Browsing by author "Kerber, Andreas"
Now showing items 1-20 of 42
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A study of relaxation current in high-k gate stacks
Xu, Zhen; Pantisano, Luigi; Kerber, Andreas; Degraeve, Robin; Cartier, Eduard; De Gendt, Stefan; Heyns, Marc; Groeseneken, Guido (2004-03) -
Accurate reliability evaluation of non-uniform ultrathin and high-k layers
Roussel, Philippe; Degraeve, Robin; Kerber, Andreas; Pantisano, Luigi; Groeseneken, Guido (2003-03) -
Characterization of charge trapping in SiO2/HfO2 dielectrics
Degraeve, Robin; Kerber, Andreas; Cartier, Ed; Pantisano, Luigi; Groeseneken, Guido (2003) -
Characterization of the Vt-instability un SiO2 HFO2 gate dielectrics
Kerber, Andreas; Cartier, E.; Pantisano, Luigi; Rosmeulen, Maarten; Degraeve, Robin; Kauerauf, Thomas; Groeseneken, Guido; Maes, Herman; Schwalke, U. (2003) -
Charge trapping and dielectric reliability in alternative gate dielectrics: a key challenge for integration
Kerber, Andreas; Cartier, Eduard; Degraeve, Robin; Roussel, Philippe; Pantisano, Luigi; Kauerauf, Thomas; Groeseneken, Guido; De Gendt, Stefan; Heyns, Marc (2002) -
Charge trapping and dielectric reliability in alternative gate dielectrics: a key challenge for integration
Kerber, Andreas; Cartier, Eduard; Degraeve, Robin; Roussel, Philippe; Pantisano, Luigi; Kauerauf, Thomas; Groeseneken, Guido; De Gendt, Stefan; Heyns, Marc (2003) -
Charge trapping and dielectric reliability of SiO2/AI2O3 gate stacks with TiN electrodes
Kerber, Andreas; Cartier, Eduard; Degraeve, Robin; Roussel, Philippe; Pantisano, Luigi; Kauerauf, Thomas; Groeseneken, Guido; Maes, Herman; Schwalke, U. (2003) -
Charge trapping and electron mobility degradation in MOCVD hafnium silicate gate dielectric stack structures
Young, C.D.; Kerber, Andreas; Hou, T.H.; Cartier, Eduard; Brown, G.A.; Bersuker, G.; Kim, Y.; Lim, C.; Gutt, J.; Lysaght, P.; Bennett, J.; Lee, C.H.; Gopalan, S.; Gardner, M.; Zeitzoff, P.; Groeseneken, Guido; Murto, R.W.; Huff, H.R. (2004) -
Charge trapping and mobility degradation in MOCVD hafnium silicate gate dielectric stack structures
Young, C.D.; Kerber, Andreas; Hou, T.H.; Cartier, E.; Brown, G.A.; Bersuker, G.; Kim, Y.; Lim, C.; Gutt, J.; Lysaght, P.; Bennett, J.; Lee, C.H.; Gopalan, S.; Gardner, M.; Zeitzoff, P.; Groeseneken, Guido; Murto, R.W.; Huff, H.R. (2003) -
Charge trapping, mobility degradation and reliability of high-e gate stacks
Cartier, Eduard; Kerber, Andreas; Pantisano, Luigi; Carter, Richard; Kauerauf, Thomas; Degraeve, Robin (2002) -
Charging instability in n-channel MOSFETs with SiO2/HfO2 gate dielectrics
Kerber, Andreas; Cartier, Eduard; Pantisano, Luigi; Degraeve, Robin; Groeseneken, Guido; Maes, Herman; Schwalke, U. (2002) -
Correlation between charge Injection and trapping in SiO2/HfO2 gate stacks
Cartier, Eduard; Pantisano, Luigi; Kerber, Andreas; Groeseneken, Guido (2003) -
Correlation between stress-induced leakage current (SILC) and the HfO2 bulk trap density in a SiO2/HfO2 stack
Crupi, Felice; Degraeve, Robin; Kerber, Andreas; Kwak, Dong Hwa; Groeseneken, Guido (2004-04) -
Direct measurement of the inversion charge in MOSFETs: application to mobility extraction in alternative gate dielectrics
Kerber, Andreas; Cartier, Eduard; Ragnarsson, Lars-Ake; Rosmeulen, Maarten; Pantisano, Luigi; Degraeve, Robin; Kim, Young-Chang; Groeseneken, Guido (2003) -
Dynamics of threshold voltage instability in stacked high-k dielectrics: role of the interfacial oxide
Pantisano, Luigi; Cartier, Eduard; Kerber, Andreas; Degraeve, Robin; Lorenzini, Martino; Rosmeulen, Maarten; Groeseneken, Guido; Maes, Herman (2003) -
Effect of bulk trap density on HfO2 reliability and yield
Degraeve, Robin; Kerber, Andreas; Roussel, Philippe; Cartier, Ed; Kauerauf, Thomas; Pantisano, Luigi; Groeseneken, Guido (2003-12) -
Electrical characterization of high-k materials prepared by Atomic Layer CVD (ALCVD)
Carter, Richard; Cartier, Eduard; Caymax, Matty; De Gendt, Stefan; Degraeve, Robin; Groeseneken, Guido; Heyns, Marc; Kauerauf, Thomas; Kerber, Andreas; Kubicek, Stefan; Lujan, Guilherme; Pantisano, Luigi; Tsai, Wilman; Young, Edward (2001) -
Impact of band structure on charge trapping in thin SiO2/Al2O3/poly-Si gate stacks
Pantisano, Luigi; Lucci, L.; Cartier, Ed; Kerber, Andreas; Groeseneken, Guido; Green, M.; Selmi, L. (2004-05) -
Implementation of high-k gate dielectrics - a status update
De Gendt, Stefan; Chen, Jerry; Carter, Richard; Cartier, Eduard; Caymax, Matty; Claes, Martine; Conard, Thierry; Delabie, Annelies; Deweerd, Wim; Kaushik, Vidya; Kerber, Andreas; Kubicek, Stefan; Maes, Jan; Niwa, M.; Pantisano, Luigi; Puurunen, Riikka; Ragnarsson, Lars-Ake; Schram, Tom; Shimamoto, Yasuhiro; Tsai, Wilman; Röhr, Erika; Van Elshocht, Sven; Witters, Thomas; Young, Edward; Zhao, Chao; Heyns, Marc (2003) -
Interface state passivation in conventional SiO2/HfO2 p-channel FETs
Chen, Jerry; Pantisano, Luigi; Kerber, Andreas; Ragnarsson, Lars-Ake; Cartier, Eduard (2003)