Browsing by author "Hooker, Jacob"
Now showing items 1-20 of 28
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45nm nMOSFET with metal gate on thin SiON driving 1150μA/μm and off-state of 10nA/μm
Henson, Kirklen; Lander, Rob; Demand, Marc; Dachs, Charles; Kaczer, Ben; Deweerd, Wim; Schram, Tom; Tokei, Zsolt; Hooker, Jacob; Cubaynes, Florence; Beckx, Stephan; Boullart, Werner; Coenegrachts, Bart; Vertommen, Johan; Richard, Olivier; Bender, Hugo; Vandervorst, Wilfried; Kaiser, M.; Everaert, Jean-Luc; Jurczak, Gosia; Biesemans, Serge (2004) -
A practical baseline process for advanced CMOS devices research
Ponomarev, Youri; Loo, Josine; Rittersma, Chris; Lander, Rob; Hooker, Jacob; Doornbos, Gerben; Surdeanu, Radu; Cubaynes, Florence; Dachs, Charles; Kubicek, Stefan; Henson, Kirklen; Lindsay, Richard (2003) -
ALD deposition of high-k and metal gate stacks for advanced CMOS applications
Heyns, Marc; Beckx, Stephan; Caymax, Matty; Claes, Martine; De Gendt, Stefan; Degraeve, Robin; Delabie, Annelies; Deweerd, Wim; Groeseneken, Guido; Hooker, Jacob; Houssa, Michel; Kwak, Dong Hwa; Lander, Rob; Lujan, Guilherme; Maes, Jan; Niwa, Masaaki; Pantisano, Luigi; Puurunen, R.; Ragnarsson, Lars-Ake; Rohr, Erika; Schram, Tom; Van Elshocht, Sven; Vandervorst, Wilfried (2004) -
Complex admittance analysis for La2Hf2O7/SiO2 high-kappa dielectric stacks
Apostolopoulos, G.; Vellianitis, G.; dimoulas, A.; Hooker, Jacob; Conard, Thierry (2004-01) -
Device and circuit-level analog performance trade-offs: a comparative study of planar bulk FETs versus FinFETs
Subramanian, Vaidy; Parvais, Bertrand; Borremans, Jonathan; Mercha, Abdelkarim; Linten, Dimitri; Wambacq, Piet; Loo, Josine; Dehan, Morin; Collaert, Nadine; Kubicek, Stefan; Lander, Rob; Hooker, Jacob; Cubaynes, Florence; Donnay, Stephane; Jurczak, Gosia; Groeseneken, Guido; Sansen, Willy; Decoutere, Stefaan (2005) -
Effect of degas before metal gate deposition on the threshold voltage
Petry, Jasmine; Xiong, K.; Ragnarsson, Lars-Ake; Singanamalla, Raghunath; Hooker, Jacob (2007) -
Electrical and physical characterization of MOSFETs with MBE grown La2HfO7 and HfO2 high-k dielectrics integrated in a conventional flow
Conard, Thierry; Pantisano, Luigi; Claes, Martine; Demand, Marc; Deweerd, Wim; De Gendt, Stefan; Houssa, Michel; Lujan, Guilherme; Ragnarsson, Lars-Ake; Rohr, Erika; Schram, Tom; Hooker, Jacob; Rittersma, Chris; Fompeyrinne, J.; Loquet, J.P. (2005) -
Impact of ALCVD and PVD titanium nitride deposition on metal gate capacitors
Lujan, Guilherme; Schram, Tom; Pantisano, Luigi; Hooker, Jacob; Kubicek, Stefan; Röhr, Erika; Schuhmacher, Jörg; Kilpela, Olli; Sprey, Hessel; De Gendt, Stefan; De Meyer, Kristin (2002) -
Influence of metal capping layer on the work function of Mo gated metal-oxide semiconductor stacks
Li, Zilan; Schram, Tom; Stesmans, Andre; Franquet, Alexis; Witters, Thomas; Pantisano, Luigi; Yamada, Naoki; Tsunoda, Takaaki; Hooker, Jacob; De Gendt, Stefan; De Meyer, Kristin (2008) -
Investigation on molybdenum and its conductive oxides as p-type metal gate candidates
Li, Zilan; Schram, Tom; Witters, Thomas; Cho, Hag-Ju; O'Sullivan, Barry; Yamada, Naoki; Tsunoda, Takaaki; Hooker, Jacob; De Gendt, Stefan; De Meyer, Kristin (2008) -
Investigation on molybdenum and its conductive oxides as p-type metal gate candidates
Li, Zilan; Schram, Tom; Witters, Thomas; Cho, Hag-Ju; O'Sullivan, Barry; Hooker, Jacob; De Gendt, Stefan; De Meyer, Kristin (2007) -
Low VT CMOS using doped Hf-based oxides, TaC-based metals and laser-only anneal
Kubicek, Stefan; Schram, Tom; Paraschiv, Vasile; Vos, Rita; Demand, Marc; Adelmann, Christoph; Witters, Thomas; Nyns, Laura; Ragnarsson, Lars-Ake; Yu, HongYu; Veloso, Anabela; Singanamalla, Raghunath; Kauerauf, Thomas; Rohr, Erika; Brus, Stephan; Vrancken, Christa; Chang, Vincent; Mitsuhashi, Riichirou; Akheyar, Amal; Cho, Hag-Ju; Hooker, Jacob; O'Sullivan, Barry; Chiarella, Thomas; Kerner, Christoph; Delabie, Annelies; Van Elshocht, Sven; De Meyer, Kristin; De Gendt, Stefan; Absil, Philippe; Hoffmann, Thomas Y.; Biesemans, Serge (2007) -
Materials and electrical characterization of metal gate electrodes on high-k dielectrics for advanced CMOS technologies
Hooker, Jacob; Lander, Rob; Rittersma, Chris; Schram, Tom; Lujan, Guilherme; van Zijl, Jeroen; van den Heuvel, Eric; Roozeboom, Fred (2002) -
MBE lanthanum-based high-k gate dielectrics as candidates for SiO2 gate oxide replacement
Vellianitis, G.; Apostolopoulos, G.; Mavrou, G.; Argyropoulos, K.; dimoulas, A.; Hooker, Jacob; Conard, Thierry; Butcher, M. (2004-06) -
Metal inserted poly-Si (MIPS) and FUSI dual metal (TaN and NiSi) CMOS integration
Singanamalla, Raghunath; Van Dal, Mark; Demand, Marc; Shamiryan, Denis; Beckx, Stephan; Jaenen, Patrick; Locorotondo, Sabrina; Yu, HongYu; Hooker, Jacob; Kubicek, Stefan; De Meyer, Kristin; Biesemans, Serge; Juffermans, Casper; Lander, Rob (2007-04) -
Molecular beam epitaxy for advanced gate stack materials and processes
Locquet, Jean-Pierre; Marchiori, Chiara; Sousa, M.; Siegwart, H.; Caimi, D.; Fompeyrine, Jean; Pantisano, Luigi; Claes, Martine; Conard, Thierry; Demand, Marc; Deweerd, Wim; De Gendt, Stefan; Heyns, Marc; Houssa, Michel; Aoulaiche, Marc; Lujan, Guilherme; Ragnarsson, Lars-Ake; Rohr, Erika; Schram, Tom; Hooker, Jacob; Rittersma, Chris; Furukawa, Yukiko; Seo, J.W.; dimoulas, A. (2005) -
MOSFET with La2HfO7 and HfO2 high-k dielectrics integrated in a conventional flow
Pantisano, Luigi; Conard, Thierry; Claes, Martine; Demand, Marc; Deweerd, Wim; De Gendt, Stefan; Heyns, Marc; Houssa, Michel; Aoulaiche, Marc; Lujan, Guilherme; Ragnarsson, Lars-Ake; Rohr, Erika; Schram, Tom; Hooker, Jacob; Rittersma, Chris; Fompereyne, Jean; Locquet, Jean-Pierre; dimoulas, A. (2005) -
N-type VT tuning by Te ion implantation in moly-based metal gates with high-k dielectric for fully depleted devices
Petry, Jasmine; Boccardi, Guillaume; Xiong, K.; Mueller, Markus; Hooker, Jacob; Singanamalla, Raghunath; Collaert, Nadine; De Meyer, Kristin (2008) -
NMOS and PMOS triple gate devices with mid-gap metal gate on oxynitride and Hf based gate dielectrics
Henson, Kirklen; Collaert, Nadine; Demand, Marc; Goodwin, Michael; Brus, Stephan; Rooyackers, Rita; Van Ammel, Annemie; Degroote, Bart; Ercken, Monique; Baerts, Christina; Kottantharayil, Anil; Dixit, Abhisek; Beckx, Stephan; Schram, Tom; Deweerd, Wim; Boullart, Werner; Schaekers, Marc; De Gendt, Stefan; De Meyer, Kristin; Yim, Yong Sik; Hooker, Jacob; Jurczak, Gosia; Biesemans, Serge (2005) -
Performance and leakage optimization in carbon and fluorine C0-implanted pMOSFETs
Pawlak, Bartek; Duffy, Ray; Hooker, Jacob; Hoffmann, Thomas; Felch, S.B.; Eyben, Pierre; Absil, Philippe; Lander, Rob (2008)