Browsing by author "Zhao, Chao"
Now showing items 1-20 of 123
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3D stacked IC demonstration using a through silicon via first approach
Van Olmen, Jan; Mercha, Abdelkarim; Katti, Guruprasad; Huyghebaert, Cedric; Van Aelst, Joke; Seppala, Emma; Zhao, Chao; Armini, Silvia; Vaes, Jan; Cotrin Teixeira, Ricardo; Van Cauwenberghe, Marc; Verdonck, Patrick; Verhemeldonck, Koen; Jourdain, Anne; Ruythooren, Wouter; de Potter de ten Broeck, Muriel; Opdebeeck, Ann; Chiarella, Thomas; Parvais, Bertrand; Debusschere, Ingrid; Hoffmann, Thomas Y.; De Wachter, Bart; Dehaene, Wim; Stucchi, Michele; Rakowski, Michal; Soussan, Philippe; Cartuyvels, Rudi; Beyne, Eric; Biesemans, Serge; Swinnen, Bart (2008) -
A DRAM compatible Cu contact using self-aligned Ta-silicide and Ta-barrier
Zhao, Chao; Ahn, Jae Young; Horiguchi, Naoto; Demuynck, Steven; Tokei, Zsolt (2008) -
A Fast DCIV Technique for Characterizing the Generation and Repassivation of Interface Traps Under DC/AC NBTI Stress/Recovery Condition in Si p-FinFETs
Zhou, Longda; Zhang, Zhaohao; Yang, Hong; Ji, Zhigang; Liu, Qianqian; Zhang, Qingzhu; Simoen, Eddy; Yin, Huaxiang; Luo, Jun; Du, Anyan; Zhao, Chao; Wang, Wenwu (2021) -
A microstructural study of the thermal stability of atomic layer deposited Al2O3 thin films
Nistor, L.; Richard, Olivier; Zhao, Chao; Bender, Hugo; Stesmans, Andre; Van Tendeloo, G. (2003-04) -
ALD HfO2 surface preparation study
Delabie, Annelies; Caymax, Matty; Maes, Jan; Bajolet, Philippe; Brijs, Bert; Cartier, Eduard; Conard, Thierry; De Gendt, Stefan; Richard, Olivier; Vandervorst, Wilfried; Zhao, Chao; Green, Martin; Tsai, Wilman; Heyns, Marc (2003) -
ALD High-k growth on Ge substrates
Delabie, Annelies; Brijs, Bert; Caymax, Matty; Chiarella, Thomas; Conard, Thierry; Puurunen, Riikka; Richard, Olivier; Van Steenbergen, Jan; Teerlinck, Ivo; Zhao, Chao; Heyns, Marc; Meuris, Marc (2003) -
Alleviation of Negative-Bias Temperature Instability in Si p-FinFETs With ALD W Gate-Filling Metal by Annealing Process Optimization
Zhou, Longda; Liu, Qianqian; Yang, Hong; Ji, Zhigang; Xu, Hao; Wang, Guilei; Simoen, Eddy; Jiang, Haojie; Luo, Ying; Kong, Zhenzhen; Bai, Guobin; Luo, Jun; Yin, Huaxiang; Zhao, Chao; Wang, Wenwu (2021) -
Alternative gate insulator materials for future generation MOSFETs
Heyns, Marc; Bender, Hugo; Carter, Richard; Caymax, Matty; Conard, Thierry; De Gendt, Stefan; Degraeve, Robin; De Witte, Hilde; Groeseneken, Guido; Haukka, S.; Henson, Kirklen; Houssa, Michel; Kubicek, Stefan; Maes, Jos; Naili, Mohamed; Nohira, Hiroshi; Tsai, Wilman; Tuominen, Marko; Vandervorst, R.; Wilhelm, Rudi; Young, Edward; Zhao, Chao (2001) -
Application of x-ray fluorescence spectrometry in charaterization of high-k uktra-thin films
Zhao, Chao; Brijs, Bert; Dortu, Fabian; De Gendt, Stefan; Caymax, Matty; Heyns, Marc; Besling, W.; Maes, Jan (2003) -
Atomic layer deposition of hafnium oxide on germanium substrates
Delabie, Annelies; Puurunen, R.; Brijs, Bert; Caymax, Matty; Conard, Thierry; Onsia, Bart; Richard, Olivier; Vandervorst, Wilfried; Zhao, Chao; Heyns, Marc; Meuris, Marc; Viitanan, Minna M.; Brongersma, Hidde H.; De Ridder, M.; Goncharova, L.; Garfunkel, Eric; Gustafsson, Torgny; Tsai, Wilman (2005) -
Atomic layer deposition of Ru and RuO2 for MIMCAP applications
Zhao, Chao; Pawlak, Malgorzata; Popovici, Mihaela Ioana; Schaekers, Marc; Sleeckx, Erik; Vancoille, Eric; Wouters, Dirk; Tokei, Zsolt; Kittl, Jorge (2009) -
Atomic layer deposition of Ru and RuO2 for MIMCAP applications
Zhao, Chao; Pawlak, Malgorzata; Schaekers, Marc; Sleeckx, Erik; Vancoille, Eric; Wouters, Dirk; Tokei, Zsolt; Kittl, Jorge (2009) -
Band alignment at the interface of (100)Si with HfxTa1-xOy high-k dielectric layers
Afanasiev, Valeri; Stesmans, Andre; Zhao, Chao; Caymax, Matty; Rittersma, Z.M.; Maes, Jan (2005) -
Band alignment between (100)Si and complex rare earth/transition metal oxides
Afanasiev, Valeri; Stesmans, Andre; Zhao, Chao; Caymax, Matty; Heeg, T.; Schubert, J.; Jia, Y.; Schlom, D.G.; Lucovsky, G. (2004) -
Band alignment between (100)Si and complex rare-earth/transition metal oxides
Afanasiev, Valeri; Stesmans, Andre; Zhao, Chao; Caymax, Matty; Heeg,; Schubert,; Jia, Y.; Schlom, D.; Lucovsky, G. (2004) -
Band alignment between (100)Si and Hf-based complex metal oxides
Afanasiev, Valeri; Stesmans, Andre; Zhao, Chao; Caymax, Matty; Rittersma, Z.M.; Maes, Jan (2005) -
Barrier reliability for Cu contacts
Zhao, Chao; Demuynck, Steven; Van den Bosch, Geert; Tokei, Zsolt; Beyer, Gerald (2007) -
Bulk properties of MOCVD-deposited HfO2 layers for high-k dielectric applications
Van Elshocht, Sven; Baklanov, Mikhaïl; Brijs, Bert; Carter, R.; Caymax, Matty; Carbonell, Laure; Claes, Martine; Conard, Thierry; Cosnier, Vincent; Date, Lucien; De Gendt, Stefan; Kluth, J.; Pique, Didier; Richard, Olivier; Vanhaeren, Danielle; Vereecke, Guy; Witters, Thomas; Zhao, Chao; Heyns, Marc (2004) -
Characterisation of AlCVD Al2O3-ZrO2 nanolaminates, link between electrical and structural properties
Besling, Wim; Young, Edward; Conard, Thierry; Zhao, Chao; Carter, Richard; Vandervorst, Wilfried; Caymax, Matty; De Gendt, Stefan; Heyns, Marc; Maes, Jos; Tuominen, Marko; Haukka, S. (2002) -
Characterisation of ALCVD ZrO2 thin films by TEM
Richard, Olivier; Bender, Hugo; Houssa, Michel; Zhao, Chao (2001)