Browsing by author "Vertommen, Johan"
Now showing items 1-20 of 38
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15nm HP patterning with EUV and SADP: key contributors for improvement of LWR, LER, and CDU
Xu, Kaidong; Souriau, Laurent; Hellin, David; Versluijs, Janko; Wong, Patrick; Vangoidsenhoven, Diziana; Vandenbroeck, Nadia; Dekkers, Harold; Shi, Xiaoping; Albert, Johan; Tan, Chi Lim; Vertommen, Johan; Coenegrachts, Bart; Orain, I.; Kimura, Y.; Wiaux, Vincent; Boullart, Werner (2013) -
15nm HP patterning with EUV lithography and SADP
Souriau, Laurent; Hellin, David; Kunnen, Eddy; Versluijs, Janko; Dekkers, Harold; Albert, Johan; Orain, Isabelle; Yoshie, Kimura; Xu, Kaidong; Vertommen, Johan; Wiaux, Vincent; Boullart, Werner (2012) -
30-nm half-pitch metal patterning using MotifTM critical dimension shrink technique and double patterning
Versluijs, Janko; de Marneffe, Jean-Francois; Goossens, Danny; Vandeweyer, Tom; Wiaux, Vincent; Struyf, Herbert; Maenhoudt, Mireille; Brouri, Mohand; Vertommen, Johan; Kim, Ji Soo; Zhu, Helen; Sadjadi, Reza (2009) -
30nm half-pitch metal patterning using MotifTM CD shrink technique and double patterning
Versluijs, Janko; de Marneffe, Jean-Francois; Goossens, Danny; Op de Beeck, Maaike; Vandeweyer, Tom; Wiaux, Vincent; Struyf, Herbert; Maenhoudt, Mireille; Brouri, Mohand; Vertommen, Johan; Kim, Ji Soo; Zhu, Helen; Sadjadi, Reza (2008) -
45nm nMOSFET with metal gate on thin SiON driving 1150μA/μm and off-state of 10nA/μm
Henson, Kirklen; Lander, Rob; Demand, Marc; Dachs, Charles; Kaczer, Ben; Deweerd, Wim; Schram, Tom; Tokei, Zsolt; Hooker, Jacob; Cubaynes, Florence; Beckx, Stephan; Boullart, Werner; Coenegrachts, Bart; Vertommen, Johan; Richard, Olivier; Bender, Hugo; Vandervorst, Wilfried; Kaiser, M.; Everaert, Jean-Luc; Jurczak, Gosia; Biesemans, Serge (2004) -
A novel concept for contact etch residue removal
Vos, Ingrid; Hellin, David; Demuynck, Steven; Richard, Olivier; Conard, Thierry; Vertommen, Johan; Boullart, Werner (2007) -
Characterization and residue elimination of hot aluminum etching in a transformer coupled plasma etcher
Kopalidis, Peter; Vertommen, Johan; Badenes, Gonçal (1996) -
Characterization of PVD TaN and ALD WNxCy copper diffusion barriers on a porous CVD low-k material
Travaly, Youssef; Kemeling, N.; Maenhoudt, Mireille; Peeters, S.; Tokei, Zsolt; Abell, Thomas; Schuhmacher, Jörg; Turturro, S.; Vos, Ingrid; Eugene, Lino; Matsuki, N.; Fukazawa, A.; Goundar, K.; Satoh, K.; Kato, M.; Kaneko, S.; Vertommen, Johan; Sprey, Hessel; Van Hove, Marleen; Jonas, A.; Maex, Karen (2004) -
Clean dry strip process for implanted resist using water vapor plasma
Daviet, Jean-François; Coosemans, Frank; Vertommen, Johan (1994) -
Confined chemical cleaning: a novel concept evaluated for front end of line applications
Vos, Ingrid; Peeters, Stefan; Verbeeck, Rita; Boullart, Werner; Vertommen, Johan (2008) -
Dry Development for 0.25 5m Top Surface Imaging
Vertommen, Johan; Goethals, Mieke (1995) -
Dry development for 0.25 μm top surface imaging
Vertommen, Johan; Goethals, Mieke (1997) -
Dry development in an O2/SO2 plasma for sub-0.18 μm top layer imaging processes
Goethals, Mieke; Van Roey, Frieda; Sugihara, Takashi; Van den hove, Luc; Vertommen, Johan; Klippert, W. (1998) -
Evaluation of advanced I-line resists for practical 0.5*(l/NA) lithography
Tzviatkov, Plamen; Pforr, Rainer; Jaenen, Patrick; Vertommen, Johan; Van den hove, Luc (1994) -
III-V fin patterning in SADP scheme
Milenin, Alexey; Camerotto, Elisabeth; Sun, Noel; Boccardi, Guillaume; Vertommen, Johan; Piumi, Daniele (2016) -
Implementation of high-K and metal gate materials for the 45nm node and beyond: gate patterning development
Beckx, Stephan; Demand, Marc; Locorotondo, Sabrina; Henson, K.; Claes, Martine; Paraschiv, Vasile; Shamiryan, Denis; Jaenen, Patrick; Boullart, Werner; De Gendt, Stefan; Biesemans, Serge; Vanhaelemeersch, Serge; Vertommen, Johan; Coenegrachts, Bart (2004) -
Implementation of high-k and metal gate materials for the 45nm node and beyond: gate patterning development
Beckx, Stephan; Demand, Marc; Locorotondo, Sabrina; Henson, Kirklen; Claes, Martine; Paraschiv, Vasile; Shamiryan, Denis; Jaenen, Patrick; Boullart, Werner; De Gendt, Stefan; Biesemans, Serge; Vanhaelemeersch, Serge; Vertommen, Johan; Coenegrachts, Bart (2005-06) -
Integrated silylation and dry development of resist for sub-0.15µm top surface imaging applications
Vertommen, Johan; Klippert, W.; Goethals, Mieke; Van Roey, Frieda (1998) -
Integrating high-k dielectrics: etched polysilicon or metal gates?
Schram, Tom; Beckx, Stephan; De Gendt, Stefan; Vertommen, Johan; Lee, S. (2003) -
Integration of high-k gate dielectrics - wet etch, cleaning and surface conditioning
De Gendt, Stefan; Beckx, Stephan; Caymax, Matty; Claes, Martine; Conard, Thierry; Delabie, Annelies; Deweerd, Wim; Kraus, Harald; Onsia, Bart; Paraschiv, Vasile; Puurunen, Riikka; Röhr, Erika; Snow, Jim; Tsai, Wilman; Van Doorne, Patrick; Van Elshocht, Sven; Vertommen, Johan; Witters, Thomas; Heyns, Marc (2003)