Browsing by author "Verbeeck, Rita"
Now showing items 1-20 of 23
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90nm RF CMOS technology for low-power 900MHz applications
Ramos, Javier; Mercha, Abdelkarim; Jeamsaksiri, Wutthinan; Linten, Dimitri; Jenei, Snezana; Rooyackers, Rita; Verbeeck, Rita; Thijs, Steven; Scholten, Andries; Wambacq, Piet; Debusschere, Ingrid; Decoutere, Stefaan (2004) -
A low cost 90nm RF-CMOS platform for record RF circuit performance
Jeamsaksiri, Wutthinan; Linten, Dimitri; Thijs, Steven; Carchon, Geert; Ramos, Javier; Mercha, Abdelkarim; Sun, Xiao; Soussan, Philippe; Dehan, Morin; Chiarella, Thomas; Venegas, Rafael; Subramanian, Vaidy; Scholten, A.; Wambacq, Piet; Velghe, Rudolf; Mannaert, Geert; Heylen, Nancy; Verbeeck, Rita; Boullart, Werner; Heyvaert, Ilse; Mahadeva Iyer, Natarajan; Groeseneken, Guido; Debusschere, Ingrid; Biesemans, Serge; Decoutere, Stefaan (2005-06) -
A manufacturable process to improve thermal stability of 0.25-µm cobalt silicided poly gate
Wang, Qingfeng; Lauwers, A.; Deweerdt, Bruno; Verbeeck, Rita; Loosen, Fred; Maex, Karen (1995) -
CMOS integration of dual work function phase controlled Ni FUSI with simultaneous integration of nMOS (NiSi) and pMOS (Ni-rich silicide) gates on HfSiON
Lauwers, Anne; Veloso, Anabela; Hoffmann, Thomas Y.; Van Dal, Mark; Vrancken, Christa; Brus, Stephan; Locorotondo, Sabrina; de Marneffe, Jean-Francois; Sijmus, Bram; Kubicek, Stefan; Chiarella, Thomas; Kmieciak, Malgorzata; Opsomer, Karl; Niwa, Masaaki; Mitsuhashi, Riichirou; Kottantharayil, Anil; Yu, HongYu; Demeurisse, Caroline; Verbeeck, Rita; de Potter de ten Broeck, Muriel; Absil, Philippe; Maex, Karen; Jurczak, Gosia; Biesemans, Serge; Kittl, Jorge (2005-12) -
Confined chemical cleaning: a novel concept evaluated for front end of line applications
Vos, Ingrid; Peeters, Stefan; Verbeeck, Rita; Boullart, Werner; Vertommen, Johan (2008) -
Dose enhancement due to interconnects in deep-submicron MOSFETs exposed to X-rays
Griffoni, Alessio; Silvestri, Marco; Gerardin, Simone; Meneghesso, Gaudenzio; Paccagnella, Alessandro; Kaczer, Ben; de Potter de ten Broeck, Muriel; Verbeeck, Rita; Nackaerts, Axel (2009) -
Dose enhancement due to interconnects in deep-submicron MOSFETs exposed to X-rays
Griffoni, Alessio; Silvestri, Marco; Gerardin, Simone; Meneghesso, Gaudenzio; Paccagnella, Alessandro; Kaczer, Ben; de Potter de ten Broeck, Muriel; Verbeeck, Rita; Nackaerts, Axel (2008) -
Electrical transport in (100)CoSi2/Si contacts
Lauwers, A.; Kyllesbech Larsen, K.; Van Hove, Marleen; Verbeeck, Rita; Maex, Karen; Van Rossum, Marc; Vercaemst, A.; Van Meirhaeghe, R.; Cardon, F. (1995) -
Etching of CoSi2 in HF-based solutions
Alves Donaton, Ricardo; Lokere, K.; Verbeeck, Rita; Maex, Karen (1995) -
Formation of deep submicrometer cobalt silicated poly gate using bilayer processes
Wang, Qingfeng; Lauwers, Anne; Deweerdt, Bruno; Verbeeck, Rita; Maex, Karen (1995) -
FUSI specific yield monitoring enabling improved circuit performance and fast feedback to production
Chiarella, Thomas; Rosmeulen, Maarten; Tigelaar, Howard; Kerner, Christoph; Nackaerts, Axel; Ramos, Javier; Lauwers, Anne; Veloso, Anabela; Jurczak, Gosia; Rothschild, Aude; Witters, Liesbeth; Yu, HongYu; Kittl, Jorge; Verbeeck, Rita; de Potter de ten Broeck, Muriel; Debusschere, Ingrid; Absil, Philippe; Biesemans, Serge; Hoffmann, Thomas Y. (2007-03) -
Materials issues of Ni fully silicided (FUSI) gates for CMOS applications
Kittl, Jorge; Lauwers, Anne; Kmieciak, Malgorzata; Demeurisse, Caroline; Kottantharayil, Anil; Veloso, Anabela; Van Dal, Mark; Schram, Tom; Brijs, Bert; Kaiser, M.; Kubicek, Stefan; Cunniffe, John; Verbeeck, Rita; Vrancken, Christa; Biesemans, Serge; Maex, Karen (2005-05) -
Morphology of corrosion pits in aluminum thin film metallization
Proost, Joris; Baklanov, Mikhaïl; Verbeeck, Rita; Maex, Karen (1998) -
New CoSi2 SALICIDE technology for 0.1 µm processes and below
Wang, Qingfeng; Maex, Karen; Kubicek, Stefan; Jonckheere, Rik; Kerkwijk, Bas; Verbeeck, Rita; Biesemans, Serge; De Meyer, Kristin (1995) -
On the formation of silicides on polyrunners with topography by a two-step silicidation process
Jonckx, Franky; Verbeeck, Rita; Deweerdt, Bruno; Maex, Karen (1995) -
Optimization of HfSiON using a design of experiment (DOE) approach
Rothschild, Aude; Mitsuhashi, Riichirou; Kerner, Christoph; Shi, Xiaoping; Everaert, Jean-Luc; Date, Lucien; Conard, Thierry; Richard, Olivier; Vrancken, Evi; Verbeeck, Rita; Veloso, Anabela; Lauwers, Anne; de Potter de ten Broeck, Muriel; Debusschere, Ingrid; Jurczak, Gosia; Niwa, Masaaki; Absil, Philippe; Biesemans, Serge (2007) -
Reliability study of reference semiconductor encapsulation materials for biocompatible packaging
Malachowski, Karl; Qian, Karen; Op de Beeck, Maaike; Verbeeck, Rita; Bryce, George; Dekkers, Harold; Sabuncuoglu Tezcan, Deniz (2012) -
Self-aligned PtSi fully silicided (FUSI) metal gates for 45 nm CMOS applications
Van Dal, Mark; Lauwers, Anne; Cunniffe, John; Verbeeck, Rita; Vrancken, Christa; Demeurisse, Caroline; Dao, T.; Tamminga, Y.; Veloso, Anabela; Kittl, Jorge; Maex, Karen (2005-05) -
Transistor optimisation for a low cost, high performance 0.13 μm CMOS technology
Augendre, Emmanuel; Kubicek, Stefan; De Keersgieter, An; Mertens, Sofie; Lindsay, Richard; Verbeeck, Rita; Van Laer, Joris; Dupas, Luc; Badenes, Gonçal (2002) -
Transistor optimisation for a low-cost, high-performance 0.13 μm CMOS technology
Augendre, Emmanuel; Kubicek, Stefan; De Keersgieter, An; Mertens, S.; Lindsay, Richard; Verbeeck, Rita; Van Laer, Joris; Dupas, Luc; Badenes, Gonçal (2001)