Browsing by author "Pawlak, Malgorzata"
Now showing items 1-20 of 33
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0.5 nm EOT low leakage ALD SrTiO3 on TiN MIM capacitors for DRAM applications
Menou, Nicolas; Wang, Xin Peng; Kaczer, Ben; Polspoel, Wouter; Popovici, Mihaela Ioana; Opsomer, Karl; Pawlak, Malgorzata; Knaepen, W.; Detavernier, C.; Blomberg, T.; Pierreux, D.; Swerts, Johan; Maes, Jan; Favia, Paola; Bender, Hugo; Brijs, Bert; Vandervorst, Wilfried; Van Elshocht, Sven; Wouters, Dirk; Biesemans, Serge; Kittl, Jorge (2008) -
A comparative study of the microstructure–dielectric properties of crystalline SrTiO3 ALD films obtained via seed layer approach
Popovici, Mihaela Ioana; Tomida, Kazuyuki; Swerts, Johan; Favia, Paola; Delabie, Annelies; Bender, Hugo; Adelmann, Christoph; Tielens, Hilde; Brijs, Bert; Kaczer, Ben; Pawlak, Malgorzata; Kim, Min-Soo; Altimime, Laith; Van Elshocht, Sven; Kittl, Jorge (2011) -
Advanced capacitor dielectrics: towards 2x nm DRAM
Kim, Min-Soo; Popovici, Mihaela Ioana; Swerts, Johan; Pawlak, Malgorzata; Tomida, Kazuyuki; Kaczer, Ben; Opsomer, Karl; Schaekers, Marc; Tielens, Hilde; Vrancken, Christa; Van Elshocht, Sven; Debusschere, Ingrid; Altimime, Laith; Kittl, Jorge (2011-05) -
ALD strontium titanates and their characterization
Popovici, Mihaela Ioana; Van Elshocht, Sven; Tomida, Kazuyuki; Menou, Nicolas; Swerts, Johan; Pawlak, Malgorzata; Kaczer, Ben; Kim, Min-Soo; Brijs, Bert; Favia, Paola; Conard, Thierry; Franquet, Alexis; Moussa, Alain; Debusschere, Ingrid; Altimime, Laith; Kittl, Jorge (2010) -
Applications of Ni-based silicides to 45 nm CMOS and beyond
Kittl, Jorge; Lauwers, Anne; Chamirian, Oxana; Pawlak, Malgorzata; Van Dal, Mark; Akheyar, Amal; de Potter de ten Broeck, Muriel; Kottantharayil, Anil; Pourtois, Geoffrey; Lindsay, Richard; Maex, Karen (2004) -
Atomic layer deposition of Ru and RuO2 for MIMCAP applications
Zhao, Chao; Pawlak, Malgorzata; Popovici, Mihaela Ioana; Schaekers, Marc; Sleeckx, Erik; Vancoille, Eric; Wouters, Dirk; Tokei, Zsolt; Kittl, Jorge (2009) -
Atomic layer deposition of Ru and RuO2 for MIMCAP applications
Zhao, Chao; Pawlak, Malgorzata; Schaekers, Marc; Sleeckx, Erik; Vancoille, Eric; Wouters, Dirk; Tokei, Zsolt; Kittl, Jorge (2009) -
Composition influence on the physical and electrical properties of SrxTi1-xOy-based MIM capacitors prepared by Atomic Layer Deposition using TiN bottom electrodes
Menou, Nicolas; Popovici, Mihaela Ioana; Clima, Sergiu; Opsomer, Karl; Polspoel, Wouter; Kaczer, Ben; Rampelberg, Geert; Tomida, Kazuyuki; Pawlak, Malgorzata; Detavernier, Christophe; Pierreux, Dieter; Swerts, Johan; Maes, Jan Willem; Manger, Dirk; Badylevich, M; Afanasiev, Valeri; Conard, Thierry; Favia, Paola; Bender, Hugo; Brijs, Bert; Vandervorst, Wilfried; Van Elshocht, Sven; Pourtois, Geoffrey; Wouters, Dirk; Biesemans, Serge; Kittl, Jorge (2009) -
Compositional study of BaSrTiO thin films for memory application
Tomida, Kazuyuki; Opsomer, Karl; Vrancken, Christa; Matero, Raija; Tois, Eva; Kaczer, Ben; Pawlak, Malgorzata; Popovici, Mihaela Ioana; Swerts, Johan; Van Elshocht, Sven; Detavernier, Christophe; Kim, Min-Soo; Debusschere, Ingrid; Altimime, Laith; Kittl, Jorge (2010) -
Controlled growth of rutile TiO2 by atomic layer deposition on oxidized ruthenium
Popovici, Mihaela Ioana; Swerts, Johan; Tomida, Kazuyuki; Radisic, Dunja; Kim, Min-Soo; Kaczer, Ben; Richard, Olivier; Bender, Hugo; Delabie, Annelies; Moussa, Alain; Vrancken, Christa; Opsomer, Karl; Franquet, Alexis; Pawlak, Malgorzata; Schaekers, Marc; Altimime, Laith; Van Elshocht, Sven; Kittl, Jorge (2011) -
Cost effective low Vt Ni-FUSI CMOS on SiON by means of Al implant (pMOS) and Yb+P implant (nMOS)
Lauwers, Anne; Veloso, Anabela; Chang, Shou-Zen; Yu, HongYu; Hoffmann, Thomas Y.; Kerner, Christoph; Demand, Marc; Rothschild, Aude; Niwa, Masaaki; Satoru, Ito; Mitshashi, Riichirou; Ameen, Mike; Whittemore, Graham; Pawlak, Malgorzata; Vrancken, Christa; Demeurisse, Caroline; Mertens, Sofie; Vandervorst, Wilfried; Absil, Philippe; Biesemans, Serge; Kittl, Jorge (2008) -
Crystallization study of thin ZrO2 ALD films on Al203 and on TiN for DRAM MIMCAP applications
Pawlak, Malgorzata; Menou, Nicolas; Wang, Xin Peng; Dilliway, G.; Pierreux, D.; Fischer, P.; Vos, Rita; Hoyer, R.; Kittl, Jorge; Wouters, Dirk; Biesemans, Serge (2008) -
Direct physical evidence of mechanisms of leakage and equivalent oxide thickness reduction in metal-insulator-metal capacitors based on RuOx/TiOx/SrxTiyOz/TiN stacks
Pawlak, Malgorzata; Swerts, Johan; Popovici, Mihaela Ioana; Kaczer, Ben; Kim, Min-Soo; Wang, Wan-Chih; Tomida, Kazuyuki; Govoreanu, Bogdan; Delmotte, Joris; Afanas'ev, Valeri; Schaekers, Marc; Vandervorst, Wilfried; Kittl, Jorge (2012) -
Effect of deposition and anneal temperature on batch-ALD deposited ZrO2/Al2O3/ZrO2 films for DRAM MIM capacitor applications
Dilliway, G.; Pierreux, D.; Fischer, P.; Menou, Nicolas; Pawlak, Malgorzata; Wang, Xin Peng; Wouters, Dirk (2008) -
Enabling 3X nm DRAM: Record low leakage 0.4 nm EOT MIM capacitors with novel stack engineering
Pawlak, Malgorzata; Popovici, Mihaela Ioana; Swerts, Johan; Tomida, Kazuyuki; Kim, Min-Soo; Kaczer, Ben; Opsomer, Karl; Schaekers, Marc; Favia, Paola; Bender, Hugo; Vrancken, Christa; Govoreanu, Bogdan; Demeurisse, Caroline; Wang, Wan-Chih; Afanasiev, Valeri; Debusschere, Ingrid; Altimime, Laith; Kittl, Jorge (2010) -
High-k dielectrics and metal gates for future generation memory devices
Kittl, Jorge; Opsomer, Karl; Popovici, Mihaela Ioana; Menou, Nicolas; Kaczer, Ben; Wang, Xin Peng; Adelmann, Christoph; Pawlak, Malgorzata; Tomida, Kazuyuki; Rothschild, Aude; Govoreanu, Bogdan; Degraeve, Robin; Schaekers, Marc; Zahid, Mohammed; Delabie, Annelies; Meersschaut, Johan; Polspoel, W.; Clima, Sergiu; Pourtois, Geoffrey; Knaepen, W.; Detavernier, C.; Afanasiev, Valeri; Blomberg, T.; Pierreux, Dieter; Swerts, Johan; Fischer, P.; Maes, Jan; Manger, D.; Vandervorst, Wilfried; Conard, Thierry; Franquet, Alexis; Favia, Paola; Bender, Hugo; Brijs, Bert; Van Elshocht, Sven; Jurczak, Gosia; Van Houdt, Jan; Wouters, Dirk (2009) -
High-k dielectrics and metal gates for future generation memory devices
Kittl, Jorge; Opsomer, Karl; Popovici, Mihaela Ioana; Menou, Nicolas; Kaczer, Ben; Wang, Xin Peng; Adelmann, Christoph; Pawlak, Malgorzata; Tomida, Kazuyuki; Rothschild, Aude; Govoreanu, Bogdan; Degraeve, Robin; Schaekers, Marc; Zahid, Mohammed; Delabie, Annelies; Meersschaut, Johan; Polspoel, W.; Clima, Sergiu; Pourtois, Geoffrey; Detavernier, C.; Knaepen, W.; Afanasiev, Valeri; Blomberg, T.; Pierreux, Dieter; Swerts, Johan; Maes, Jan; Manger, D.; Vandervorst, Wilfried; Conard, Thierry; Franquet, Alexis; Favia, Paola; Bender, Hugo; Brijs, Bert; Van Elshocht, Sven; Jurczak, Gosia; Van Houdt, Jan; Wouters, Dirk (2009) -
High-k dielectrics for future generation memory devices
Kittl, Jorge; Opsomer, Karl; Popovici, Mihaela Ioana; Menou, Nicolas; Kaczer, Ben; Wang, Xin Peng; Adelmann, Christoph; Pawlak, Malgorzata; Tomida, Kazuyuki; Rothschild, Aude; Govoreanu, Bogdan; Degraeve, Robin; Schaekers, Marc; Zahid, Mohammed; Delabie, Annelies; Meersschaut, Johan; Polspoel, Wouter; Clima, Sergiu; Pourtois, Geoffrey; Knaepen, W.; Detavernier, C.; Afanasiev, Valeri; Blomberg, T.; Pierreux, Dieter; Swerts, Johan; Fischer, Pamela; Maes, Jan; Manger, Dirk; Vandervorst, Wilfried; Conard, Thierry; Franquet, Alexis; Favia, Paola; Bender, Hugo; Brijs, Bert; Van Elshocht, Sven; Jurczak, Gosia; Van Houdt, Jan; Wouters, Dirk (2009) -
Higher-k ALD Sr-rich SrTiO3 for DRAM MIMCAP Application
Tomida, Kazuyuki; Swerts, Johan; Popovici, Mihaela Ioana; Kaczer, Ben; Clima, Sergiu; Pawlak, Malgorzata; Kim, Min-Soo; Afanasiev, Valeri; Kittl, Jorge; Jurczak, Gosia (2013) -
Impact of crystallization behavior of SrxTiyOz films on electrical properties of metal-insulator-metal capacitors with TiN electrodes
Pawlak, Malgorzata; Kaczer, Ben; Kim, Min-Soo; Popovici, Mihaela Ioana; Tomida, Kazuyuki; Swerts, Johan; Opsomer, Karl; Polspoel, Wouter; Favia, Paola; Vrancken, Christa; Demeurisse, Caroline; Wang, W.-C.; Afanasiev, Valeri; Vandervorst, Wilfried; Bender, Hugo; Debusschere, Ingrid; Altimime, Laith; Kittl, Jorge (2010)