Browsing by author "Hurd, Trace"

Advanced ULSI applications: dilute HCl and SC1

Hurd, Trace (1995)

Chemistry of the silicon oxide surface: adsorption from SC1 solutions

Hall, L.; Sees, J.; Hurd, Trace; Schmidt, B.; Bellay, L.; Loewenstein, Lee; Mertens, Paul (1998)

Chemistry of the silicon oxide surface: adsorption from SC1 solutions

Hall, L.; Sees, J.; Hurd, Trace; Schmidt, B.; Bellay, L.; Loewenstein, Lee; Mertens, Paul (1999)

Cleaning of metal contamination

Mertens, Paul; Hurd, Trace; Gräf, D.; Meuris, Marc; Schmidt, Harald; Heyns, Marc; Kwakman, L.; Hendriks, M.; Kubota, M. (1994)

Cleaning technology for highly reliable gate oxides

Heyns, Marc; Meuris, Marc; Verhaverbeke, Steven; Mertens, Paul; Schmidt, Harald; Rotondaro, Antonio; Hurd, Trace; Hatcher, Z.; Gräf, D. (1994)

Comparison of HCl gas-phase cleaning with conventional and dilute wet chemistries

Elsmore, Chris; Hurd, Trace; Meuris, Marc; Mertens, Paul; Heyns, Marc (1996)

Development of an environmentally-friendly HCl gas-phase clean

Elsmore, Chris; Meuris, Marc; Mertens, Paul; Hurd, Trace; Heyns, Marc (1995)

H2O2 decomposition and its impact on silicon surface roughening and gate oxide integrity

Schmidt, Harald; Meuris, Marc; Rotondaro, Antonio; Heyns, Marc; Hurd, Trace; Hatcher, Z. (1995)

How clean is clean enough?

Mertens, Paul; Teerlinck, Ivo; Hurd, Trace; Kenis, Karine; Schmidt, Harald; Rotondaro, Antonio; Hall, L.; Gräf, D.; De Pestel, Freddy; Meuris, Marc; Heyns, Marc (1995)

Impact of Fe and Cu contamination on the minority carrier lifetime of silicon substrates

Rotondaro, Antonio; Hurd, Trace; Kaniava, Arvydas; Vanhellemont, Jan; Simoen, Eddy; Heyns, Marc; Claeys, Cor (1996)

Impact of the electrochemical properties of silicon wafer surfaces on copper outplating from HF solutions

Teerlinck, Ivo; Schmidt, Harald; Rotondaro, Antonio; Hurd, Trace; Mouche, Laurent; Mertens, Paul; Meuris, Marc; Heyns, Marc; Vanhaeren, Danielle; Vandervorst, Wilfried (1996)

Just-Clean- Enough technology for the 21st century

Heyns, Marc; Meuris, Marc; Mertens, Paul; Hurd, Trace; Schmidt, Harald; Depas, Michel; Rotondaro, Antonio; Vermeire, Bert; Vandervorst, Wilfried; Storm, Wolfgang; Polleunis, C.; Bertrand, P.; McGeary, M. J.; Lubbers, A.; Hatcher, Z. (1995)

Limitations of minority carrier lifetime as a parameter for evaluating iron contamination in silicon

Rotondaro, Antonio; Hurd, Trace; Mertens, Paul; Schmidt, Harald; Heyns, Marc; Simoen, Eddy; Vanhellemont, Jan; Vegh, Gerzson; Claeys, Cor; Gräf, D. (1994)

Metal interactions with silica (SiO2) surfaces: adsorption and ion exchange

Hurd, Trace; Schmidt, Harald; Rotondaro, Antonio; Mertens, Paul; Hall, L. H.; Heyns, Marc (1996)

Metal removal without particle addition: optimization of the dilute HCl clean

Hurd, Trace; Mertens, Paul; Hall, L. H.; Heyns, Marc (1994)

New drying techology for advanced cleaning in IC manufacturing

Meuris, Marc; Mertens, Paul; Schmidt, Harald; Hurd, Trace; Li, Li; Heyns, Marc; Jonckx, Franky; Maex, Karen; Schild, R.; Locke, K.; Kozak, M. (1994)

Outplating of metallic contaminants on silicon wafers from diluted acid solutions

Rotondaro, Antonio; Hurd, Trace; Schmidt, Harald; Teerlinck, Ivo; Heyns, Marc; Claeys, Cor (1995)

Physico chemical aspects of hydrogen peroxide based silicon wafer cleaning solutions

Schmidt, Harald; Meuris, Marc; Mertens, Paul; Rotondaro, Antonio; Heyns, Marc; Hurd, Trace; Hatcher, Z. (1994)

Recombination activity of iron-related complexes in silicon studied with microwave and light-induced absorption techniques

Kaniava, Arvydas; Rotondaro, Antonio; Vanhellemont, Jan; Simoen, Eddy; Gaubas, Eugenijus; Vaitkus, J.; Hurd, Trace; Mertens, Paul; Claeys, Cor; Gräf, D. (1994)

The dilute HCl integrated pre-gate clean

O'Brien, S. C.; Hurd, Trace; Tipton, C. (1995)