Browsing by Author "Laubis, Christian"
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Publication AlGaN-on-Si-based 10-um pixel-to-pixel pitch hybrid imagers for the EUV range
Journal article2011, IEEE Electron Device Letters, (32) 11, p.1561-1563Publication Alternative materials for high numerical aperture extreme ultraviolet lithography mask stacks
Proceedings paper2015, Extreme Ultraviolet (EUV) Lithography VI, 22/02/2015, p.94220IPublication Assessing stability of metal tellurides as alternative photomask materials for extreme ultraviolet lithography
Journal article2019, Journal of Vacuum Science and Technology B, (37) 6, p.61607Publication Characterization of optical material properties for alternative EUV mask absorber materials
Proceedings paper2016, European Mask and Lithography Conference - EMLC, 21/06/2016Publication CNTs in the context of EUV pellicle history
Proceedings paper2018, SPIE Advanced Lithogarphy, 25/02/2018, p.105831EPublication EUV optical characterization of alternative membrane materials
Proceedings paper2017, Photomask Technology, 11/09/2017, p.104510RPublication Evaluation of optical material parameters for advanced absorbers on EUV masks
Oral presentation2016, International Symposium on Extreme Ultraviolet Lithography - EUVLPublication Mask absorber development to enable next-generation EUVL
; ; ; ; ; Detavernier, ChristopheProceedings paper2019, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology, 23/04/2019, p.111780FPublication Mitigating EUV mask 3D effects by alternative metal absorbers
Proceedings paper2016, International Symposium on Extreme Ultraviolet Lithography - EUVL, 24/10/2016Publication Ni-Al alloys as alternative EUV mask absorber
Journal article2018, Applied Sciences, (8) 4, p.521Publication Novel EUV mask absorber evaluation in support of next-generation EUV imaging
Proceedings paper2018, Photomask Technology 2018, 17/09/2018, p.108100CPublication On the optical constants of cobalt in the M-absorption edge region
Journal article2023, OPTIK, (273) February, p.Art.: 170455Publication Precise optical constants: determination and impact on metrology, simulation and development of EUV masks
Publication Reducing EUV mask 3D effects by alternative metal absorbers
; ; ; ; Evanschitzky, PeterJournal article2017, Journal of Micro/Nanolithography MEMS and MOEMS, (16) 4, p.41002Publication Single element and metal alloy novel EUV mask absorbers for improved imaging
Proceedings paper2017, International Conference on Extreme Ultraviolet Lithpgraphy - EUVL, 11/09/2017, p.104500GPublication Time-frequency analysis assisted determination of ruthenium optical constants in the sub-EUV spectral range 8 nm-23.75 nm
Journal article2021, OPTICS EXPRESS, (29) 25, p.40993-41013