Browsing by author "Schmidt, Harald"
Now showing items 1-20 of 31
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A new cleaning concept for particle and metal removal on Si surfaces
Meuris, Marc; Verhaverbeke, Steven; Mertens, Paul; Schmidt, Harald; Rotondaro, Antonio; Heyns, Marc (1994) -
A semi-quantitative method for studying photoresist stripping
Rotondaro, Antonio; Meuris, Marc; Schmidt, Harald; Heyns, Marc; Vandervorst, Wilfried; Claeys, Cor; Hellemans, L.; Snauwert, L. (1994) -
Cleaning of metal contamination
Mertens, Paul; Hurd, Trace; Gräf, D.; Meuris, Marc; Schmidt, Harald; Heyns, Marc; Kwakman, L.; Hendriks, M.; Kubota, M. (1994) -
Cleaning technology for highly reliable gate oxides
Heyns, Marc; Meuris, Marc; Verhaverbeke, Steven; Mertens, Paul; Schmidt, Harald; Rotondaro, Antonio; Hurd, Trace; Hatcher, Z.; Gräf, D. (1994) -
Development of a reduced cleaning process for application in a spray processor
Snee, Peter; Mouche, Laurent; Mertens, Paul; Meuris, Marc; Schmidt, Harald; Heyns, Marc (1996) -
Effect of oxidation ramp up on the redistribution of metallic contamination in gate oxides
Mertens, Paul; Rotondaro, Antonio; Meuris, Marc; Schmidt, Harald; Heyns, Marc; Gräf, D. (1994) -
H2O2 decomposition and its impact on silicon surface roughening and gate oxide integrity
Schmidt, Harald; Meuris, Marc; Rotondaro, Antonio; Heyns, Marc; Hurd, Trace; Hatcher, Z. (1995) -
How clean is clean enough?
Mertens, Paul; Teerlinck, Ivo; Hurd, Trace; Kenis, Karine; Schmidt, Harald; Rotondaro, Antonio; Hall, L.; Gräf, D.; De Pestel, Freddy; Meuris, Marc; Heyns, Marc (1995) -
Impact of the electrochemical properties of silicon wafer surfaces on copper outplating from HF solutions
Teerlinck, Ivo; Schmidt, Harald; Rotondaro, Antonio; Hurd, Trace; Mouche, Laurent; Mertens, Paul; Meuris, Marc; Heyns, Marc; Vanhaeren, Danielle; Vandervorst, Wilfried (1996) -
Impact of the electrochemical properties of silicon wafer surfaces on copper outplating from HF solutions
Teerlinck, Ivo; Mertens, Paul; Schmidt, Harald; Meuris, Marc; Heyns, Marc (1996) -
Improvement and evaluation of drying techniques for HF-last wafer cleaning
Li, Li; Zou, Gang; Bender, Hugo; Mertens, Paul; Meuris, Marc; Schmidt, Harald; Heyns, Marc (1994) -
In situ and real time characterization of wet chemical silicon surface processes by electrochemical open circuit potential measurements
Schmidt, Harald; Teerlinck, Ivo; Meuris, Marc; Mertens, Paul; Heyns, Marc (1995) -
In situ and real time studies of wet chemical silicon cleaning reactions
Schmidt, Harald; Teerlinck, Ivo; Storm, Wolfgang; Bender, Hugo; Heyns, Marc (1996) -
Interaction of the sulphuric acid hydrogen peroxide mixture with silicon surfaces
Rotondaro, Antonio; Schmidt, Harald; Meuris, Marc; Heyns, Marc; Claeys, Cor; Mulready, J. (1994) -
Just-Clean- Enough technology for the 21st century
Heyns, Marc; Meuris, Marc; Mertens, Paul; Hurd, Trace; Schmidt, Harald; Depas, Michel; Rotondaro, Antonio; Vermeire, Bert; Vandervorst, Wilfried; Storm, Wolfgang; Polleunis, C.; Bertrand, P.; McGeary, M. J.; Lubbers, A.; Hatcher, Z. (1995) -
Limitations of minority carrier lifetime as a parameter for evaluating iron contamination in silicon
Rotondaro, Antonio; Hurd, Trace; Mertens, Paul; Schmidt, Harald; Heyns, Marc; Simoen, Eddy; Vanhellemont, Jan; Vegh, Gerzson; Claeys, Cor; Gräf, D. (1994) -
Metal interactions with silica (SiO2) surfaces: adsorption and ion exchange
Hurd, Trace; Schmidt, Harald; Rotondaro, Antonio; Mertens, Paul; Hall, L. H.; Heyns, Marc (1996) -
Modelling of the hydrogen passivation kinetics of Si in dilute HF solutions
Verhaverbeke, Steven; Meuris, Marc; Schmidt, Harald; Mertens, Paul; Heyns, Marc (1994) -
New drying techology for advanced cleaning in IC manufacturing
Meuris, Marc; Mertens, Paul; Schmidt, Harald; Hurd, Trace; Li, Li; Heyns, Marc; Jonckx, Franky; Maex, Karen; Schild, R.; Locke, K.; Kozak, M. (1994) -
Outplating of metallic contaminants on silicon wafers from diluted acid solutions
Rotondaro, Antonio; Hurd, Trace; Schmidt, Harald; Teerlinck, Ivo; Heyns, Marc; Claeys, Cor (1995)