Browsing by author "Kellens, Kristof"
Now showing items 1-20 of 37
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Air-gap formation by UV-assisted decomposition of CVD material
Pantouvaki, Marianna; Humbert, Aurelie; Van Besien, Els; Camerotto, Elisabeth; Travaly, Youssef; Richard, Olivier; Willegems, Myriam; Volders, Henny; Kellens, Kristof; Daamen, Roel; Hoofman, Romano; Beyer, Gerald (2008) -
Air-gap formation by UV-assisted decomposition of CVD material
Pantouvaki, Marianna; Humbert, Aurelie; Van Besien, Els; Camerotto, Elisabeth; Travaly, Youssef; Richard, Olivier; Willegems, Myriam; Volders, Henny; Kellens, Kristof; Daamen, Roel; Hoofman, Romano; Beyer, Gerald (2008) -
CMP of novel materials
Ong, Patrick; Kellens, Kristof; Chiodarelli, Nicolo; Meuris, Marc; Leunissen, Peter (2009) -
Cu plating of through-Si vias for 3D-stacked integrated circuits
Radisic, Alex; Luhn, Ole; Swinnen, Bart; Bender, Hugo; Drijbooms, Chris; Doumen, Geert; Kellens, Kristof; Ruythooren, Wouter; Vereecken, Philippe (2008) -
Cu Plating of Through-Si Vias for 3D-Stacked Integrated Circuits
Radisic, Alex; Luhn, Ole; Swinnen, Bart; Bender, Hugo; Drijbooms, Chris; Doumen, Geert; Kellens, Kristof; Ruythooren, Wouter; Vereecken, Philippe (2009) -
Cu(Mn) seed layers in single damascene trenches with dimensions down to 30 nm
Volders, Henny; Richard, Olivier; Carbonell, Laure; Palmans, Roger; Verdonck, Patrick; Heylen, Nancy; Kellens, Kristof; Armini, Silvia; Bender, Hugo; Zhao, Larry; Tokei, Zsolt (2008) -
Cu(Mn) seed layers in single damascene trenches with dimensions down to 30 nm
Volders, Henny; Richard, Olivier; Carbonell, Laure; Palmans, Roger; Verdonck, Patrick; Heylen, Nancy; Kellens, Kristof; Armini, Silvia; Bender, Hugo; Zhao, Larry; Tokei, Zsolt (2009) -
Cu/Low-k thickness measurement for advanced Cu CMP process development and control
Li, Yunlong; Heylen, Nancy; Delande, Tinne; Kellens, Kristof; Ong, Patrick; Leunissen, Peter; Tarnowka, Alexandre; Eliyahu, Aviv (2009-03) -
Demonstration of scaled 0.099μm² FinFET 6T-SRAM cell using full-field EUV lithography for (Sub-)22nm node single-patterning technology
Veloso, Anabela; Demuynck, Steven; Ercken, Monique; Goethals, Mieke; Locorotondo, Sabrina; Lazzarino, Frederic; Altamirano Sanchez, Efrain; Huffman, Craig; De Keersgieter, An; Brus, Stephan; Demand, Marc; Struyf, Herbert; De Backer, Johan; Hermans, Jan; Delvaux, Christie; Baudemprez, Bart; Vandeweyer, Tom; Van Roey, Frieda; Baerts, Christina; Goossens, Danny; Dekkers, Harold; Ong, Patrick; Heylen, Nancy; Kellens, Kristof; Volders, Henny; Hikavyy, Andriy; Vrancken, Christa; Rakowski, Michal; Verhaegen, Staf; Dusa, Mircea; Romijn, Leon; Pigneret, Charles; van Dijk, Andre; Schreutelkamp, Rob; Cockburn, Andrew; Gravey, Virginie; Meiling, H.; Hultermans, B.; Lok, S.; Shah, K.; Rajagopalan, R.; Gelatos, J.; Richard, Olivier; Bender, Hugo; Vandenberghe, Geert; Beyer, Gerald; Absil, Philippe; Hoffmann, Thomas Y.; Ronse, Kurt; Biesemans, Serge (2009-12) -
Development of a dielectric CMP process for replacement gate applications
Devriendt, Katia; Ong, Patrick; Kellens, Kristof; Veloso, Anabela; Crabbe, Yvo; Brus, Stephan; Claes, Martine; Leunissen, Peter (2010) -
Development of a SEM based methodology for the detection of sub-surface voids in nano-interconnects
Carbonell, Laure; Caluwaerts, Rudy; Heylen, Nancy; Volders, Henny; Kellens, Kristof; Tokei, Zsolt; Takada, S; Ban, N; Ishimoto, T; Suzuki, N.; Umehara, S. (2012) -
Dielectric reliability of 50nm 1/2 pitch structures in Aurora® LK
Demuynck, Steven; Kim, Hongun; Huffman, Craig; Darnon, Maxime; Struyf, Herbert; Versluijs, Janko; Claes, Martine; Vereecke, Guy; Volders, Henny; Heylen, Nancy; Kellens, Kristof; Beyer, Gerald (2008) -
Dielectric reliability of 50nm half pitch structures in Aurora® LK
Demuynck, Steven; Kim, Honggun; Huffman, Craig; Darnon, Maxime; Struyf, Herbert; Versluijs, Janko; Claes, Martine; Vereecke, Guy; Verdonck, Patrick; Volders, Henny; Heylen, Nancy; Kellens, Kristof; De Roest, David; Sprey, Hessel; Beyer, Gerald (2009) -
Dielectric reliability of 70 nm pitch air-gap interconnect structures
Pantouvaki, Marianna; Sebaai, Farid; Kellens, Kristof; Goossens, Danny; Vereecke, Bart; Versluijs, Janko; Van Besien, Els; Caluwaerts, Rudy; Marrant, Koen; Bender, Hugo; Moussa, Alain; Struyf, Herbert; Beyer, Gerald (2011) -
Dual-channel technology with Cap-free single metal gate for high performance CMOS in gate-first and gate-last integration
Witters, Liesbeth; Mitard, Jerome; Veloso, Anabela; Hikavyy, Andriy; Franco, Jacopo; Kauerauf, Thomas; Cho, Moon Ju; Schram, Tom; Sebaai, Farid; Yamaguchi, Shinpei; Takeoka, S.; Fukuda, Masahiro; Wang, Wei-E; Duriez, Blandine; Eneman, Geert; Loo, Roger; Kellens, Kristof; Tielens, Hilde; Favia, Paola; Rohr, Erika; Hellings, Geert; Bender, Hugo; Roussel, Philippe; Crabbe, Yvo; Brus, Stephan; Mannaert, Geert; Kubicek, Stefan; Devriendt, Katia; De Meyer, Kristin; Ragnarsson, Lars-Ake; Steegen, An; Horiguchi, Naoto (2011) -
Fabrication of a micro-lens array for Reflective Electron Beam Lithography
Vereecke, Bart; Haspeslagh, Luc; Lazzarino, Frederic; Miller, Andy; Kellens, Kristof; Dekkers, Harold; Freed, Regina; Grella, L. (2011) -
Gate-last vs. gate-first technology for aggressively scaled EOT Logic/RF CMOS
Veloso, Anabela; Ragnarsson, Lars-Ake; Cho, Moon Ju; Devriendt, Katia; Kellens, Kristof; Sebaai, Farid; Suhard, Samuel; Brus, Stephan; Crabbe, Yvo; Schram, Tom; Rohr, Erika; Paraschiv, Vasile; Eneman, Geert; Kauerauf, Thomas; Dehan, Morin; Hong, Sug-Hun; Yamaguchi, Shinpei; Takeoka, Shinji; Higuchi, Yuichi; Tielens, Hilde; Van Ammel, Annemie; Favia, Paola; Bender, Hugo; Franquet, Alexis; Conard, Thierry; Li, X.; Pey, K.-L.; Struyf, Herbert; Mertens, Paul; Absil, Philippe; Horiguchi, Naoto; Hoffmann, Thomas Y. (2011) -
High yield sub-0.1μm² 6T-SRAM Cells, featuring high-k/metal-gate Finfet devices, double gate patterning, a novel Fin etch strategy, full-field EUV lithography and optimized junction design & layout
Horiguchi, Naoto; Demuynck, Steven; Ercken, Monique; Locorotondo, Sabrina; Lazzarino, Frederic; Altamirano Sanchez, Efrain; Huffman, Craig; Brus, Stephan; Demand, Marc; Struyf, Herbert; De Backer, Johan; Hermans, Jan; Delvaux, Christie; Vandeweyer, Tom; Baerts, Christina; Mannaert, Geert; Truffert, Vincent; Verluijs, j; Alaerts, Wilfried; Dekkers, Harold; Ong, Patrick; Heylen, Nancy; Kellens, Kristof; Volders, Henny; Hikavyy, Andriy; Vrancken, Christa; Rakowski, Michal; Verhaegen, Staf; Vandenberghe, Geert; Beyer, Gerald; Lauwers, Anne; Absil, Philippe; Hoffmann, Thomas Y.; Ronse, Kurt; Biesemans, Serge (2010) -
Highly scalable effective work function engineering approach for multi-VT modulation of planar and FinFET-based RMG high-k last devies for (sub-)22nm nodes
Veloso, Anabela; Boccardi, Guillaume; Ragnarsson, Lars-Ake; Higuchi, Yuichi; Lee, Jae Won; Simoen, Eddy; Roussel, Philippe; Cho, Moon Ju; Chew, Soon Aik; Schram, Tom; Dekkers, Harold; Van Ammel, Annemie; Witters, Thomas; Brus, Stephan; Dangol, Anish; Paraschiv, Vasile; Vecchio, Emma; Shi, Xiaoping; Sebaai, Farid; Kellens, Kristof; Heylen, Nancy; Devriendt, Katia; Richard, Olivier; Bender, Hugo; Chiarella, Thomas; Arimura, Hiroaki; Thean, Aaron; Horiguchi, Naoto (2013) -
Implementation of Ru based barriers in 50 nm half pitch single damascene Cu/SiCOH (k=2.5) structures
Carbonell, Laure; Volders, Henny; Heylen, Nancy; Kellens, Kristof; Tokei, Zsolt; Hendrickx, Dirk; Struyf, Herbert; Vandervorst, Alain; Claes, Martine; Lux, Marcel; Versluijs, Janko; Alaerts, Wilfried; Van Besien, Els; Deweerdt, Bruno; Vaes, Jan; Caluwaerts, Rudy; Cockburn, Andrew; Gravey, Virginie; Shah, Kavita; Al-Bayati, A.; Fu, X.; Lubben, D.; Sundarrajan, A.; Beyer, Gerald (2008)