Browsing by author "Laubis, Christian"
Now showing items 1-16 of 16
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AlGaN-on-Si-based 10-um pixel-to-pixel pitch hybrid imagers for the EUV range
Malinowski, Pawel; Duboz, Jean-Yves; De Moor, Piet; John, Joachim; Minoglou, Kiki; Srivastava, Puneet; Semond, Fabrice; Frayssinet, Eric; Giordanengo, Boris; BenMoussa, Ali; Kroth, Udo; Gottwald, Alexander; Laubis, Christian; Mertens, Robert; Van Hoof, Chris (2011) -
Alternative materials for high numerical aperture extreme ultraviolet lithography mask stacks
Wood, Obert; Raghunathan, Sudhar; Mangat, Pawitter; Philipsen, Vicky; Luong, Vu; Kearney, Patrick; Verduijn, Erik; Kumar, Aditya; Patil, Suraj; Laubis, Christian; Soltwisch, Victor; Scholze, Frank (2015) -
Assessing stability of metal tellurides as alternative photomask materials for extreme ultraviolet lithography
Luong, Vu; Philipsen, Vicky; Opsomer, Karl; Rip, Jens; Hendrickx, Eric; Heyns, Marc; Detavernier, Christophe; Laubis, Christian; Scholze, Frank (2019) -
Characterization of optical material properties for alternative EUV mask absorber materials
Scholze, Frank; Laubis, Christian; Philipsen, Vicky; Luong, Vu; Edrisi, Arash; Van de Kruijs, Robbert (2016) -
CNTs in the context of EUV pellicle history
Gallagher, Emily; Timmermans, Marina; Pollentier, Ivan; Lee, Jae Uk; Mariano Juste, Marina; Adelmann, Christoph; Huyghebaert, Cedric; Scholze, Frank; Laubis, Christian (2018) -
EUV optical characterization of alternative membrane materials
Scholze, Frank; Laubis, Christian; Krumrey, Michael; Timmermans, Marina; Pollentier, Ivan; Gallagher, Emily (2017) -
Evaluation of optical material parameters for advanced absorbers on EUV masks
Scholze, Frank; Laubis, Christian; Philipsen, Vicky; Luong, Vu; Edrisi, Arash; van de Kruijs, Robbert (2016) -
Mask absorber development to enable next-generation EUVL
Philipsen, Vicky; Luong, Vu; Opsomer, Karl; Souriau, Laurent; Rip, Jens; Detavernier, Christophe; Erdmann, Andreas; Evanschitzky, Peter; Laubis, Christian; Hoenicke, Philipp; Soltwisch, Victor; Hendrickx, Eric (2019) -
Mitigating EUV mask 3D effects by alternative metal absorbers
Philipsen, Vicky; Luong, Vu; Hendrickx, Eric; Erdmann, Andreas; Dongbo, Xu; Evanschitzky, Peter; van de Kruijs, Robbert; Edrisi, Arash; Scholze, Frank; Laubis, Christian; Irmscher, Mathias; Naasz, Sandra (2016) -
Ni-Al alloys as alternative EUV mask absorber
Luong, Vu; Philipsen, Vicky; Hendrickx, Eric; Opsomer, Karl; Detavernier, Christophe; Laubis, Christian; Scholze, Frank; Heyns, Marc (2018) -
Novel EUV mask absorber evaluation in support of next-generation EUV imaging
Philipsen, Vicky; Luong, Vu; Opsomer, Karl; Detavernier, Christophe; Hendrickx, Eric; Erdmann, Andreas; Evanschitzky, Peter; van de Kruijs, Robbert; Heidarnia-Fathabad, Zahra; Scholze, Frank; Laubis, Christian (2018) -
On the optical constants of cobalt in the M-absorption edge region
Saadeh, Qais; Naujok, Philipp; Thakare, Devesh; Wu, Meiyi; Philipsen, Vicky; Scholze, Frank; Buchholz, Christian; Salami, Zanyar; Abdulhadi, Yasser; Garcia, Danilo Ocana; Mentzel, Heiko; Babuschkin, Anja; Laubis, Christian; Soltwisch, Victor (2023) -
Precise optical constants: determination and impact on metrology, simulation and development of EUV masks
Saadeh, Qais; Mesilhy, Hazem; Soltwisch, Victor; Erdmann, Andreas; Ciesielski, Richard; Lohr, Leonhard; Andrle, Anna; Philipsen, Vicky; Thakare, Devesh; Laubis, Christian; Scholze, Frank; Kolbe, Michael (2022) -
Reducing EUV mask 3D effects by alternative metal absorbers
Philipsen, Vicky; Luong, Vu; Souriau, Laurent; Erdmann, Andreas; Xu, Dongbo; Evanschitzky, Peter; Van de Kruijs, Robbert; Edrisi, Arash; Scholze, Frank; Laubis, Christian; Irmscher, Mathias; Naasz, Sandra; Reuter, Christian; Hendrickx, Eric (2017) -
Single element and metal alloy novel EUV mask absorbers for improved imaging
Philipsen, Vicky; Luong, Vu; Souriau, Laurent; Altamirano Sanchez, Efrain; Adelmann, Christoph; Hendrickx, Eric; Scholze, Frank; Laubis, Christian; Kruemberg, Jens; Reuter, Christian (2017) -
Time-frequency analysis assisted determination of ruthenium optical constants in the sub-EUV spectral range 8 nm-23.75 nm
Saadeh, Qais; Naujok, Philipp; Philipsen, Vicky; Hoenicke, Philipp; Laubis, Christian; Buchholz, Christian; Andrle, Anna; Stadelhoff, Christian; Mentzel, Heiko; Schoenstedt, Anja; Soltwisch, Victor; Scholze, Frank (2021)