweyer, Tom; Versluijs, Janko; Truffert, Vincent; De Backer, Johan; Delvaux, Christie; Baerts, Christina (2010) -
Challenges in using optical lithography for the building of a 22 nm node 6T=-SRAM cell
Ercken, Monique; Altamirano Sanchez, Efrain; Baerts, Christina; Brus, Stephan; De Backer, Johan; Delvaux, Christie; Demand, Marc; Horiguchi, Naoto; Locorotondo, Sabrina; Vandeweyer, Tom; Veloso, Anabela; Verhaegen, Staf (2010) -
CMOS integration of high-k/metal gate transistors in diffusion and gate replacement (D&GR) scheme for dynamic random access memory peripheral circuits
Dentoni Litta, Eugenio; Ritzenthaler, Romain; Schram, Tom; Spessot, Alessio; O'Sullivan, Barry; Machkaoutsan, Vladimir; Fazan, Pierre; Ji, Yunhyuck; Mannaert, Geert; Lorant, Christophe; Sebaai, Farid; Thiam, Arame; Ercken, Monique; Demuynck, Steven; Horiguchi, Naoto (2018) -
CMOS integration of thermally stable diffusion and gate replacement (D&GR) high-k/metal gate stacks in DRAM periphery transistors
Dentoni Litta, Eugenio; Ritzenthaler, Romain; Schram, Tom; Spessot, Alessio; O'Sullivan, Barry; Ji, Yunhyuck; Mannaert, Geert; Lorant, Christophe; Sebaai, Farid; Thiam, Arame; Ercken, Monique; Demuynck, Steven; Horiguchi, Naoto (2017) -
CMOS patterning over high aspect ratio topographies for N10/N7 using spin-on carbon hardmasks
Hopf, Toby; Ercken, Monique; Mannaert, Geert; Kunnen, Eddy; Tao, Zheng; Vandenbroeck, Nadia; Sebaai, Farid; Kikuchi, Yoshiaki; Mertens, Hans; Kubicek, Stefan; Demuynck, Steven; Horiguchi, Naoto (2017) -
CMOS patterning over high-aspect ratio topographies for N10/N7 using spin-on carbon hardmasks
Hopf, Toby; Ercken, Monique; Mannaert, Geert; Kunnen, Eddy; Tao, Zheng; Vandenbroeck, Nadia; Sebaai, Farid; Kikuchi, Yoshiaki; Mertens, Hans; Kubicek, Stefan; Demuynck, Steven; Horiguchi, Naoto (2017)