Browsing by author "Storm, Wolfgang"
Now showing items 1-20 of 20
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A controlled deposition of organic contamination and the removal with ozone based cleaning
Claes, Martine; De Gendt, Stefan; Kenens, Conny; Conard, Thierry; Bender, Hugo; Storm, Wolfgang; Bauer, T.; Lagrange, Sébastien; Mertens, Paul; Heyns, Marc (2001) -
Advanced characterisation : an indispensable tool for ultra clean processing
Vandervorst, Wilfried; Bender, Hugo; Storm, Wolfgang; Heyns, Marc; Polleunis, C.; Bertrand, P. (1995) -
Controlled deposition of organic contamination and removal with ozone-based cleaning
Claes, M.; De Gendt, Stefan; Kenens, Conny; Conard, Thierry; Bender, Hugo; Storm, Wolfgang; Bauer, T.; Mertens, Paul; Heyns, Marc (2001) -
Degradation of clean Si-surfaces due to storage in clean (?) wafer boxes
Storm, Wolfgang; Vandervorst, Wilfried; Alay, Josep Lluis; Meuris, Marc; Opdebeeck, Ann; Heyns, Marc; Polleunis, C.; Bertrand, P. (1994) -
Improved understanding and characterisation of rapid thermal oxides
Horzel, Jörg; Storm, Wolfgang; Trenkler, Thomas; Sivoththaman, Sivanarayanamoorthy; Nijs, Johan; Mertens, Robert; Adriaenssens, G. (1996) -
In situ and real time studies of wet chemical silicon cleaning reactions
Schmidt, Harald; Teerlinck, Ivo; Storm, Wolfgang; Bender, Hugo; Heyns, Marc (1996) -
Just-Clean- Enough technology for the 21st century
Heyns, Marc; Meuris, Marc; Mertens, Paul; Hurd, Trace; Schmidt, Harald; Depas, Michel; Rotondaro, Antonio; Vermeire, Bert; Vandervorst, Wilfried; Storm, Wolfgang; Polleunis, C.; Bertrand, P.; McGeary, M. J.; Lubbers, A.; Hatcher, Z. (1995) -
Protective films formed by RIE of Co and Ti silicides and ways of their removal
Baklanov, Mikhaïl; Vanhaelemeersch, Serge; Kim, Young-Chang; Storm, Wolfgang; Vandervorst, Wilfried; Maex, Karen (1996) -
Protective films formed during the etching of TiSi2 and CoSi2 in F-based plasmas
Baklanov, Mikhaïl; Vanhaelemeersch, Serge; Storm, Wolfgang; Vandervorst, Wilfried; Maex, Karen (1996) -
RBS Analysis of Artefacts Induced by Low Energy Ion Sputtering
Brijs, Bert; De Coster, Walter; Bender, Hugo; Storm, Wolfgang; Osiceanu, Petre; Vandervorst, Wilfried (1994) -
Removal of organic contamination from silicon surfaces
Kenens, Conny; Storm, Wolfgang; Knotter, D. M.; De Gendt, Stefan; Vandervorst, Wilfried; Heyns, Marc (1996) -
Stoichiometric changes of Si, CoSi2 and TiSi2 during low energy oxygen bombardment in combination with oxygen bleed-in
Brijs, Bert; Deleu, Jeroen; Storm, Wolfgang; De Coster, Walter; Vandervorst, Wilfried (1996) -
Stoichiometry changes during low energy oxygen bombardment
Brijs, Bert; De Coster, Walter; Bender, Hugo; Storm, Wolfgang; Osiceanu, Petre; Vandervorst, Wilfried (1995) -
Surface characterization after different wet chemical cleans
Claes, Martine; Röhr, Erika; Conard, Thierry; De Smedt, Frank; De Gendt, Stefan; Storm, Wolfgang; Bauer, T.; Mertens, Paul; Heyns, Marc (2001) -
Surface processes occuring on TiSi2 and CoSi2 in fluorine-based plasmas: afterglow of NF3 plasma
Baklanov, Mikhaïl; Vanhaelemeersch, Serge; Storm, Wolfgang; Vandervorst, Wilfried; Maex, Karen (1998) -
Surface processes occurring on TiSi2 and CoSi2 in fluorine-based plasmas. Reactive ion etching in CF4/CHF3 plasmas
Baklanov, Mikhaïl; Vanhaelemeersch, Serge; Storm, Wolfgang; Kim, Young-Chang; Vandervorst, Wilfried; Maex, Karen (1997) -
The behaviour of Si and CoSi2 during low energy nitrogen bombardment, with and without O-2 flooding
Deleu, Jeroen; Brijs, Bert; Storm, Wolfgang; Vandervorst, Wilfried; De Coster, Walter (1996) -
The importance of H-passivation for low-temperature APCVD silicon epitaxy
Mouche, M.J.; Caymax, Matty; Bender, Hugo; Storm, Wolfgang; Vandervorst, Wilfried (1996) -
The kinetics and mechanism of the etching of CoSi2 in HF-based solutions
Baklanov, Mikhaïl; Badmaeva, I. A.; Alves Donaton, Ricardo; Sveshnikova, L. L.; Storm, Wolfgang; Maex, Karen (1996) -
ToF-SIMS and XPS characterization of plasma etch residues on cobalt silicide surfaces
Storm, Wolfgang; Vandervorst, Wilfried; Vanhaelemeersch, Serge; Baklanov, Mikhaïl; Maex, Karen; Poleunis, C.; Bertrand, P. (1997)