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Browsing by Author "Santoro, Gaetano"

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    3D-carrier profiling and parasitic resistance analysis in vertically stacked gate-all-around Si nanowire CMOS transistors

    Eyben, Pierre  
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    Ritzenthaler, Romain  
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    De Keersgieter, An  
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    Chiarella, Thomas  
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    Veloso, Anabela  
    Proceedings paper
    2019, IEEE International Electron Devices Meeting - IEDM 2019, 7/12/2019, p.238-241
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    Characterizing immersion lithography micro bridge defects using advanced features of teh SEMVision G3 STAR FIB

    Van Den Heuvel, Dieter  
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    Santoro, Gaetano  
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    Gronheid, Roel  
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    Braggin, Jennifer
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    Rosslee, Craig
    Proceedings paper
    2009, 6th International Symposium on Immersion Lithography Extensions, 22/10/2009
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    CMP of a RU based layer in an advanced Cu low-k stack

    Vaes, Jan
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    Sinapi, Fabrice
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    Hernandez, Jose Luis  
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    Santoro, Gaetano  
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    Nguyen, Olivier
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    Wang, James
    Proceedings paper
    2007-10, International Conference on Planarization CMP Technology - ICPT, 25/10/2007, p.43-48
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    Direct yield prediction from SEM images

    Choona, Lilach
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    Linshiz, Jasmine
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    Pres, Shaul
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    Levant, Boris
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    Tal, Noam
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    Santoro, Gaetano
    Proceedings paper
    2023, Conference on Metrology, Inspection, and Process Control XXXVII, FEB 27-MAR 02, 2023, p.124960Q
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    e-beam metrology of thin resist for high NA EUVL

    Lorusso, Gian  
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    De Simone, Danilo  
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    Zidan, Mohamed  
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    Severi, Joren  
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    Moussa, Alain  
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    Dey, Bappaditya  
    Journal article review
    2023, JAPANESE JOURNAL OF APPLIED PHYSICS, (62) SG, p.Art. SG0808
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    Enabling Non-Actinic EUV Mask Inspection using CNT Pellicle

    Keshet, Mor
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    Gershon, Dor
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    Malul, Uriel
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    Blinder, Yaniv
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    Orr, Yonatan
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    Tam, Aviram
    Proceedings paper
    2021, Conference on Extreme Ultraviolet (EUV) Lithography XII, FEB 22-26, 2021, p.1160910
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    EUV mask defectivity study by existing DUV tools and new EBEAM technology

    Mangan, Shmoolik
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    Jonckheere, Rik  
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    Van Den Heuvel, Dieter  
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    Rozentsvige, Moshe
    Oral presentation
    2010, SPIE Photomask Technology
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    Metrology of Thin Resist for High NA EUVL

    Lorusso, Gian  
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    Beral, Christophe  
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    Bogdanowicz, Janusz  
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    De Simone, Danilo  
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    Hasan, Mahmudul  
    Proceedings paper
    2022, Conference on Metrology, Inspection, and Process Control XXXVI Part of SPIE Advanced Lithography and Patterning Conference, FEB 24-MAY 27, 2022, p.12053OO
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    Micro-bridge defects: characterization and root cause analysis

    Santoro, Gaetano  
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    Van Den Heuvel, Dieter  
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    Braggin, Jennifer
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    Rosslee, Craig
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    Leray, Philippe  
    Proceedings paper
    2010, Metrology, Inspection and Process Control for Microlithography XXIV, 21/02/2010, p.763820
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    Post-direct-CMP dielectric surface copper contamination: quantitative analysis and impact on dielectric breakdown behaviour

    Heylen, Nancy  
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    Li, Yunlong  
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    Kellens, Kristof  
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    Travaly, Youssef
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    Vereecke, Guy  
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    Volders, Henny  
    Proceedings paper
    2009, Advanced Metallization Conference 2008 (AMC2008), 23/09/2008, p.415-429
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    Post-direct-CMP dielectric surface copper contamination: quantitative analysis and impact on dielectric breakdown behaviour

    Heylen, Nancy  
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    Li, Yunlong  
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    Travaly, Youssef
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    Vereecke, Guy  
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    Volders, Henny  
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    Tokei, Zsolt  
    Meeting abstract
    2008, Advanced Metallization Conference - AMC, 23/09/2008
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    Recess metrology challenges for 3D device architectures in advanced technology nodes

    Santoro, Gaetano
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    Houchens, Kevin
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    Bogdanowicz, Janusz  
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    Elizov, Moshe
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    Yaron, Lior
    Proceedings paper
    2022, Conference on Metrology, Inspection, and Process Control XXXVI Part of SPIE Advanced Lithography and Patterning Conference, FEB 24-MAY 27, 2022, p.120530L
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    Scaled, novel effective workfunction metal gate stacks for advanced Low-VT, gate-all-around vertically stacked nanosheet FETs with reduced vertical distance between sheets

    Veloso, Anabela  
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    Simoen, Eddy  
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    Oliveira, Alberto
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    Vaisman Chasin, Adrian  
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    Chen, S.-C.
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    Lin, Y.
    Proceedings paper
    2019, 2019 International Conference on Solid State Devices and Materials (SSDM 2019), 2/09/2019, p.559-560
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    Vertically stacked gate-all-around Si nanowire CMOS transistors with reduced nanowires separation, new work function metal gate solutions, and DC/AC performance optimization

    Ritzenthaler, Romain  
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    Mertens, Hans  
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    Pena, Vanessa  
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    Santoro, Gaetano  
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    Vaisman Chasin, Adrian  
    Proceedings paper
    2018, IEEE International Electron Devices Meeting - IEDM, 2/12/2018, p.508-511
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    Vertically stacked gate-all-around Si nanowire transistors: key process optimizations and ring oscillator demonstration

    Mertens, Hans  
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    Ritzenthaler, Romain  
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    Pena, Vanessa  
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    Santoro, Gaetano  
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    Kenis, Karine  
    Proceedings paper
    2017, IEEE International Electron Devices Meeting - IEDM, 2/12/2017, p.828-831

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