Browsing by author "Tielens, Hilde"
Now showing items 1-20 of 48
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A comparative study of the microstructure–dielectric properties of crystalline SrTiO3 ALD films obtained via seed layer approach
Popovici, Mihaela Ioana; Tomida, Kazuyuki; Swerts, Johan; Favia, Paola; Delabie, Annelies; Bender, Hugo; Adelmann, Christoph; Tielens, Hilde; Brijs, Bert; Kaczer, Ben; Pawlak, Malgorzata; Kim, Min-Soo; Altimime, Laith; Van Elshocht, Sven; Kittl, Jorge (2011) -
Advanced capacitor dielectrics: towards 2x nm DRAM
Kim, Min-Soo; Popovici, Mihaela Ioana; Swerts, Johan; Pawlak, Malgorzata; Tomida, Kazuyuki; Kaczer, Ben; Opsomer, Karl; Schaekers, Marc; Tielens, Hilde; Vrancken, Christa; Van Elshocht, Sven; Debusschere, Ingrid; Altimime, Laith; Kittl, Jorge (2011-05) -
ALD barrier deposition on porous low-k dielectric materials for interconnects
Van Elshocht, Sven; Delabie, Annelies; Dewilde, Sven; Meersschaut, Johan; Swerts, Johan; Tielens, Hilde; Verdonck, Patrick; Witters, Thomas; Vancoille, Eric (2011-10) -
An X-ray photoelectron spectroscopy study of strontium-titanate-based high-k film stacks
Sygellou, L.; Tielens, Hilde; Adelmann, Christoph; Ladas, Spyros (2012) -
Atomic layer deposition of gadolinium aluminate layers using Gd(iPrCp)3, TMA, and O3 or H2O
Adelmann, Christoph; Pierreux, Dieter; Swerts, Johan; Dewulf, Daan; Hardy, An; Tielens, Hilde; Franquet, Alexis; Brijs, Bert; Moussa, Alain; Conard, Thierry; Van Bael, Marlies; Maes, Jan; Jurczak, Gosia; Kittl, Jorge; Van Elshocht, Sven (2010) -
Atomic layer deposition of Gd-doped HfO2 thin films
Adelmann, Christoph; Tielens, Hilde; Dewulf, Daan; Hardy, An; Pierreux, Dieter; Swerts, Johan; Rosseel, Erik; Shi, Xiaoping; Van Bael, Marlies; Kittl, Jorge; Van Elshocht, Sven (2010) -
Atomic layer deposition of GdAlOx and GdHfOx using Gd(iPr-Cp)3
Adelmann, Christoph; Pierreux, Dieter; Swerts, Johan; Kesters, Jurgen; Richard, Olivier; Conard, Thierry; Franquet, Alexis; Tielens, Hilde; Afanasiev, Valeri; Schaekers, Marc; Van Elshocht, Sven (2009) -
Atomic layer deposition of GdHfOx thin films
Adelmann, Christoph; Pierreux, Dieter; Swerts, Johan; Rosseel, Erik; Shi, Xiaoping; Tielens, Hilde; Kesters, Jurgen; Van Elshocht, Sven; Kittl, Jorge (2009) -
Atomic-layer deposition of lutetium aluminate thin films for non-volatile memory applications
Adelmann, Christoph; Swerts, Johan; Conard, Thierry; Brijs, Bert; Franquet, Alexis; Hardy, An; Tielens, Hilde; Opsomer, Karl; Moussa, Alain; Van Bael, Marlies; Jurczak, Gosia; Kittl, Jorge; Van Elshocht, Sven (2011) -
Chemisorption of ALD precursors in and on porous low-k films
Verdonck, Patrick; Delabie, Annelies; Swerts, Johan; Farrell, Leo; Baklanov, Mikhaïl; Tielens, Hilde; Van Besien, Els; Witters, Thomas; Nyns, Laura; Van Elshocht, Sven (2013) -
CMOS-compatible dielectric constant engineering by embedding metallic particles in aluminum oxide
Put, Brecht; Adelmann, Christoph; Swerts, Johan; Rooyackers, Rita; Tielens, Hilde; Van Elshocht, Sven; Heyns, Marc; Radu, Iuliana (2013) -
Detailed characterization of the effects of plasma treatments on an advanced 2.0 low-k material
Verdonck, Patrick; Maheshwari, Abhishek; Swerts, Johan; Tielens, Hilde; Franquet, Alexis; Loyo Prado, Jana; Armini, Silvia; Baklanov, Mikhaïl; Van Elshocht, Sven; Uedono, Akira; Roque Huanca, Danilo; Gomes dos Santos Filho, Sebastiao; Kellerman, Guinther (2013) -
Development of ALD HfZrOx with TDEAH, TDEAZ and H2O
Shi, Xiaoping; Tielens, Hilde; Takeoka, Shinji; Nakabayashi, Takashi; Nyns, Laura; Adelmann, Christoph; Delabie, Annelies; Schram, Tom; Ragnarsson, Lars-Ake; Schaekers, Marc; Date, Lucien; Schreutelkamp, Rob; Van Elshocht, Sven (2010) -
Development of ALD HfZrOx with TDEAH/TDEAZ and H2O
Shi, Xiaoping; Tielens, Hilde; Takeoka, Shinji; Nakabayashi, Takashi; Nyns, Laura; Adelmann, Christoph; Delabie, Annelies; Schram, Tom; Ragnarsson, Lars-Ake; Schaekers, Marc; Date, Lucien; Schreutelkamp, Rob; Van Elshocht, Sven (2011) -
Dual-channel technology with Cap-free single metal gate for high performance CMOS in gate-first and gate-last integration
Witters, Liesbeth; Mitard, Jerome; Veloso, Anabela; Hikavyy, Andriy; Franco, Jacopo; Kauerauf, Thomas; Cho, Moon Ju; Schram, Tom; Sebaai, Farid; Yamaguchi, Shinpei; Takeoka, S.; Fukuda, Masahiro; Wang, Wei-E; Duriez, Blandine; Eneman, Geert; Loo, Roger; Kellens, Kristof; Tielens, Hilde; Favia, Paola; Rohr, Erika; Hellings, Geert; Bender, Hugo; Roussel, Philippe; Crabbe, Yvo; Brus, Stephan; Mannaert, Geert; Kubicek, Stefan; Devriendt, Katia; De Meyer, Kristin; Ragnarsson, Lars-Ake; Steegen, An; Horiguchi, Naoto (2011) -
Effective work function engineering for aggressively scaled planar and FinFET-based devices with high-k last replacement metal gate technology
Veloso, Anabela; Chew, Soon Aik; Higuchi, Yuichi; Ragnarsson, Lars-Ake; Simoen, Eddy; Schram, Tom; Witters, Thomas; Van Ammel, Annemie; Dekkers, Harold; Tielens, Hilde; Devriendt, Katia; Heylen, Nancy; Sebaai, Farid; Brus, Stephan; Favia, Paola; Geypen, Jef; Bender, Hugo; Phatak, Anup; Chen, M. S.; Lu, X.; Ganguli, S.; Lei, Y.; Tang, W.; Fu, X.; Gandikota, S.; Noori, A.; Brand, A.; Yoshida, N.; Thean, Aaron; Horiguchi, Naoto (2012-09) -
Effective work function engineering for aggressively scaled planar and multi-gate fin field-effect transistor-based devices with high-k last replacement metal gate technology
Veloso, Anabela; Chew, Soon Aik; Higuchi, Yuichi; Ragnarsson, Lars-Ake; Simoen, Eddy; Schram, Tom; Witters, Thomas; Van Ammel, Annemie; Dekkers, Harold; Tielens, Hilde; Devriendt, Katia; Heylen, Nancy; Sebaai, Farid; Brus, Stephan; Favia, Paola; Geypen, Jef; Bender, Hugo; Phatak, Anup; Chen, M. S.; Lu, X.; Ganguli, S.; Lei, Yu; Tang, W.; Fu, X.; Gandikota, S.; Noori, A.; Brand, A.; Yoshida, N.; Thean, Aaron; Horiguchi, Naoto (2013) -
Electrical characterization of the metal-vanadium dioxide interface and implications for memory applications
Martens, Koen; Radu, Iuliana; Mertens, Sofie; Shi, Xiaoping; Schaekers, Marc; Tielens, Hilde; Huyghebaert, Cedric; De Gendt, Stefan; Jurczak, Gosia; Afanasev, Valeri; Heyns, Marc; Kittl, Jorge (2011) -
Electrical characterization of the metal-vanadium dioxide interface and vanadium dioxide work function
Martens, Koen; Radu, Iuliana; Mertens, Sofie; Shi, Xiaoping; Schaekers, Marc; Tielens, Hilde; Huyghebaert, Cedric; De Gendt, Stefan; Jurczak, Gosia; Afanas'ev, Valerie; Heyns, Marc; Kittl, Jorge (2011) -
Electrical properties of vanadium dioxide devices for micro-electronic applications making use of metal-insulator phase transitions
Martens, Koen; Radu, Iuliana; Mertens, Sofie; Adelmann, Christoph; Shi, Xiaoping; Tielens, Hilde; Schaekers, Marc; Huyghebaert, Cedric; Van Elshocht, Sven; De Gendt, Stefan; Heyns, Marc; Kittl, Jorge (2011)