Browsing by author "Tzviatkov, Plamen"

100-nm generation contact patterning by low temperature 193-nm resist reflow process

Van Driessche, Veerle; Lucas, Kevin; Van Roey, Frieda; Grozev, Grozdan; Tzviatkov, Plamen (2002)

100nm generation contact patterning by low temperature 193nm resist reflow process

Van Driessche, V.; Grozev, G.; Lucas, K.; Van Roey, Frieda; Tzviatkov, Plamen (2002)

248 nm lithography for the 0.18 μm generation

Vandenberghe, Geert; Tzviatkov, Plamen; Yen, Anthony; Ronse, Kurt; Van den hove, Luc; Luehrmann, P.; Slonaker, S.; van Ingen Schenau, K.; Juffermans, Casper (1996)

Evaluation of advanced I-line resists for practical 0.5*(l/NA) lithography

Tzviatkov, Plamen; Pforr, Rainer; Jaenen, Patrick; Vertommen, Johan; Van den hove, Luc (1994)

Feasibility of 250 nm gate patterning using i-line with OPC

Van Driessche, Veerle; Finders, Jo; Tritchkov, Alexander; Ronse, Kurt; Van den hove, Luc; Tzviatkov, Plamen (1998)

Impact of SEM accuracy on the CD control during gate patterning process of 0.25μm and sub-0.25μm generations

Finders, Jo; Ronse, Kurt; Van den hove, Luc; Van Driessche, Veerle; Tzviatkov, Plamen (1997)

Increasing DOF for VIA lithography using a non-CMP based architecture

Grozev, Grozdan; Waeterloos, Joost; Ronse, Kurt; Van den hove, Luc; Tzviatkov, Plamen (1997)

Introducing 193 nm lithography

Pollers, Ingrid; Jaenen, Patrick; Van Roey, Frieda; Goethals, Mieke; Ronse, Kurt; Davies, G.; Heskamp, B.; Bakker, H.; McCoo, E.; Mulkens, J.; Stoeldraijer, J.; Sytsma, J.; Van der Vleuten, B.; Vleeming, Bert; Tzviatkov, Plamen; Van Driessche, Veerle; Slater, S. (1998)

Lithographic performance of 193 nm single and bi-layer materials

Goethals, Mieke; Pollers, Ingrid; Van Roey, Frieda; Sugihara, Takashi; Ronse, Kurt; Van Driessche, Veerle; Tzviatkov, Plamen; Medina, A.; Gabor, A.; Blakeney, A.; Steinhausler, T.; Biafore, J.; Slater, S.; Nalamasu, O.; Houlihan, F.; Kometani, J.; Timko, A.; Cirelli, R. (1998)