Browsing by author "Tokei, Zsolt"
Now showing items 41-60 of 502
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Application of a nano-mechanical sensor to monitor stress in copper damascene interconnects
Wilson, Chris; Croes, Kristof; Tokei, Zsolt; Vereecke, Bart; Beyer, Gerald; O'Neill, A.G.; Horsfall, A.B. (2009) -
Applications of smart monomolecular films in IC microelectronics for organic-inorganic interface engineering
Armini, Silvia; Herregods, Sebastiaan; Lecordier, Laurent; Verheyen, Claudia; Delande, Tinne; Demeurisse, Caroline; Spampinato, Valentina; Tokei, Zsolt; Struyf, Herbert (2017) -
Area selective atomic layer deposition: a bottom-up approach for patterning
Delabie, Annelies; Soethoudt, Job; Tomczak, Yoann; Briggs, Basoene; Chan, BT; Tokei, Zsolt; Van Elshocht, Sven; Altamirano Sanchez, Efrain; Stevens, Eric; Parsons, Gregory, N (2018) -
As-grown donor-like traps in low-k dielectrics and their impact on intrinsic TDDB reliability
Tang, Baojun; Croes, Kristof; Barbarin, Yohan; Wang, Yunqi; Degraeve, Robin; Li, Yunlong; Toledano Luque, Maria; Kauerauf, Thomas; Boemmels, Juergen; Tokei, Zsolt; De Wolf, Ingrid (2014) -
Atomic layer deposited barriers for copper interconnects
Schuhmacher, Jorg; Martin Hoyas, Ana; Ernur, Didem; Tokei, Zsolt; Travaly, Youssef; Bruynseraede, Christophe; Satta, Alessandra; Whelan, Caroline; Shamiryan, Denis; Beyer, Gerald; Abell, Thomas; Sutcliffe, Victor; Schaekers, Marc; Maex, Karen (2004) -
Atomic layer deposition of Ru and RuO2 for MIMCAP applications
Zhao, Chao; Pawlak, Malgorzata; Popovici, Mihaela Ioana; Schaekers, Marc; Sleeckx, Erik; Vancoille, Eric; Wouters, Dirk; Tokei, Zsolt; Kittl, Jorge (2009) -
Atomic layer deposition of Ru and RuO2 for MIMCAP applications
Zhao, Chao; Pawlak, Malgorzata; Schaekers, Marc; Sleeckx, Erik; Vancoille, Eric; Wouters, Dirk; Tokei, Zsolt; Kittl, Jorge (2009) -
Atomic layer deposition of ruthenium for advanced interconnect applications
Adelmann, Christoph; Popovici, Mihaela Ioana; Groven, Benjamin; Wen, Liang Gong; Dutta, Shibesh; Boemmels, Juergen; Tokei, Zsolt; Van Elshocht, Sven (2016) -
Atomic layer deposition of ruthenium with TiN interface for sub-10nm advanced interconnects beyond copper
Wen, Liang Gong; Roussel, Philippe; Varela Pedreira, Olalla; Briggs, Basoene; Groven, Benjamin; Dutta, Shibesh; Popovici, Mihaela Ioana; Heylen, Nancy; Ciofi, Ivan; Vanstreels, Kris; Osterberg, Frederik; Hansen, Ole; Petersen, Dirch H.; Opsomer, Karl; Detavernie, Christophe; Wilson, Chris; Van Elshocht, Sven; Croes, Kristof; Bommels, Jurgen; Tokei, Zsolt; Adelmann, Christoph (2016-09) -
Barrier deposition for advanced interconnects
Schaekers, Marc; Tokei, Zsolt; Li, Yong-Li; Carbonell, Laure (2007) -
Barrier integrity and reliablility in copper low-k interconnects
Tokei, Zsolt (2005) -
Barrier integrity effect on leakage mechanism and dielectric reliability of copper/OSG interconnects
Li, Yunlong; Tokei, Zsolt; Mandrekar, T.; Mebarki, Bencherki; Groeseneken, Guido; Maex, Karen (2005) -
Barrier process development for damascene integration of porous SiLK resin films
Tokei, Zsolt; Waeterloos, Joost; Iacopi, Francesca; Caluwaerts, Rudy; Struyf, Herbert; Van Aelst, Joke; Maex, Karen (2002) -
Barrier reliability for Cu contacts
Zhao, Chao; Demuynck, Steven; Van den Bosch, Geert; Tokei, Zsolt; Beyer, Gerald (2007) -
Barrier reliability of ALD TaN on sub-100 nm copper low-k interconnects
Tokei, Zsolt; Gailledrat, Thomas; Li, Yunlong; Schuhmacher, Jorg; Mandrekar, T.; Guggilla, S.; Mebarki, B.; Maex, Karen (2005) -
Barrier reliability on sub-100nm copper low-k interconnects
Tokei, Zsolt; Gailledrat, T.; Li, Yunlong; Schuhmacher, Jorg; Mandrekar, T.; Guggilla, S.; Mebarki, Bencherki; Maex, Karen (2004) -
Barrier studies on porous silk semiconductor dielectric
Tokei, Zsolt; Iacopi, Francesca; Richard, Olivier; Waeterloos, Joost; Rozeveld, S.; Beach, E.; Mebarki, Bencherki; Mandrekar, T.; Guggilla, S.; Maex, Karen (2003) -
Barrier/liner stacks for scaling the Cu interconnect metallization
van der Veen, Marleen; Jourdan, Nicolas; Vega Gonzalez, Victor; Wilson, Chris; Heylen, Nancy; Varela Pedreira, Olalla; Struyf, Herbert; Croes, Kristof; Boemmels, Juergen; Tokei, Zsolt (2016) -
Barriers for Cu/low k damascene structures
Maex, Karen; Tokei, Zsolt; Satta, Alessandra; Lanckmans, Filip; Wu, Wen; Iacopi, Francesca (2001) -
Benchmarking on-chip optical against electrical interconnect for high-performance applications
Stucchi, Michele; Cosemans, Stefan; Van Campenhout, Joris; Tokei, Zsolt; Beyer, Gerald (2011)