Browsing by author "Pollentier, Ivan"

248nm and 193nm lithography for damascene patterning

Maenhoudt, Mireille; Pollentier, Ivan; Wiaux, Vincent; Vangoidsenhoven, Diziana; Ronse, Kurt (2001)

A 0.314mm2 6T-SRAM cell built with tall triple-gate devices for 45nm node applications using 0.75NA 193nm lithography

Nackaerts, Axel; Ercken, Monique; Demuynck, Steven; Lauwers, Anne; Baerts, Christina; Bender, Hugo; Boullart, Werner; Collaert, Nadine; Degroote, Bart; Delvaux, Christie; de Marneffe, Jean-Francois; Dixit, Abhisek; De Meyer, Kristin; Hendrickx, Eric; Heylen, Nancy; Jaenen, Patrick; Laidler, David; Locorotondo, Sabrina; Maenhoudt, Mireille; Moelants, Myriam; Pollentier, Ivan; Ronse, Kurt; Rooyackers, Rita; Van Aelst, Joke; Vandenberghe, Geert; Vandervorst, Wilfried; Vandeweyer, Tom; Vanhaelemeersch, Serge; Van Hove, Marleen; Van Olmen, Jan; Verhaegen, Staf; Versluijs, Janko; Vrancken, Christa; Wiaux, Vincent; Jurczak, Gosia; Biesemans, Serge (2004-12)

A scientific framework for establishing ultrafast molecular dynamic research in imec's AttoLab

Galleni, Laura; Sajjadian, Faegheh; Conard, Thierry; Pollentier, Ivan; Dorney, Kevin; Holzmeier, Fabian; Witting Larsen, Esben; Escudero, Daniel; Pourtois, Geoffrey; van Setten, Michiel; van der Heide, Paul; Petersen, John (2023)

Addressing the challenges of Directed Self Assembly implementation

Gronheid, Roel; Pollentier, Ivan; Younkin, Todd; Somervell, Mark; Nafus, Kathleen; Hooge, Josh; Rathsack, Ben; Scheer, Steven; Rincon Delgadillo, Paulina; Nealy, Paul (2011)

Assessment of challenges in EUV resist outgassing and contamination characterization

Pollentier, Ivan; Lokasani, Ragava; Gronheid, Roel (2012)

Assessment of resist outgassing related EUV optics contamination for CAR and non-CAR material chemistries

Pollentier, Ivan; Neira, Imanol; Gronheid, Roel (2011)

Carbon nanotube EUV pellicle tunability and performance in a scanner-like environment

Timmermans, Marina; Pollentier, Ivan; Korytov, Maxim; Nuytten, Thomas; Sergeant, Stefanie; Conard, Thierry; Meersschaut, Johan; Zhang, Yide; Dialameh, Masoud; Alaerts, Wilfried; Jazaeri, Ehsan; Spampinato, Valentina; Franquet, Alexis; Brems, Steven; Huyghebaert, Cedric; Gallagher, Emily (2021)

Carbon nanotube pellicles: imaging results of the first full-field extreme ultraviolet exposures

Bekaert, Joost; Gallagher, Emily; Jonckheere, Rik; Van Look, Lieve; Aubert, Remko; Klein, Alexander; Yegen, Gokay; Broman, Par; Nair, Vineet Vijayakrishnan; Timmermans, Marina; Pollentier, Ivan; Hendrickx, Eric (2021-05-27)

Chain scission resists for extreme ultraviolet lithography based on high performance polysulfone-containing polymers

Lawrie, Kirsten J.; Blakey, Idriss; Blinco, James P.; Cheng, Han Hao; Gronheid, Roel; Jack, Kevin S.; Pollentier, Ivan; Leeson, Michael J.; Younkin, Todd; Whittaker, Andrew K. (2011)

Challenges in patterning 45nm node multiple-gate devices and SRAM cells

Ercken, Monique; Delvaux, Christie; Baerts, Christina; Locorotondo, Sabrina; Degroote, Bart; Wiaux, Vincent; Nackaerts, Axel; Rooyackers, Rita; Verhaegen, Staf; Pollentier, Ivan (2004)

Challenges in scaling of CMOS devices towards 65nm node

Jurczak, Gosia; Veloso, Anabela; Rooyackers, Rita; Augendre, Emmanuel; Mertens, Sofie; Rothschild, Aude; Schaekers, Marc; Lindsay, Richard; Lauwers, Anne; Henson, Kirklen; Severi, Simone; Pollentier, Ivan; De Keersgieter, An (2003-06)

Characterisation of EUV resist related outgassing and contamination

Pollentier, Ivan; Berger, Margaux; Goethals, Mieke; Gronheid, Roel; Leeson, Michael (2009)

Characterization of EUV optics contamination due to photoresist related outgassing

Pollentier, Ivan; Goethals, Mieke; Gronheid, Roel; Steinhoff, J.; Van Dijk, J. (2010)

Characterization of integrated optical CD for process control

Yu, J.; Uchida, J.; Van Dommelen, Y.; Carpaij, R.; Cheng, Shaunee; Pollentier, Ivan; Viswanathan, A.; Lane, L.; Barry, K.; Jakatdar, N. (2004)

Characterization of overlay mark fidelity

Adel, M.; Ghinovker, M.; Poplawski, J.M.; Kassel, E.; Izikson, P.; Pollentier, Ivan; Leray, Philippe; Laidler, David (2003)

Characterization of pellicle membranes by lab-based spectroscopic reflectance and transmittance measurements in the extreme ultraviolet

Bahrenberg, Lukas; Danylyuk, Serhiy; Brose, Sascha; Pollentier, Ivan; Timmermans, Marina; Gallagher, Emily; Stollenwerk, Jochen; Loosen, Peter (2017)

CNT EUV pellicle tunability and performance in a scanner-like environment

Timmermans, Marina; Pollentier, Ivan; Korytov, Maxim; Nuytten, Thomas; Sergeant, Stefanie; Conard, Thierry; Meersschaut, Johan; Zhang, Yide; Dialameh, Masoud; Alaerts, Wilfried; Jazaeri, Ehsan; Spampinato, Valentina; Franquet, Alexis; Brems, Steven; Huyghebaert, Cedric; Gallagher, Emily (2021)