Browsing by Author "Leeson, Michael"
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Publication Advances in process optimization for dual-tone development as a double patterning technique
Proceedings paper2008, 5th International Symposium on Immersion Lithography Extensions, 22/09/2008Publication Characterisation of EUV resist related outgassing and contamination
Proceedings paper2009, International Symposium on Extreme Ultraviolet Lithography, 18/10/2009Publication Compensation of overlay errors due to mask bending and non-flatness for EUV masks
Publication Development of non-chemically amplified photoresists for extreme ultraviolet (EUV) lithography
Proceedings paper2009, International Symposium on Extreme Ultraviolet Lithography, 18/10/2009Publication EUV resist requirements: absorbance and acid yield
Proceedings paper2009, Advances in Resist Materials and Processing Technology XXVI, 22/02/2009, p.727332Publication EUV secondary electron blur at the 22nm half pitch node
Proceedings paper2011, Extreme Ultravioet (EUV) Lithography II, 27/02/2011, p.796904Publication Evidence of speckle in extreme-UV lithography
Journal article2012-10, Optics Express, (20) 23, p.25970-25978Publication Extreme ultraviolet (EUV) degradation of poly(olefin sulfone)s: towards applications as EUV photoresists
Journal article2011, Radiation Physics and Chemistry, (80) 2, p.236-241Publication Extreme ultraviolet interference lithography as applied to photoresist studies
; Leeson, MichaelJournal article2009, Journal of Micro/Nanolithography, MEMS, and MOEMS, (8) 2, p.21205Publication Feasibility study on dual tone development for frequency doubling
Proceedings paper2008, 5th International Symposium on Immersion Lithography Extensions, 22/09/2008Publication Impact of extreme UV mask flatness on resist roughness
Oral presentation2012, Wilhelm and Else Heraeus Physics SchoolPublication Implementing full field EUV lithography using the ADT
; ; ; ; Proceedings paper2008, International Symposium on Extreme Ultraviolet Lithography - EUVL, 28/09/2008Publication Mask effects on resist variability in extreme ultraviolet lithography
Journal article2013, Japanese Journal of Applied Physics, (52) 6, p.03GC02Publication Mask roughness effects on pattern variability
Oral presentation2012, International Symposium on Extreme Ultraviolet Lithography - EUVLPublication Measurement and analysis of EUV photoresist related outgassing and contamination
Proceedings paper2009, Alternative Lithographic Technologies, 22/02/2009, p.727146Publication Poly(olefin sulfone)s - A materials platform for studying resist derived contamination
Proceedings paper2010, International Symposium on Extreme Ultraviolet Lithography, 18/10/2010Publication Poly(olefin sulfone)s as non-chemically amplified photoresists for extreme ultraviolet (EUV) lithography
Oral presentation2009, 11th Pacific Polymer Conference - PPC11