Browsing by author "Vanhaelemeersch, Serge"

A 0.314mm2 6T-SRAM cell built with tall triple-gate devices for 45nm node applications using 0.75NA 193nm lithography

Nackaerts, Axel; Ercken, Monique; Demuynck, Steven; Lauwers, Anne; Baerts, Christina; Bender, Hugo; Boullart, Werner; Collaert, Nadine; Degroote, Bart; Delvaux, Christie; de Marneffe, Jean-Francois; Dixit, Abhisek; De Meyer, Kristin; Hendrickx, Eric; Heylen, Nancy; Jaenen, Patrick; Laidler, David; Locorotondo, Sabrina; Maenhoudt, Mireille; Moelants, Myriam; Pollentier, Ivan; Ronse, Kurt; Rooyackers, Rita; Van Aelst, Joke; Vandenberghe, Geert; Vandervorst, Wilfried; Vandeweyer, Tom; Vanhaelemeersch, Serge; Van Hove, Marleen; Van Olmen, Jan; Verhaegen, Staf; Versluijs, Janko; Vrancken, Christa; Wiaux, Vincent; Jurczak, Gosia; Biesemans, Serge (2004-12)

A novel integration scheme for wafer singulation and selective processing using temporary dry film resist

La Grappe, Alexandre; Visker, Evert; Redolfi, Augusto; Peng, Lan; Muga, Karthik; Huls, David; Vanhaelemeersch, Serge; Lauwers, Anne; Ackaert, Jan (2021)

A novel plasma-assisted shrink process to enlarge process windows of narrow trenches and contacts for 45-nm node applications and beyond

Op de Beeck, Maaike; Versluijs, Janko; Tokei, Zsolt; Demuynck, Steven; de Marneffe, Jean-Francois; Boullart, Werner; Vanhaelemeersch, Serge; Zhu, Helen; Cirigliano, Peter; Pavel, Elisabeth; Sadjadi, Reza; Kim, Jisoo (2007)

Angle resolved XPS characterization of the formation of Cl and Br bonds in poly-silicon etching and its cleaning

Kim, Young-Chang; Beckx, Stephan; Vanhaelemeersch, Serge; Vandervorst, Wilfried (1998)

Angle resolved XPS characterization of the formation of Cl and Br bonds in poly-silicon etching and its cleaning

Kim, Young-Chang; Beckx, Stephan; Vanhaelemeersch, Serge; Vandervorst, Wilfried (1999)

Applicability of HF solutions for contact hole cleaning on top of TiSi2

Baklanov, Mikhaïl; Kondoh, Eiichi; Vanhaelemeersch, Serge; Maex, Karen (1998)

Applicability of HF solutions for the cleaning of TiSi2 surface

Baklanov, Mikhaïl; Vanhaelemeersch, Serge; Maex, Karen (1997)

Application of porous low-k dielectrics and copper in microelectronics

Le, Quoc Toan; Baklanov, Mikhaïl; Claeys, Cor; Snow, Jim; Vanhaelemeersch, Serge (2005)

Challenges of clean/strip processing for Cu/LowK technology

Baklanov, Mikhaïl; Le, Quoc Toan; Kesters, Els; Iacopi, Francesca; Van Aelst, Joke; Struyf, Herbert; Boullart, Werner; Vanhaelemeersch, Serge; Maex, Karen (2004)

Challenges of plasma damage of low-k materials

Baklanov, Mikhaïl; Urbanowicz, Adam; Vanhaelemeersch, Serge (2007)

Characterisation and integration feasibility of JSR's low-k dielectric LKD-5109

Das, Arabinda; Kokubo, Terukazu; Furukawa, Yukiko; Struyf, Herbert; Vos, Ingrid; Sijmus, Bram; Iacopi, Francesca; Van Aelst, Joke; Le, Quoc Toan; Carbonell, Laure; Brongersma, Sywert; Maenhoudt, Mireille; Tokei, Zsolt; Vervoort, Iwan; Sleeckx, Erik; Stucchi, Michele; Schaekers, Marc; Boullart, Werner; Rosseel, Erik; Van Hove, Marleen; Vanhaelemeersch, Serge; Shiota, A.; Maex, Karen (2002)

Characterisation of Cu surface cleaning by downstream N2/H2 plasma

Baklanov, Mikhaïl; Shamiryan, Denis; Beyer, Gerald; Conard, Thierry; Vanhaelemeersch, Serge; Maex, Karen (2001)

Characterisation of plasma etch related residues formed on top of ECD Cu

Baklanov, Mikhaïl; Conard, Thierry; Lanckmans, Filip; Vanhaelemeersch, Serge; Holmes, D.; Maex, Karen (1999)

Characterisation of plasma etch releted residues formed on top of ECD Cu films

Baklanov, Mikhaïl; Conard, Thierry; Lanckmans, Filip; Vanhaelemeersch, Serge; Holmes, D.; Maex, Karen (2000)

Characterization and integration in Cu damascene structures of AURORA, an inorganic low-k dielectric

Alves Donaton, Ricardo; Coenegrachts, Bart; Sleeckx, Erik; Schaekers, Marc; Sophie, Guus; Matsuki, N.; Baklanov, Mikhaïl; Struyf, Herbert; Lepage, Muriel; Vanhaelemeersch, Serge; Beyer, Gerald; Stucchi, Michele; De Roest, David; Maex, Karen (2001)

Characterization and integration of a new Si-O-C film deposited by CVD

Alves Donaton, Ricardo; Struyf, Herbert; Lepage, Muriel; Coenegrachts, Bart; Stucchi, Michele; De Roest, David; Baklanov, Mikhaïl; Vanhaelemeersch, Serge; Maex, Karen; Gaillard, F.; Xia, L. Q.; Lim, T. H.; Gotuaco, M.; Yieh, E.; Van Autryve, Luc (2001)