Browsing by author "Coenegrachts, Bart"
Now showing items 1-20 of 36
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15nm HP patterning with EUV and SADP: key contributors for improvement of LWR, LER, and CDU
Xu, Kaidong; Souriau, Laurent; Hellin, David; Versluijs, Janko; Wong, Patrick; Vangoidsenhoven, Diziana; Vandenbroeck, Nadia; Dekkers, Harold; Shi, Xiaoping; Albert, Johan; Tan, Chi Lim; Vertommen, Johan; Coenegrachts, Bart; Orain, I.; Kimura, Y.; Wiaux, Vincent; Boullart, Werner (2013) -
45nm nMOSFET with metal gate on thin SiON driving 1150μA/μm and off-state of 10nA/μm
Henson, Kirklen; Lander, Rob; Demand, Marc; Dachs, Charles; Kaczer, Ben; Deweerd, Wim; Schram, Tom; Tokei, Zsolt; Hooker, Jacob; Cubaynes, Florence; Beckx, Stephan; Boullart, Werner; Coenegrachts, Bart; Vertommen, Johan; Richard, Olivier; Bender, Hugo; Vandervorst, Wilfried; Kaiser, M.; Everaert, Jean-Luc; Jurczak, Gosia; Biesemans, Serge (2004) -
Characterization and integration in Cu damascene structures of AURORA, an inorganic low-k dielectric
Alves Donaton, Ricardo; Coenegrachts, Bart; Sleeckx, Erik; Schaekers, Marc; Sophie, Guus; Matsuki, N.; Baklanov, Mikhaïl; Struyf, Herbert; Lepage, Muriel; Vanhaelemeersch, Serge; Beyer, Gerald; Stucchi, Michele; De Roest, David; Maex, Karen (2001) -
Characterization and integration of a new Si-O-C film deposited by CVD
Alves Donaton, Ricardo; Struyf, Herbert; Lepage, Muriel; Coenegrachts, Bart; Stucchi, Michele; De Roest, David; Baklanov, Mikhaïl; Vanhaelemeersch, Serge; Maex, Karen; Gaillard, F.; Xia, L. Q.; Lim, T. H.; Gotuaco, M.; Yieh, E.; Van Autryve, Luc (2001) -
Critical issues in the integration of Copper and low-k dielectrics
Donaton, R. A.; Coenegrachts, Bart; Maex, Karen; Struyf, Herbert; Vanhaelemeersch, Serge; Beyer, Gerald; Richard, Emmanuel; Vervoort, Iwan; Fyen, Wim; Grillaert, Joost; van der Groen, Sonja; Stucchi, Michele; De Roest, David (1999) -
Development of a global planarization process without CMP
Forester, Lynn; Coenegrachts, Bart; Stone, M.; Meynen, Herman; Grillaert, Joost; Van den hove, Luc (1994) -
Etch process development for FLARE(tm) for dual damascene architecture using a N2/O2 plasma
Thompson, Heike; Vanhaelemeersch, Serge; Maex, Karen; Van Ammel, Annemie; Beyer, Gerald; Coenegrachts, Bart; Vervoort, Iwan; Waeterloos, Joost; Struyf, Herbert; Palmans, Roger; Forester, Lynn (1999) -
Fluorocarbon-based passivation in STI plasma etching
Milenin, Alexey; Athimulam, Raja; Demand, Marc; Coenegrachts, Bart (2012) -
Implementation of high-K and metal gate materials for the 45nm node and beyond: gate patterning development
Beckx, Stephan; Demand, Marc; Locorotondo, Sabrina; Henson, K.; Claes, Martine; Paraschiv, Vasile; Shamiryan, Denis; Jaenen, Patrick; Boullart, Werner; De Gendt, Stefan; Biesemans, Serge; Vanhaelemeersch, Serge; Vertommen, Johan; Coenegrachts, Bart (2004) -
Implementation of high-k and metal gate materials for the 45nm node and beyond: gate patterning development
Beckx, Stephan; Demand, Marc; Locorotondo, Sabrina; Henson, Kirklen; Claes, Martine; Paraschiv, Vasile; Shamiryan, Denis; Jaenen, Patrick; Boullart, Werner; De Gendt, Stefan; Biesemans, Serge; Vanhaelemeersch, Serge; Vertommen, Johan; Coenegrachts, Bart (2005-06) -
Integrating a hydrogen silsesquioxane spin-on dielectric in a quarter micron technology
Waeterloos, Joost; Meynen, Herman; Coenegrachts, Bart; Gao, Teng; Grillaert, Joost; Van den hove, Luc (1997) -
Integration HSQ into direct-on-metal approach for 0.25µm technology
Gao, Teng; Witvrouw, Ann; Coenegrachts, Bart; Bruynseraede, Christophe; Van Hove, Marleen; Maex, Karen (1999) -
Integration of a low permittivity spin-on embedded hardmask for Cu/SiLK resin dual damascene
Waeterloos, Joost; Shaffer, E. O.; Stokich, T.; Hetzner, J.; Price, D.; Booms, L.; Donaton, R. A.; Beyer, Gerald; Coenegrachts, Bart; Caluwaerts, Rudy; Struyf, Herbert; Tokei, Zsolt; Vervoort, Iwan; Sjjmus, B.; Vos, I.; Maex, Karen; Komiya, Takayuki; Iwashita, J. M. (2001) -
Integration of Cu and low-K dielectrics: effect of hard mask and dry etch on electrical performance of damascene structures
Donaton, R. A.; Coenegrachts, Bart; Maenhoudt, Mireille; Pollentier, Ivan; Struyf, Herbert; Vanhaelemeersch, Serge; Vos, I.; Meuris, Marc; Fyen, Wim; Beyer, Gerald; Tokei, Zsolt; Stucchi, Michele; Vervoort, Iwan; De Roest, David; Maex, Karen (2001) -
Integration of HSQ in the direct-on-metal approach for 0.25-μm technology
Gao, Teng; Witvrouw, Ann; Coenegrachts, Bart; Bruynseraede, Christophe; Van Hove, Marleen; Maex, Karen (2000) -
Integration of non-etchback low-k methy silsequioxane polymer using electron beam cure
Gao, Teng; Coenegrachts, Bart; Waeterloos, Joost; Van Hove, Marleen; Maex, Karen; Yang, Jiping; Wang, Sharon; Forester, Lynn (1999) -
Integration of unlanded via in a non-etchback SOG direct-on-metal approach in 0.25 micron CMOS process
Gao, Teng; Coenegrachts, Bart; Waeterloos, Joost; Beyer, Gerald; Meynen, Herman; Van Hove, Marleen; Maex, Karen (1998) -
Integration of unlanded via in a non-etchback SOG direct-on-metal approach in 0.25 micron CMOS process
Gao, Teng; Coenegrachts, Bart; Waeterloos, Joost; Beyer, Gerald; Meynen, Herman; Van Hove, Marleen; Maex, Karen (1998) -
Integrations of Cu and low-k dielectrics: effect of hard mask dry etch and post-CMP clean on electrical performance of damascene structures
Donaton, R. A.; Coenegrachts, Bart; Maenhoudt, Mireille; Pollentier, Ivan; Struyf, Herbert; Vanhaelemeersch, Serge; Grillaert, Joost; Fyen, Wim; Beyer, Gerald; Stucchi, Michele; Richard, Emmanuel; Vervoort, Iwan; De Roest, David; Maex, Karen (2000) -
Interlevel dielectric engineering for improved device performance in half-micron CMOS
Forester, Lynn; Collins, Tom; Van den Bosch, Geert; Meynen, Herman; Coenegrachts, Bart; Van den hove, Luc (1994)