Browsing by author "Xu, Zhen"
Now showing items 1-14 of 14
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A study of relaxation current in high-k gate stacks
Xu, Zhen; Pantisano, Luigi; Kerber, Andreas; Degraeve, Robin; Cartier, Eduard; De Gendt, Stefan; Heyns, Marc; Groeseneken, Guido (2004-03) -
Charge trapping in metal-ferroelectric-insulator-semiconductor structure with SrBi2Ta2O9/Al2O3/SiO2 stack
Xu, Zhen; Kaczer, Ben; Johnson, Jo; Wouters, Dirk; Groeseneken, Guido (2004-08) -
Constant voltage stress induced degradation in HfO2/SiO2 gate dielectric stacks
Xu, Zhen; Houssa, Michel; Carter, Richard; Naili, Mohamed; De Gendt, Stefan; Heyns, Marc (2002) -
Deposition of 60nm thin Sr0.8Bi2.2Ta2O9 layers for application in scaled 1T1C and 1T FeRAM devices
Goux, Ludovic; Xu, Zhen; Kaczer, Ben; Groeseneken, Guido; Wouters, Dirk (2005-06) -
Electrical properties of Al2O3/ZrO2/Al2O3 gate stack in p-substrate metal oxide semiconductor devices
Xu, Zhen; Kaczer, Ben; Degraeve, Robin; De Gendt, Stefan; Heyns, Marc; Groeseneken, Guido (2003) -
HfO2 and HfSixOyNz high-k layers deposited by MOCVD in mixed gas flows of N2O and O2
Zhao, Chao; Van Elshocht, Sven; Conard, Thierry; Xu, Zhen; Richard, Olivier; Caymax, Matty; De Gendt, Stefan; Heyns, Marc (2004) -
HfONx high-k layers deposited by MOCVD in mixed gas flows of N2O and O2
Zhao, Chao; Van Elshocht, Sven; Conard, Thierry; Xu, Zhen; Caymax, Matty; De Gendt, Stefan; Heyns, Marc (2003) -
Influence of top electrode deposition conditions on the reliability of integrated SBT ferroelectric capacitors
Goux, Ludovic; Xu, Zhen; Paraschiv, Vasile; Schwitters, M.; Lisoni, Judit; Maes, David; Haspeslagh, Luc; Groeseneken, Guido; Zambrano, R.; Wouters, Dirk (2004) -
Issues, achievements and challenges towards intergration of high-k dielectrics
Heyns, Marc; Bender, Hugo; Caymax, Matty; Carter, R; Claes, Martine; Conard, Thierry; Boullart, Werner; De Gendt, Stefan; Degraeve, Robin; Deweerd, Wim; Groeseneken, Guido; Houssa, Michel; Kubicek, Stefan; Lujan, Guilherme; Nohira, H.; Pantisano, Luigi; Petry, Jasmine; Röhr, Erika; Vandervorst, Wilfried; Van Elshocht, Sven; Xu, Zhen; Zhao, Chao; Cartier, E.; Chen, J.; Cosnier, V.; Green, M.; Jang, S.E.; Kaushik, Vidya; Kerber, A.; Kluth, J.; Lin, S.; Tsai, Wilman; Young, Edward; Manabe, Y. (2002) -
Optimization of the ferroelectric film for application in scaled FeFET
Viapiana, Matteo; Xu, Zhen; Goux, Ludovic; Kaczer, Ben; Groeseneken, Guido; Wouters, Dirk (2004) -
Polarity effect on the temperature dependence of leakage current through HfO2/SiO2 gate dielectric stacks
Xu, Zhen; Houssa, Michel; De Gendt, Stefan; Heyns, Marc (2002) -
Selection of ferroelectric/high-k gate stack combination for optimized FeFET performance
Xu, Zhen; Viapiana, Matteo; Kaczer, Ben; Goux, Ludovic; Groeseneken, Guido; Wouters, Dirk (2004) -
Thermal stability and scalability of zr-aluminate-based high-k gate stacks
Chen, Jerry; Cartier, Eduard; Carter, Richard; Kauerauf, Thomas; Zhao, Chao; Pétry, Jasmine; Cosnier, Vincent; Xu, Zhen; Kerber, Andreas; Tsai, Wilman; Young, Edward; Kubicek, Stefan; Caymax, Matty; Vandervorst, Wilfried; De Gendt, Stefan; Heyns, Marc; Copel, M.; Besling, Wim; Bajolet, Philippe; Maes, Jan (2002)