Browsing by author "Delvaux, Christie"
Now showing items 1-20 of 34
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193nm immersion lithography for high performance silicon photonic circuits
Selvaraja, Shankar; Absil, Philippe; Van Campenhout, Joris; Winroth, Gustaf; Murdoch, Gayle; Locorotondo, Sabrina; Milenin, Alexey; Delvaux, Christie; Ong, Patrick; Sterckx, Gunther; Lepage, Guy; Pathak, Shibnath; Bogaerts, Wim; Van Thourhout, Dries; Xie, Weiqiang (2014) -
A 0.314mm2 6T-SRAM cell built with tall triple-gate devices for 45nm node applications using 0.75NA 193nm lithography
Nackaerts, Axel; Ercken, Monique; Demuynck, Steven; Lauwers, Anne; Baerts, Christina; Bender, Hugo; Boullart, Werner; Collaert, Nadine; Degroote, Bart; Delvaux, Christie; de Marneffe, Jean-Francois; Dixit, Abhisek; De Meyer, Kristin; Hendrickx, Eric; Heylen, Nancy; Jaenen, Patrick; Laidler, David; Locorotondo, Sabrina; Maenhoudt, Mireille; Moelants, Myriam; Pollentier, Ivan; Ronse, Kurt; Rooyackers, Rita; Van Aelst, Joke; Vandenberghe, Geert; Vandervorst, Wilfried; Vandeweyer, Tom; Vanhaelemeersch, Serge; Van Hove, Marleen; Van Olmen, Jan; Verhaegen, Staf; Versluijs, Janko; Vrancken, Christa; Wiaux, Vincent; Jurczak, Gosia; Biesemans, Serge (2004-12) -
Advanced 300-mm waferscale patterning for silicon photonics devices with record low loss and phase errors
Selvaraja, Shankar; Murdoch, Gayle; Milenin, Alexey; Delvaux, Christie; Ong, Patrick; Pathak, Shibnath; Vermeulen, Diedrik; Sterckx, Gunther; Winroth, Gustaf; Verheyen, Peter; Lepage, Guy; Bogaerts, Wim; Baets, Roel; Van Campenhout, Joris; Absil, Philippe (2012) -
Applying design-based metrology for calibrating an OPC model for FinFET pattering
Vandeweyer, Tom; Lorusso, Gian; Delvaux, Christie; De Backer, Johan; Jandhyala, Radhika; Azordegan, Amir; Abott, Gordon; Kaliblotzky, Zeev; Ercken, Monique (2005) -
ArF lithography options for 100-nm technologies
Vandenberghe, Geert; Kim, Young-Chang; Delvaux, Christie; Lucas, Kevin; Choi, Sang-Jun; Ercken, Monique; Ronse, Kurt; Vleeming, Bert (2001) -
ArF lithography options for 100nm technologies
Vandenberghe, Geert; Kim, Young-Chang; Delvaux, Christie; Lucas, Kevin; Choi, Sang-Jun; Ercken, Monique; Ronse, Kurt; Vleeming, Bert (2001) -
Bottom-ARC optimization methodology for 0.25μm lithography and beyond
Op de Beeck, Maaike; Vandenberghe, Geert; Jaenen, Patrick; Feng, Hong Zhang; Delvaux, Christie; Richardson, Paul; Van Puyenbroeck, Ilse; Ronse, Kurt; Lamb, J. E.; van der Hilst, J. B. C.; van Wingerden, Johannes (1998) -
Challenges and opportunities of vertical FET devices using 3D circuit design layouts
Veloso, Anabela; Huynh Bao, Trong; Rosseel, Erik; Paraschiv, Vasile; Devriendt, Katia; Vecchio, Emma; Delvaux, Christie; Chan, BT; Ercken, Monique; Tao, Zheng; Li, Waikin; Altamirano Sanchez, Efrain; Versluijs, Janko; Brus, Stephan; Matagne, Philippe; Waldron, Niamh; Ryckaert, Julien; Mocuta, Dan; Collaert, Nadine (2016) -
Challenges building a 22nm node 6T-SRAM cell using immersion lithography
Ercken, Monique; Altamirano Sanchez, Efrain; Baerts, Christina; Brus, Stephan; De Backer, Johan; Demand, Marc; Delvaux, Christie; Horiguchi, Naoto; Locorotondo, Sabrina; Vandeweyer, Tom; Veloso, Anabela; Verhaegen, Staf (2009) -
Challenges in patterning 45nm node multiple-gate devices and SRAM cells
Ercken, Monique; Delvaux, Christie; Baerts, Christina; Locorotondo, Sabrina; Degroote, Bart; Wiaux, Vincent; Nackaerts, Axel; Rooyackers, Rita; Verhaegen, Staf; Pollentier, Ivan (2004) -
Challenges in setting up the patterning processes for a 16nm node SRAM cell
Ercken, Monique; Vandeweyer, Tom; Versluijs, Janko; Truffert, Vincent; De Backer, Johan; Delvaux, Christie; Baerts, Christina (2010) -
Challenges in using optical lithography for the building of a 22 nm node 6T=-SRAM cell
Ercken, Monique; Altamirano Sanchez, Efrain; Baerts, Christina; Brus, Stephan; De Backer, Johan; Delvaux, Christie; Demand, Marc; Horiguchi, Naoto; Locorotondo, Sabrina; Vandeweyer, Tom; Veloso, Anabela; Verhaegen, Staf (2010) -
Demonstration of scaled 0.099μm² FinFET 6T-SRAM cell using full-field EUV lithography for (Sub-)22nm node single-patterning technology
Veloso, Anabela; Demuynck, Steven; Ercken, Monique; Goethals, Mieke; Locorotondo, Sabrina; Lazzarino, Frederic; Altamirano Sanchez, Efrain; Huffman, Craig; De Keersgieter, An; Brus, Stephan; Demand, Marc; Struyf, Herbert; De Backer, Johan; Hermans, Jan; Delvaux, Christie; Baudemprez, Bart; Vandeweyer, Tom; Van Roey, Frieda; Baerts, Christina; Goossens, Danny; Dekkers, Harold; Ong, Patrick; Heylen, Nancy; Kellens, Kristof; Volders, Henny; Hikavyy, Andriy; Vrancken, Christa; Rakowski, Michal; Verhaegen, Staf; Dusa, Mircea; Romijn, Leon; Pigneret, Charles; van Dijk, Andre; Schreutelkamp, Rob; Cockburn, Andrew; Gravey, Virginie; Meiling, H.; Hultermans, B.; Lok, S.; Shah, K.; Rajagopalan, R.; Gelatos, J.; Richard, Olivier; Bender, Hugo; Vandenberghe, Geert; Beyer, Gerald; Absil, Philippe; Hoffmann, Thomas Y.; Ronse, Kurt; Biesemans, Serge (2009-12) -
Diagnosing and Removing CD-SEM Metrology Artifacts
Mack, Chris; Lorusso, Gian; Delvaux, Christie (2021) -
Double hard mask strategy for patterning 0.186 micron2 SRAM cells using FinFET technology
Demand, Marc; Veloso, Anabela; Brus, Stephan; Delvaux, Christie; De Backer, Johan; Ercken, Monique; Boullart, Werner (2008) -
Effect of water on resist performance beyond resolution enhancement in 193nm immersion lithography
Kim, Hyun-Woo; Delvaux, Christie; Baerts, Christina; Gronheid, Roel; Foubert, Philippe; Kishimura, Shinji; Ercken, Monique (2005) -
Front-end-of-line process development using 193-nm lithography
Pollentier, Ivan; Ercken, Monique; Eliat, Astrid; Delvaux, Christie; Jaenen, Patrick; Ronse, Kurt (2001) -
Full-field EUV and immersion lithography integration in 0.186μm² FinFET 6T-SRAM cell
Veloso, Anabela; Demuynck, Steven; Ercken, Monique; Goethals, Mieke; Demand, Marc; de Marneffe, Jean-Francois; Altamirano Sanchez, Efrain; De Keersgieter, An; Delvaux, Christie; De Backer, Johan; Brus, Stephan; Hermans, Jan; Baudemprez, Bart; Van Roey, Frieda; Lorusso, Gian; Baerts, Christina; Goossens, Danny; Vrancken, Christa; Mertens, Sofie; Versluijs, Janko; Truffert, Vincent; Huffman, Craig; Laidler, David; Heylen, Nancy; Ong, Patrick; Parvais, Bertrand; Rakowski, Michal; Verhaegen, Staf; Hikavyy, Andriy; Meiling, H.; Hultermans, B.; Romijn, L.; Pigneret, C.; Lok, S.; Van Dijk, A.; Shah, K.; Noori, A.; Gelatos, J.; Arghavani, R.; Schreutelkamp, Rob; Boelen, Pieter; Richard, Olivier; Bender, Hugo; Witters, Liesbeth; Collaert, Nadine; Rooyackers, Rita; Absil, Philippe; Lauwers, Anne; Jurczak, Gosia; Hoffmann, Thomas Y.; Vanhaelemeersch, Serge; Cartuyvels, Rudi; Ronse, Kurt; Biesemans, Serge (2008) -
Gatestacks for scalable high-performance FinFETs
Vellianitis, Georgios; Van Dal, Mark; Witters, Liesbeth; Curatola, Gilberto; Doornbos, Gerben; Collaert, Nadine; Jonville, C.; Torregiani, Cristina; Lai, Li-Shyue; Petry, Jasmine; Pawlak, Bartek; Duffy, Ray; Demand, Marc; Beckx, Stephan; Mertens, Sofie; Delabie, Annelies; Vandeweyer, Tom; Delvaux, Christie; Leys, Frederik; Hikavyy, Andriy; Rooyackers, Rita; Kaiser, M.; Weemaes, R.G.R.; Voogt, F.; Roberts, H.; Donnet, D.; Biesemans, Serge; Jurczak, Gosia; Lander, Rob (2007) -
High yield sub-0.1μm² 6T-SRAM Cells, featuring high-k/metal-gate Finfet devices, double gate patterning, a novel Fin etch strategy, full-field EUV lithography and optimized junction design & layout
Horiguchi, Naoto; Demuynck, Steven; Ercken, Monique; Locorotondo, Sabrina; Lazzarino, Frederic; Altamirano Sanchez, Efrain; Huffman, Craig; Brus, Stephan; Demand, Marc; Struyf, Herbert; De Backer, Johan; Hermans, Jan; Delvaux, Christie; Vandeweyer, Tom; Baerts, Christina; Mannaert, Geert; Truffert, Vincent; Verluijs, j; Alaerts, Wilfried; Dekkers, Harold; Ong, Patrick; Heylen, Nancy; Kellens, Kristof; Volders, Henny; Hikavyy, Andriy; Vrancken, Christa; Rakowski, Michal; Verhaegen, Staf; Vandenberghe, Geert; Beyer, Gerald; Lauwers, Anne; Absil, Philippe; Hoffmann, Thomas Y.; Ronse, Kurt; Biesemans, Serge (2010)