Browsing by author "Vanhaelemeersch, Serge"
Now showing items 81-100 of 121
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Plasma etching of organic low-dielectric-constant polymers: comparative analysis
Baklanov, Mikhaïl; Vanhaelemeersch, Serge; Alaerts, Carine; Maex, Karen (1998) -
Plasma process induced physical damage on ultra thin gate oxide
Lee, Hean-Cheal; Vanhaelemeersch, Serge (1998) -
Plasma-induced 193-nm resist deformation: problems and a possible solution
Struyf, Herbert; Dupont, Tania; Le, Quoc Toan; Boullart, Werner; Vanhaelemeersch, Serge (2004) -
Polymer dielectric treatment using UV-ozone: a photoelectron spectroscopy and ellipsometric porosimetry study.
Le, Quoc Toan; Whelan, Caroline; Struyf, Herbert; Vanhaelemeersch, Serge; Azioune, A.; Louette, P.; Pireaux, J-J; Maex, Karen (2004-10) -
Porosity and critical properties of silica-based low-dielectric-constant materials
Baklanov, Mikhaïl; Travaly, Youssef; Le, Quoc Toan; Shamiryan, Denis; Vanhaelemeersch, Serge (2005-05) -
Post dry-etch cleaning issues of an organic low-K dielectric
Lanckmans, Filip; Baklanov, Mikhaïl; Alaerts, Carine; Vanhaelemeersch, Serge; Maex, Karen (1998) -
Post dry-etch cleaning issues of an organic low-K dielectric
Lanckmans, Filip; Baklanov, Mikhaïl; Alaerts, Carine; Vanhaelemeersch, Serge; Maex, Karen (1999) -
Post-etch cleaning after dry etching the emitter windows to improve the bipolar characteristics in a 0.5 µm BiCMOS technology
Decoutere, Stefaan; Vanhaelemeersch, Serge; Deferm, Ludo; Vleugels, Frank; Vancuyck, Geert (1994) -
Process integration induced thermodesorption from SiO2/SiLK resin dielectric based interconnects
Baklanov, Mikhaïl; Muroyama, M.; Judelewicz, Moshe; Kondoh, Eiichi; Li, H.; Waeterloos, Joost; Vanhaelemeersch, Serge; Maex, Karen (1999) -
Process optimization and integration of trimethylsilane deposited a-SiC:H and SiOC:H dielectric thin films for damascene processing
Gray, William; Loboda, M.; Struyf, Herbert; Van Hove, Marleen; Donaton, R. A.; Sleeckx, Erik; Stucchi, Michele; Gao, Teng; Boullart, Werner; Coenegrachts, Bart; Maenhoudt, Mireille; Vanhaelemeersch, Serge; Meynen, Herman; Maex, Karen (2000) -
Process optimization and integration of trimethylsilane-deposited a-SiC:H and a-SiCO:H dielectric thin films for damascene processing
Gray, W.D.; Loboda, M.J.; Bremmer, J.N.; Struyf, Herbert; Lepage, Muriel; Van Hove, Marleen; Alves Donaton, Ricardo; Sleeckx, Erik; Stucchi, Michele; Lanckmans, Filip; Gao, Teng; Boullart, Werner; Coenegrachts, Bart; Maenhoudt, Mireille; Vanhaelemeersch, Serge; Meynen, H.; Maex, Karen (2003) -
Profile control for low-k patterning using TaN and TiN metallic hardmasks
Struyf, Herbert; Hendrickx, Dirk; Paraschiv, Vasile; Campos Garcia, Diana; Mannaert, Geert; Boullart, Werner; Vanhaelemeersch, Serge (2007) -
Protective films formed by RIE of Co and Ti silicides and ways of their removal
Baklanov, Mikhaïl; Vanhaelemeersch, Serge; Kim, Young-Chang; Storm, Wolfgang; Vandervorst, Wilfried; Maex, Karen (1996) -
Protective films formed during the etching of TiSi2 and CoSi2 in F-based plasmas
Baklanov, Mikhaïl; Vanhaelemeersch, Serge; Storm, Wolfgang; Vandervorst, Wilfried; Maex, Karen (1996) -
Reduction of plasma process induced damage during gate poly etching by using the SiO2 hard maks
Lee, Hean-Cheal; Creusen, Martin; Groeseneken, Guido; Vanhaelemeersch, Serge (1998) -
Removal of plasma-modified low-k layer using dilute HF: influence of concentration
Le, Quoc Toan; Baklanov, Mikhaïl; Kesters, Els; Azioune, Ammar; Struyf, Herbert; Boullart, Werner; Pireaux, Jean-Jacques; Vanhaelemeersch, Serge (2005-07) -
Removal of Si-O, Si-C and Si-F by hydrogen bake after reactive ion etching on the silicon surface
Kim, Young-Chang; Caymax, Matty; Bender, Hugo; Vanhaelemeersch, Serge (1998) -
Resist rework on metal hardmask in a Low-plasma damage patterning approach
Struyf, Herbert; Hendrickx, Dirk; Mannaert, Geert; Boullart, Werner; Vanhaelemeersch, Serge (2005-12) -
Resist strip and Cu diffusion barrier etch in Cu BEOL integration schemes in a Mattson Highlands chamber
Mannaert, Geert; Van Cauwenberghe, M.; Schmidt, Michael; Van Aelst, Joke; Hendrickx, Dirk; Stucchi, Michele; Conard, Thierry; Vanhaelemeersch, Serge; Boullart, Werner (2002) -
Resist strip and Cu diffusion barrier etch in Cu BEOL integration schemes in a Mattson HighlandsTM chamber
Mannaert, Geert; Van Cauwenberghe, Marc; Schmidt, M.O.; Van Aelst, Joke; Hendrickx, Dirk; Stucchi, Michele; Conard, Thierry; Vanhaelemeersch, Serge; Boullart, Werner (2003)