Browsing by author "Tritchkov, Alexander"
Now showing items 1-20 of 23
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0.18 μm KrF lithography using optical proximity correction based on empirical behavior modeling
Tritchkov, Alexander; Stirnimann, J.; Gangala, Hareen K; Ronse, Kurt (1998) -
AIMS TM 45 inspection of CH treated with inverse lithography
Hendrickx, Eric; Birkner, Robert; Kempsell, Monica; Tritchkov, Alexander; Richter, Rigo; Vandenberghe, Geert; Scheruebl, Thomas (2008) -
Application of pixel-based mask optimization technique for high-transmission attenuated PSM
Sakajiri, Kyohei; Tritchkov, Alexander; Granik, Yuri; Hendrickx, Eric; Vandenberghe, Geert; Kempsell, Monica; Fenger, Germain; Boehm, Klaus; Scheruebl, Thomas (2009) -
Automated OPC for application in advanced lithography
Ronse, Kurt; Tritchkov, Alexander; Randall, John; Jonckheere, Rik; Ghandehari, Kouros; Van den hove, Luc (1997) -
Characterization and correction of optical proximity effects in deep-ultraviolet lithography using behavior modeling
Yen, Anthony; Tritchkov, Alexander; Stirniman, J. P.; Vandenberghe, Geert; Jonckheere, Rik; Ronse, Kurt; Van den hove, Luc (1996) -
Design split algorithms validation for DPT implementation at 32 nm and beyond
Tritchkov, Alexander; Kempsell, Monica; Glotov, Petr; Sahouria, Emile; Komirenko, Sergiy; Wiaux, Vincent (2008) -
Directed self-assembly (DSA) grapho-epitaxy template generation with immersion lithography
Ma, Yuansheng; Lei, Junjiang; Torres, J. Andres; Hong, Le; Word, James; Fenger, Germain; Tritchkov, Alexander; Lippincott, George; Gupta, Rachit; Lafferty, Neal; He, Yuan; Bekaert, Joost; Vandenberghe, Geert (2015) -
Directed self-assembly graphoepitaxy template generation with immersion lithography
Ma, Yuansheng; Lei, Junjiang; Torres, J. Andres; Hong, Le; Word, James; Fenger, Germain; Tritchkov, Alexander; Lippincott, George; Gupta, Rachit; Lafferty, Neal; He, Yuan; Bekaert, Joost; Vandenberghe, Geert (2015) -
Double patterning EDA solutions for the 32nm HP and beyond
Bailey, George; Tritchkov, Alexander; Park, Jea-Woo; Hong, Le; Wiaux, Vincent; Hendrickx, Eric; Verhaegen, Staf; Xie, Peng; Versluijs, Janko (2007) -
Electron beam / DUV intra-level mix-and-match lithography for random logic 0.25 μm CMOS
Jonckheere, Rik; Tritchkov, Alexander; Van Driessche, Veerle; Van den hove, Luc (1995) -
Feasibility of 250 nm gate patterning using i-line with OPC
Van Driessche, Veerle; Finders, Jo; Tritchkov, Alexander; Ronse, Kurt; Van den hove, Luc; Tzviatkov, Plamen (1998) -
Hyper-NA imaging of 45nm node random CH layouts using inverse lithography
Hendrickx, Eric; Tritchkov, Alexander; Sakajiri, Kyohei; Granik, Yuri; Kempsell, Monica; Vandenberghe, Geert (2008) -
Inverse lithography for 45-nm-node contact holes at 1.35 numerical aperture
Kempsell, Monica; Hendrickx, Eric; Tritchkov, Alexander; Sakajiri, Kyohei; Yasui, Kenichi; Yoshitake, Susuki; Granik, Yuri; Vandenberghe, Geert; Smith, Bruce W. (2009) -
Lithography simulation with aerial image - variable threshold resist model
Randall, John; Gangala, Hareen K; Tritchkov, Alexander (1999) -
Lithography simulation with aerial image-variable threshold resist model
Randall, John; Gangala, Hareen K; Tritchkov, Alexander (1998) -
Optical proximity effects and correction strategies for chemical amplified DUV resists
Op de Beeck, Maaike; Bruggeman, Albert; Botermans, Harry; Van Driessche, Veerle; Yen, Anthony; Tritchkov, Alexander; Jonckheere, Rik; Ronse, Kurt; Van den hove, Luc (1996) -
Optical proximity effects correction at 0.25 mm incorporating process variations in lithography
Tritchkov, Alexander; Rieger, M.; Stirniman, J.; Yen, Anthony; Ronse, Kurt; Vandenberghe, Geert; Van den hove, Luc (1997) -
Optically induced mask criical dimension error magnification in 248 nm lithography
Randall, John; Tritchkov, Alexander (1998) -
Proximity effects correction for advanced optical lithography processes
Tritchkov, Alexander; Finders, Jo; Randall, John; Ronse, Kurt; Van den hove, Luc (1998) -
Reduction of mask induced CD errors by optical proximity correction
Randall, John; Tritchkov, Alexander; Jonckheere, Rik; Jaenen, Patrick; Ronse, Kurt (1998)