Browsing by author "Rutigliani, Vito"
Now showing items 1-16 of 16
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Computational nanometrology of line-edge roughness: noise effectd, cross-line correlations and the role of etch transfer
Constantoudis, Vassilios; Papavieros, George; Lorusso, Gian; Rutigliani, Vito; Van Roey, Frieda; Gogolides, Evangelos (2018) -
Cryogenic etching vs P4 approaches: paths towards ultra-low damage integration of mesoporous oxide dielectric materials
de Marneffe, Jean-Francois; Zhang, Liping; Heyne, Markus; Krishtab, Mikhail; Goodyear, Andy; Cooke, Mike; Heylen, Nancy; Ciofi, Ivan; Wen, Liang Gong; Wilson, Chris; Rutigliani, Vito; Decoster, Stefan; Savage, Travis; Matsunaga, Koichi; Nafus, Kathleen; Boemmels, Juergen; Tokei, Zsolt; Baklanov, Mikhaïl (2014) -
Deep learning nanometrology of line edge roughness
Giannatou, Eva; Constantoudis, Vassilios; Papavieros, George; Papageorgiou, Harris; Rutigliani, Vito; Lorusso, Gian; Van Roey, Frieda; Gogolides, Evangelos (2019) -
EUV photoresist patterning characterization for imec N7/N5 technology
De Simone, Danilo; Rutigliani, Vito; Lorusso, Gian; De Bisschop, Peter; Vesters, Yannick; Blanco, Victor; Vandenberghe, Geert (2018) -
Exploration of a low-temperature PEALD technology to trim and smooth 193i photoresist
Lazzarino, Frederic; Paolillo, Sara; Antony, Peter; De Roest, David; Seong, TaeGeun; Wu, Yizhi; Decoster, Stefan; Rutigliani, Vito; Lorusso, Gian; Constantoudis, Vassilios; Van Elshocht, Sven; Piumi, Daniele; Barla, Kathy (2017) -
High thermal stability and high VUV absorption polymer for the P4/pore stuffing approach
Rutigliani, Vito; Zhang, Liping; de Marneffe, Jean-Francois; Cao, Yi; Noya, G.; Baklanov, Mikhaïl (2015) -
Multifractal analysis of line-edge roughness
Costantoudis, Vassilios; Papaverios, George; Lorusso, Gian; Rutigliani, Vito; Van Roey, Frieda; Gogolides, Evangelos (2018) -
Need for LWR metrology standardization: the imec roughness protocol
Lorusso, Gian; Sutani, Takeyoshi; Rutigliani, Vito; Van Roey, Frieda; Moussa, Alan; Charley, Anne-Laure; Mack, Chris; Naulleau, Patrick; Perera, Chami; Constantoudis, Vassilios; Ikota, Masami; Ishimoto, Toru; Koshihara, Shunshuke (2018) -
Optimized pore stuffing for enhanced compatibility with interconnect integration flow
de Marneffe, Jean-Francois; Zhang, Liping; Rutigliani, Vito; Noya, G.; Cao, Yi; Lesniewska, Alicja; Varela Pedreira, Olalla; Croes, Kristof; Gillot, Christophe; Tokei, Zsolt; Boemmels, Juergen; Baklanov, Mikhaïl (2015) -
Roughness decomposition: an on-wafer methodology to discriminate mask, metrology, and shot noise contributions
Lorusso, Gian; Rispens, Gijsbert; Rutigliani, Vito; Van Roey, Frieda; Frommhold, Andreas; Schiffelers, Guido (2019) -
Setting up a proper power spectral density (PSD) and autocorrelation analysis for material and process characterization
Rutigliani, Vito; Lorusso, Gian; De Simone, Danilo; Lazzarino, Frederic; Rispens, Gijsbert; Papavieros, George; Gogolides, Evangelos; Costantoudis, Vassilios; Mack, Chris (2018) -
The need for LWR metrology standardization: the imec roughness protocol
Lorusso, Gian; Sutani, Takeyoshi; Rutigliani, Vito; Van Roey, Frieda; Moussa, Alain; Charley, Anne-Laure; Mack, Chris; Naulleau, Patrick; Constantoudis, Vassilios; Ikota, Masami; Ishimoto, Toru; Koshihara, S (2018) -
Unbiased roughness measurements: subtracting out SEM effects
Lorusso, Gian; Rutigliani, Vito; Van Roey, Frieda; Mack, Chris (2017) -
Unbiased roughness measurements: Subtracting out SEM effects
Lorusso, Gian; Rutigliani, Vito; Van Roey, Frieda; Mack, Chris (2018) -
Unbiased roughness measurements: Subtracting out SEM effects, Part 2
Lorusso, Gian; Rutigliani, Vito; Van Roey, Frieda; Mack, Chris (2018) -
Vacuum ultra-violet damage and damage mitigation for plasma processing of highly porous organosilicate glass dielectrics
de Marneffe, Jean-Francois; Zhang, Liping; Heyne, Markus; Lukaszewicz, Mikolasj; Porter, Stephen Barry; Vajda, Felim; Rutigliani, Vito; Krishtab, Mikhail; Goodyear, Andy; Cooke, Mike; Verdonck, Patrick; Baklanov, Mikhaïl (2015)