Browsing Conference contributions by author "Vaglio Pret, Alessandro"
Now showing items 1-20 of 36
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A compact physical CD-SEM simulator for IC photolithography modeling applications
Fang, Chao; Smith, Mark D; Vaglio Pret, Alessandro; Biafore, John; Robertson, Steward A; Bekaert, Joost (2014) -
Bridging lithography processes with NAND flash ECC complexity
Poliakov, Pavel; Blomme, Pieter; Vaglio Pret, Alessandro; Miranda Corbalan, Miguel; Van Houdt, Jan; Dehaene, Wim (2011-06) -
Challenges in LER/CDU metrology in DSA: placement error and cross-line correlations
Constantoudis, Vassilios; Kuppuswamy, V.K.M.; Gogolides, Evangelos; Vaglio Pret, Alessandro; Pathangi Sriraman, Hari; Gronheid, Roel (2016) -
Characterizing and modeling electrical response to light for metal based EUV photoresists
Vaglio Pret, Alessandro; Kocsis, Michael; De Simone, Danilo; Vandenberghe, Geert; Stowers, Jason; Giglia, Angelo; De Schepper, Peter; Mani, Antonio; Biafore, John J. (2016) -
Comparative stochastic process variation bands for N7, N5, and N3 at EUV
Vaglio Pret, Alessandro; Graves, Trey; Blankenship, David; Bai, Kunlun; Robertson, Stewart; De Bisschop, Peter; Biafore, J. (2018) -
Contact edge roughness and CD uniformity in EUV: effect of photo acid generator and sensitizer
Kuppuswamy, Vijaya-Kumar Murugesan; Constantoudis, Vassilios; Gogolides, Evangelos; Vaglio Pret, Alessandro; Gronheid, Roel (2012) -
Contact-edge roughness (CER) characterization and modeling: effect of dose on CER and crtitical dimension uniformity
Kuppuswamy, Vijaya-Kumar Murugesan; Constantoudis, Vassilios; Gogolides, Evangelos; Gronheid, Roel; Vaglio Pret, Alessandro (2011) -
Dry etching challenges for patterning smooth lines : LWR reduction of extreme ultra violet photo resist
Altamirano Sanchez, Efrain; Vaglio Pret, Alessandro; Gronheid, Roel; Boullart, Werner (2012) -
DSA graphoepitaxy calibrations for contact hole multiplication
Graves, Trey; Vaglio Pret, Alessandro; Robertson, Stuart; Smith, Mark; Doise, Jan; Bekaert, Joost; Gronheid, Roel (2015) -
EUV RLS performance tradeoffs for a polymer bound PAG resist
Gronheid, Roel; Vaglio Pret, Alessandro; Rathsack, Benjamin; Hooge, Joshua; Scheer, Steven; Nafus, Kathleen; Shite, Hideo; Kitano, Junichi (2010) -
EUV RLS performance tradeoffs for a polymer bound PAG resist process
Rathsack, Ben; Hooge, Josh; Somervell, Mark; Scheer, Steve; Nafus, Kathleen; Shite, Hideo; Bradon, Neil; Kitano, Junichi; Gronheid, Roel; Vaglio Pret, Alessandro (2009) -
Hydrogen plasma treatment: the evolution of roughness in frequency domain
De Schepper, Peter; Vaglio Pret, Alessandro; Altamirano Sanchez, Efrain; El Otell, Ziad; De Gendt, Stefan (2014) -
Impact of EUV mask surface roughness on LER
Vaglio Pret, Alessandro; Gronheid, Roel; Younkin, Todd; Leeson, Michael J.; Yan, Pei-Yang (2012) -
Impact of mask line roughness in EUV lithography
Vaglio Pret, Alessandro; Gronheid, Roel; Graves, Trey; Smith, Mark D.; Biafore, John (2011) -
Impact of post-litho LWR smoothing processes on the post-etch patterning result
Foubert, Philippe; Vaglio Pret, Alessandro; Altamirano Sanchez, Efrain; Gronheid, Roel (2011) -
Impact of stochastic effects on EUV printability limits
De Bisschop, Peter; Van de Kerkhove, Jeroen; Mailfert, Julien; Vaglio Pret, Alessandro; Biafore, John (2014) -
Influence and evolution of 193i resist composition during VUV exposure
Kunnen, Eddy; Vaglio Pret, Alessandro; Verdonck, Patrick; Gronheid, Roel (2012) -
Investigation of interactions between metrology and lithography with a CD SEM simulator
Smith, Mark D.; Fang, Chao; Biafore, John J.; Vaglio Pret, Alessandro; Robinson, Stewart A. (2014) -
Line edge and width roughness mitigation at 22nm half pitch: plasma polymer interaction and roughness mitigation through etch
De Schepper, Peter; Hansen, Terje; Vaglio Pret, Alessandro; Altamirano Sanchez, Efrain; Boullart, Werner; De Gendt, Stefan (2013) -
Line edge and width roughness smoothing by plasma treatment
De Schepper, Peter; Hansen, Terje; Altamirano Sanchez, Efrain; Vaglio Pret, Alessandro; Boullart, Werner; De Gendt, Stefan (2013)