Browsing by author "El Otell, Ziad"
Now showing items 1-20 of 28
-
Advanced etching for nanodevices and 2D materials
de Marneffe, Jean-Francois; Cooke, Mike; Goodyear, Andy; Braithwaite, Nicolas; Sutton, Yvonne; Bowden, Mark; Altamirano Sanchez, Efrain; Zotovich, Alexey; El Otell, Ziad; Chan, BT; Knoll, Armin; Rawlings, Colin; Duerig, Urs; Spiesser, Martin; Kaestner, Marcus; Neuber, Christian; Rangelow, Ivo (2016) -
Ar and H2 plasma and neutral/ion beam treatment of EUV resist
De Schepper, Peter; Marinov, Daniil; El Otell, Ziad; Altamirano Sanchez, Efrain; de Marneffe, Jean-Francois; De Gendt, Stefan; Braithwaite, Nicholas St. J. (2015-03) -
Challenges for line width / line edge roughness (LWR/lER) improvement in Directed Self-Assembly (DSA) advanced patterning
Chan, BT; Pathangi Sriraman, Hari; Singh, Arjun; El Otell, Ziad; Gronheid, Roel; de Marneffe, Jean-Francois; Piumi, Daniele (2015) -
Comparison between vacuum ultra-violet emission of CF4/Ar and CF3I/Ar plasmas in CCP chamber for low-k etching
Zotovich, A.; El Otell, Ziad; de Marneffe, Jean-Francois; Proshina, O.; Lopaev, D.; Rakhimova, T.; Baklanov, Mikhaïl (2015) -
Comparison between Vacuum Ultra-Violet emission of CF4/Ar and CF3I/Ar plasmas in CCP chamber for low-k etching
Zotovich, Alexey; El Otell, Ziad; de Marneffe, Jean-Francois; Proshina, Olga; Lopaev, Dimitri; Rakhimova, Tatyana; Baklanov, Mikhaïl (2016) -
Development and characterization of a fast neutral beam source for damage-free etching
Marinov, Daniil; El Otell, Ziad; Bowden, Mark; Braithwaite, Nicholas (2014) -
Development of a novel wafer probe for in-situ measurements
El Otell, Ziad; Marinov, Daniil; Bowden, Mark; Samara, Vladimir; de Marneffe, Jean-Francois; Verdonck, Patrick; Braithwaite, Nicholas (2013) -
Development of a novel wafer probe for in-situ measurements
El Otell, Ziad; Marinov, Daniil; Samra, Vladimir; Bowden, Mark; de Marneffe, Jean-Francois; Verdonck, Patrick; Braithwaite, Nicholas (2014) -
Development of a novel wafer-probe for in situ measurements of thin film properties
El Otell, Ziad; Marinov, Daniil; Samara, Vladimir; Bowden, Mark; de Marneffe, Jean-Francois; Verdonck, Patrick; Braithwaite, Nicholas St. J. (2015) -
Enhancing etch contrast in DSA block copolymer films with sequential infiltration synthesis on 300mm Si substrates
Singh, Arjun; Sayan, Safak; El Otell, Ziad; Chan, BT; Gronheid, Roel (2014) -
Extraction and neutralization of positive and negative ions from a pulsed electronegative inductively coupled plasma
Marinov, Daniil; El Otell, Ziad; Bowden, Mark; Braithwaite, Nicholas (2015) -
High-throughput process chain for single electron transistor devices based on field-emission scanning probe lithography and Smart Nanoimprint technology
Lenk, Claudia; Krivoshapkina, Yana; Hofmann, Martin; Lenk, Steve; Tzvetan, Ivanov; Rangelow, Ivo; Ahmad, Ahmad; Reum, Alexander; Holz, M; Glinsner, Thomas; Eibelhuber, Martin; Treiblmayr, Dominik; Schamberger, Barbara; Chan, BT; El Otell, Ziad; de Marneffe, Jean-Francois (2019) -
Hydrogen plasma treatment: the evolution of roughness in frequency domain
De Schepper, Peter; Vaglio Pret, Alessandro; Altamirano Sanchez, Efrain; El Otell, Ziad; De Gendt, Stefan (2014) -
Impact of sequential infiltration synthesis on pattern fidelity of DSA lines
Singh, Arjun; Knaepen, Werner; Sayan, Safak; El Otell, Ziad; Chan, BT; Maes, Jan; Gronheid, Roel (2015) -
Improved plasma resistance for porous low-k dielectrics by pore stuffing approach
Zhang, Liping; de Marneffe, Jean-Francois; Heyne, Markus; Naumov, Sergej; Sun, Yiting; Zotovich, Alexey; El Otell, Ziad; Vaida, Selim; De Gendt, Stefan; Baklanov, Mikhaïl (2015) -
Line edge and width roughness smoothing by plasma treatment
De Schepper, Peter; Hansen, Terje; Altamirano Sanchez, Efrain; Vaglio Pret, Alessandro; El Otell, Ziad; Boullart, Werner; De Gendt, Stefan (2014) -
Method for in-situ etch uniformity monitoring using plasma emission interferometry
Samara, Vladimir; de Marneffe, Jean-Francois; El Otell, Ziad; Economou, Demetre (2015) -
Molecular glass resist performance for nano-pattern transfer
El Otell, Ziad; Ringk, Andreas; Kolb, Tristan; Neuber, Christian; Haensel, Leander; de Marneffe, Jean-Francois (2015-03) -
Pattern roughness mitigation of 22 nm lines and spaces: The impact of H2 plasma treatment
De Schepper, Peter; Vaglio Pret, Alessandro; El Otell, Ziad; Hansen, Terje; Altamirano Sanchez, Efrain; De Gendt, Stefan (2015) -
Photoresist treatment using an ICP H2 plasma and low ESC temperature: LWR study
De Schepper, Peter; Altamirano Sanchez, Efrain; Goodyear, Andy; El Otell, Ziad; de Marneffe, Jean-Francois; De Gendt, Stefan (2014)