Browsing by author "Lux, Marcel"

A novel resist and post-etch residue removal process using ozonated chemistries

De Gendt, Stefan; Snee, Peter; Cornelissen, Ingrid; Lux, Marcel; Vos, Rita; Mertens, Paul; Knotter, D. M.; Heyns, Marc (1998)

A novel resist and post-etch residue removal process using ozonated chemistry

De Gendt, Stefan; Snee, Peter; Cornelissen, Ingrid; Lux, Marcel; Vos, Rita; Mertens, Paul; Knotter, Martin; Meuris, Marc; Heyns, Marc (1998)

A novel resist and post-etch residue removal process using ozonated chemistry

De Gendt, Stefan; Snee, Peter; Cornelissen, Ingrid; Lux, Marcel; Vos, Rita; Mertens, Paul; Knotter, D. M.; Meuris, Marc; Heyns, Marc (1999)

A study in interactions of plasmas and wet cleans with ULK materials

Xu, Kaidong; Vereecke, Guy; Kesters, Els; Le, Quoc Toan; Lux, Marcel; Kraus, Harald; Henry, Sally - Ann; Archer, L.; Gaulhofer, E.; Kovacs, F.; Dalmer, M.; Mertens, Paul; Luo, S. J; Han, Q. Y (2007)

Above-IC generic poly-SiGe thin film wafer level packaging and MEM device technology: application to accelerometers

Guo, Bin; Wen, Lianggong; Helin, Philippe; Claes, Gert; Verbist, Agnes; Van Hoof, Rita; Du Bois, Bert; De Coster, Jeroen; De Wolf, Ingrid; Shahar, Abdul Hadi; Li, Yunlong; Cui, Hushan; Lux, Marcel; Vereecke, Guy; Tilmans, Harrie; Haspeslagh, Luc; Decoutere, Stefaan; Osman, Haris; Puers, Bob; Severi, Simone; Witvrouw, Ann (2011)

All wet strip approaches for post-etch photoresist layers after low-k patterning

Claes, Martine; Le, Quoc Toan; Kesters, Els; Lux, Marcel; Urionabarrenetxea, Ainara; Vereecke, Guy; Mertens, Paul; Carleer, R.; Adriaensens, P. (2007)

Alternative photoresist removal process to minimize damage of low-k material induced by ash plasma

Le, Quoc Toan; Keldermans, Johan; Chiodarelli, Nicolo; Kesters, Els; Lux, Marcel; Claes, Martine; Vereecke, Guy (2008)

Alternative photoresist removal process to minimize damage of low-k material induced by ash plasma

Le, Quoc Toan; Keldermans, Johan; Chiodarelli, Nicolo; Kesters, Els; Lux, Marcel; Claes, Martine; Vereecke, Guy (2007-11)

An environment friendly wet strip process for 193 nm lithography patterning in BEOL applications

Vereecke, Guy; Kesters, Els; Le, Quoc Toan; Claes, Martine; Lux, Marcel; Struyf, Herbert; Carleer, Robert; Adriaensens, Peter (2012)

An environment friendly wet strip process for 193 nm lithography patterning in BEOL applications

Vereecke, Guy; Kesters, Els; Le, Quoc Toan; Claes, Martine; Lux, Marcel; Struyf, Herbert; Carleer, Robert; Adriaensens, Peter (2013)

Application of UV irradiation in removal of post-etch 193 nm photoresist

Le, Quoc Toan; Kesters, Els; Prager, Lutz; Lux, Marcel; Marsik, Premysl; Vereecke, Guy (2009)

Aqueous photoresist and BARC wet strip in BEOL MHM patterning using UV and ozonated chemistry

Kesters, Els; Vereecke, Guy; Lux, Marcel; Pittevils, Joris; Struyf, Herbert (2011)

BEOL compatible WS2 transistors fully fabricated in a 300 mm pilot line

Schram, Tom; Smets, Quentin; Heyne, Markus; Groven, Benjamin; Kunnen, Eddy; Thiam, Arame; Devriendt, Katia; Delabie, Annelies; Lin, Dennis; Chiappe, Daniele; Asselberghs, Inge; Lux, Marcel; Brus, Stephan; Huyghebaert, Cedric; Sayan, Safak; Juncker, Aurélie; Caymax, Matty; Radu, Iuliana (2017)