Browsing by author "Scholze, Frank"
Now showing items 1-20 of 30
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Actinic characterization of EUV photomasks by EUV scatterometry
Scholze, Frank; Soltwisch, Victor; Ullrich, A.; Philipsen, Vicky; Burger, Sven (2015) -
Alternative materials for high numerical aperture extreme ultraviolet lithography mask stacks
Wood, Obert; Raghunathan, Sudhar; Mangat, Pawitter; Philipsen, Vicky; Luong, Vu; Kearney, Patrick; Verduijn, Erik; Kumar, Aditya; Patil, Suraj; Laubis, Christian; Soltwisch, Victor; Scholze, Frank (2015) -
Assessing stability of metal tellurides as alternative photomask materials for extreme ultraviolet lithography
Luong, Vu; Philipsen, Vicky; Opsomer, Karl; Rip, Jens; Hendrickx, Eric; Heyns, Marc; Detavernier, Christophe; Laubis, Christian; Scholze, Frank (2019) -
Characterization of optical material properties for alternative EUV mask absorber materials
Scholze, Frank; Laubis, Christian; Philipsen, Vicky; Luong, Vu; Edrisi, Arash; Van de Kruijs, Robbert (2016) -
Characterization of Ru4-xTax (x = 1,2,3) alloy as material candidate for EUV low-n mask
Wu, Meiyi; de Marneffe, Jean-Francois; Opsomer, Karl; Detavernier, Christophe; Delabie, Annelies; Naujok, Philipp; Caner, Oezge; Goodyear, Andy; Cooke, Mike; Saadeh, Qais; Soltwisch, Victor; Scholze, Frank; Philipsen, Vicky (2021) -
CNTs in the context of EUV pellicle history
Gallagher, Emily; Timmermans, Marina; Pollentier, Ivan; Lee, Jae Uk; Mariano Juste, Marina; Adelmann, Christoph; Huyghebaert, Cedric; Scholze, Frank; Laubis, Christian (2018) -
Determination of optical constants of thin films in the EUV
Ciesielski, Richard; Saadeh, Qais; Philipsen, Vicky; Opsomer, Karl; Soulie, Jean-Philippe; Wu, Meiyi; Naujok, Philipp; van de Kruijs, Robbert W. E.; Detavernier, Christophe; Kolbe, Michael; Scholze, Frank; Soltwisch, Victor (2022) -
EUV optical characterization of alternative membrane materials
Scholze, Frank; Laubis, Christian; Krumrey, Michael; Timmermans, Marina; Pollentier, Ivan; Gallagher, Emily (2017) -
Evaluation of optical material parameters for advanced absorbers on EUV masks
Scholze, Frank; Laubis, Christian; Philipsen, Vicky; Luong, Vu; Edrisi, Arash; van de Kruijs, Robbert (2016) -
High NA EUV lithography simulation using new calibrated mask model
Wu, Meiyi; Makhotkin, Igor; Philipsen, Vicky; Soltwisch, Victor; Scholze, Frank (2019) -
Imaging impact of multilayer tuning in EUV masks, experimental validation
Philipsen, Vicky; Hendrickx, Eric; Verduijn, Erik; Raghunathan, Sudhar; Wood, Obert; Soltwisch, Victor; Scholze, Frank; Davydova, Natalia; Mangat, Pawitter (2014) -
Improving EUV imaging at tighter pitch using a tuned-ML mask stack
Wood, Obert; Philipsen, Vicky; Soltwisch, Victor; Raghunathan, Sudhar; Verduijn, Erik; Hendrickx, Eric; Scholze, Frank; Mangat, Pawitter (2014) -
Lifetime test on EUV photomask with EBL2
Wu, Chien-ching; Bender, Markus; Jonckheere, Rik; Scholze, Frank; Bekman, Herman; van Putten, Michel; de Zanger, Rory; Ebeling, Rob; Westerhout, Jeroen; Nicolai, Kyri; van Veldhoven, Jacqueline; de Rooij-Lohmann, Veronique; Kievit, Olaf; Deutz, Alex (2019-05) -
Mitigating EUV mask 3D effects by alternative metal absorbers
Philipsen, Vicky; Luong, Vu; Hendrickx, Eric; Erdmann, Andreas; Dongbo, Xu; Evanschitzky, Peter; van de Kruijs, Robbert; Edrisi, Arash; Scholze, Frank; Laubis, Christian; Irmscher, Mathias; Naasz, Sandra (2016) -
Modeling EUV mask using alternative materials for mask 3D effect compensation
Luong, Vu; Philipsen, Vicky; Verduijn, Erik; Scholze, Frank; Hendrickx, Eric; Heyns, Marc; Wood, Obert (2015) -
Nested Sampling aided determination of tantalum optical constants in the EUV spectral range
Saadeh, Qais; Naujok, Philipp; Wu, Meiyi; Philipsen, Vicky; Thakare, Devesh; Scholze, Frank; Buchholz, Christian; Stadelhoff, Christian; Wiesner, Thomas; Soltwisch, Victor (2022) -
Ni-Al alloys as alternative EUV mask absorber
Luong, Vu; Philipsen, Vicky; Hendrickx, Eric; Opsomer, Karl; Detavernier, Christophe; Laubis, Christian; Scholze, Frank; Heyns, Marc (2018) -
Novel EUV mask absorber evaluation in support of next-generation EUV imaging
Philipsen, Vicky; Luong, Vu; Opsomer, Karl; Detavernier, Christophe; Hendrickx, Eric; Erdmann, Andreas; Evanschitzky, Peter; van de Kruijs, Robbert; Heidarnia-Fathabad, Zahra; Scholze, Frank; Laubis, Christian (2018) -
On the optical constants of cobalt in the M-absorption edge region
Saadeh, Qais; Naujok, Philipp; Thakare, Devesh; Wu, Meiyi; Philipsen, Vicky; Scholze, Frank; Buchholz, Christian; Salami, Zanyar; Abdulhadi, Yasser; Garcia, Danilo Ocana; Mentzel, Heiko; Babuschkin, Anja; Laubis, Christian; Soltwisch, Victor (2023) -
Optical constants for EUV scatterometry
Ciesielski, Richard; Saadeh, Qais; Naujok, Philipp; Opsomer, Karl; Soulie, Jean-Philippe; Wu, Meiyi; Philipsen, Vicky; Van de Kruijs, Robbert; Kolbe, Michael; Scholze, Frank; Soltwisch, Victor (2021)