Browsing by author "Van Elshocht, Sven"
Now showing items 41-60 of 408
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Atomic layer deposition of gadolinium aluminate layers using Gd(iPrCp)3, TMA, and O3 or H2O
Adelmann, Christoph; Pierreux, Dieter; Swerts, Johan; Dewulf, Daan; Hardy, An; Tielens, Hilde; Franquet, Alexis; Brijs, Bert; Moussa, Alain; Conard, Thierry; Van Bael, Marlies; Maes, Jan; Jurczak, Gosia; Kittl, Jorge; Van Elshocht, Sven (2010) -
Atomic layer deposition of Gd-doped HfO2 thin films
Adelmann, Christoph; Tielens, Hilde; Dewulf, Daan; Hardy, An; Pierreux, Dieter; Swerts, Johan; Rosseel, Erik; Shi, Xiaoping; Van Bael, Marlies; Kittl, Jorge; Van Elshocht, Sven (2010) -
Atomic layer deposition of Gd2O3 and Sc2O3 on In0.53Ga0.47As: Interfacial layer engineering
Ameen, Mahmoud; Nyns, Laura; Lin, Dennis; Ivanov, Tsvetan; Conard, Thierry; Meersschaut, Johan; Sioncke, Sonja; Feteha, Mohamed; Van Elshocht, Sven; Delabie, Annelies (2014) -
Atomic layer deposition of GdAlOx and GdHfOx using Gd(iPr-Cp)3
Adelmann, Christoph; Pierreux, Dieter; Swerts, Johan; Kesters, Jurgen; Richard, Olivier; Conard, Thierry; Franquet, Alexis; Tielens, Hilde; Afanasiev, Valeri; Schaekers, Marc; Van Elshocht, Sven (2009) -
Atomic layer deposition of GdHfOx thin films
Adelmann, Christoph; Pierreux, Dieter; Swerts, Johan; Rosseel, Erik; Shi, Xiaoping; Tielens, Hilde; Kesters, Jurgen; Van Elshocht, Sven; Kittl, Jorge (2009) -
Atomic layer deposition of hafnium based gate dielectric layers for CMOS applications
Delabie, Annelies; Nyns, Laura; Bellenger, Florence; Caymax, Matty; Conard, Thierry; Franquet, Alexis; Houssa, Michel; Lin, Dennis; Meuris, Marc; Ragnarsson, Lars-Ake; Sioncke, Sonja; Swerts, Johan; Fedorenko, Yanina; Maes, Jan; Van Elshocht, Sven; De Gendt, Stefan (2007) -
Atomic layer deposition of hafnium oxide on Ge and GaAs substrates: precursors and surface preparation
Delabie, Annelies; Brunco, David; Conard, Thierry; Favia, Paola; Bender, Hugo; Franquet, Alexis; Sioncke, Sonja; Vandervorst, Wilfried; Van Elshocht, Sven; Heyns, Marc; Meuris, Marc; Kim, Eunji; McIntyre, Paul C.; Saraswat, Krishna C.; LeBeau, James M.; Cagnon, Joel; Stemmer, Susanne; Tsai, Wilman (2008) -
Atomic layer deposition of hafnium titanates dielectric layers
Popovici, Mihaela Ioana; Delabie, Annelies; Van Elshocht, Sven; Menou, Nicolas; Wang, Xin Peng; Wouters, Dirk; Kittl, Jorge; Swerts, Johan; Knaepen, W.; Detavernier, Christophe (2008) -
Atomic layer deposition of Hf-based materials in semiconductor applications
Nyns, Laura; Delabie, Annelies; Heyns, Marc; Pourtois, Geoffrey; Van Elshocht, Sven; Vinckier, Chris; De Gendt, Stefan (2008) -
Atomic layer deposition of HfO2 on (100) and (110) oriented silicon surfaces
Nyns, Laura; Ragnarsson, Lars-Ake; Hall, Lindsey; Delabie, Annelies; Heyns, Marc; Van Elshocht, Sven; Vinckier, Chris; Zimmerman, Paul; De Gendt, Stefan (2007) -
Atomic layer deposition of HfO2 on single walled carbon nanotubes
Liyanage, Lucky; Cott, Daire; Delabie, Annelies; Van Elshocht, Sven; Wong, Philip (2011) -
Atomic layer deposition of high-k dDielectrics on single-walled carbon nanotubes: a Raman study
Liyanage, Luckshitha; Cott, Daire; Delabie, Annelies; Van Elshocht, Sven; Bao, Zhenan; Wong, Philip (2013) -
Atomic layer deposition of high-k dielectric layers on Ge and III-V MOS channels
Delabie, Annelies; Alian, AliReza; Bellenger, Florence; Brammertz, Guy; Brunco, David; Caymax, Matty; Conard, Thierry; Franquet, Alexis; Houssa, Michel; Sioncke, Sonja; Van Elshocht, Sven; van Hemmen, J.L.; Keuning, W.; Kessels, W.M.M.; Afanas'ev, V.V.; Stesmans, Andre; Heyns, Marc; Meuris, Marc (2008) -
Atomic layer deposition of high-k dielectric layers on Ge and III-V MOS channels
Delabie, Annelies; Caymax, Matty; Bellenger, Florence; Brammertz, Guy; Conard, Thierry; Houssa, Michel; Sioncke, Sonja; Van Elshocht, Sven; Heyns, Marc; Meuris, Marc; Brunco, David; van Hemmen, J.L.; Keuning, W.; Kessels, W.M.M.; Afanas'ev, V.V.; Stesmans, Andre (2008) -
Atomic layer deposition of high-k dielectric layers on single-walled carbon nanotubes
Cott, Daire; Liyanage, Luckshitha; Delabie, Annelies; Adelmann, Christoph; Van Elshocht, Sven; Wong, Hon- Sum Philip (2012) -
Atomic layer deposition of Ru thin films using the zero-valence precursor EBECH Ru
Adelmann, Christoph; Popovici, Mihaela Ioana; Groven, Benjamin; Moens, Kristof; Meersschaut, Johan; Franquet, Alexis; Swerts, Johan; Delabie, Annelies; Van Elshocht, Sven (2014) -
Atomic layer deposition of ruthenium for advanced interconnect applications
Adelmann, Christoph; Popovici, Mihaela Ioana; Groven, Benjamin; Wen, Liang Gong; Dutta, Shibesh; Boemmels, Juergen; Tokei, Zsolt; Van Elshocht, Sven (2016) -
Atomic layer deposition of ruthenium thin films from (ethylbenzyl) (1-ethyl-1,4-cyclohexadienyl) Ru: process characteristics, surface chemistry, and film properties
Popovici, Mihaela Ioana; Groven, Benjamin; Marcoen, Kristof; Phung, Quan; Dutta, Shibesh; Swerts, Johan; Meersschaut, Johan; Van den Berg, Jaap; Franquet, Alexis; Moussa, Alain; Vanstreels, Kris; Lagrain, Pieter; Bender, Hugo; Jurczak, Gosia; Van Elshocht, Sven; Delabie, Annelies; Adelmann, Christoph (2017) -
Atomic layer deposition of ruthenium with TiN interface for sub-10nm advanced interconnects beyond copper
Wen, Liang Gong; Roussel, Philippe; Varela Pedreira, Olalla; Briggs, Basoene; Groven, Benjamin; Dutta, Shibesh; Popovici, Mihaela Ioana; Heylen, Nancy; Ciofi, Ivan; Vanstreels, Kris; Osterberg, Frederik; Hansen, Ole; Petersen, Dirch H.; Opsomer, Karl; Detavernie, Christophe; Wilson, Chris; Van Elshocht, Sven; Croes, Kristof; Bommels, Jurgen; Tokei, Zsolt; Adelmann, Christoph (2016-09) -
Atomic layer deposition of scandium-based oxides
Nyns, Laura; Lisoni, Judit; Van den Bosch, Geert; Van Elshocht, Sven; Van Houdt, Jan (2013)