Browsing by Author "Vesters, Yannick"
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Publication Alternative patterning mechanisms for Extreme Ultraviolet Lithography
Oral presentation2018, 14th Chemistry Conference for Young Scientists - ChemCYSPublication Development of main chain scission type photoresists for EUV lithography
Proceedings paper2019, International Conference on Extreme Ultraviolet Lithography 2019, 15/09/2019, p.111470JPublication Dissolution rate monitor tool to measure EUV photoresist dissolution
Journal article2017, Journal of Photopolymer Science and Technology, (30) 6, p.675-681Publication EUV photoresist patterning characterization for imec N7/N5 technology
Proceedings paper2018, Extreme Ultraviolet (EUV) Lithography IX, 26/02/2018, p.105830GPublication Exploring the readiness of EUV photo materials for patterning
Proceedings paper2017, Extreme Ultraviolet (EUV) Lithography VIII, 26/02/2017, p.101430RPublication Inluence of post exposure bake time on EUV photoresist RLS trade-off
Proceedings paper2017, Extreme Ultraviolet (EUV) Lithography VIII, 22/03/2017, p.1014324Publication Light-matter interactions in photoresists for Extreme Ultraviolet Lithography. From conventional chemically amplified resists to alternative photoresists
Vesters, YannickPHD thesis2019-04Publication Molecular modeling of EUV photoresist revealing the effect of chain conformation on line edge roughness formation
Journal article2019, Polymers, (11) 12, p.1923Publication Multi trigger resist for EUV lithography
Journal article2018, Journal of Photopolymer Science and Technology, (31) 2, p.227-232Publication Multi-trigger resist patterning with ASML NXE3300 EUV scanner
Proceedings paper2018, Extreme Ultraviolet (EUV) Lithography IX, 25/02/2018, p.1058308Publication Non-Linearity of the dissolution in advanced EUV photoresist
Publication Photoresist absorption measurement at extreme ultraviolet (EUV) wavelength by thin film transmission method
Journal article2019, Journal of Photopolymer Science and Technology, (32) 1, p.57-66Publication Photoresists in extreme ultraviolet lithography
Journal article2017, Advanced Optical Technologies, (6) 3_4, p.163Publication Role of metal sensitizers for sensitivity improvement in EUV chemically amplified resist
Journal article2019-01, Journal of Photopolymer Science and Technology, (31) 6, p.747-751Publication Sensitizers in EUV chemically amplified resist: mechanism of sensitivity improvement
Proceedings paper2018, Extreme Ultraviolet (EUV) Lithography IX, 25/02/2018, p.1058307Publication Sensitizers in extreme ultraviolet chemically amplified resists: mechanism of sensitivity improvement
Journal article2019-12, Journal of Micro/Nanolithography MEMS and MOEMS, (17) 4, p.43506Publication State-of-the-art of EUV materials for N5 logic and DRAM applications
Proceedings paper2018, International Conference on Extreme Ultraviolet Lithography - EUVL, 16/09/2018, p.108090UPublication The path to better understanding stochastics in EUV photoresist
Journal article2018, Journal of Photopolymer Science and Technology, (31) 5, p.651-655Publication Unraveling the role of secondary electrons upon their interaction with photoresist during EUV exposure
Proceedings paper2017, International Conference on Extreme Ultraviolet Lithography 2017, 11/09/2017, p.104500H-1-104500H-7