Browsing imec Publications by imec author "25b47126a1335604d64d42f2c4f02a881dd178cd"

2D and 3D photoresist line roughness characterization

Vaglio Pret, Alessandro; Gronheid, Roel; Kunnen, Eddy; Pargon, Erwine; Luere, Olivier; Bianchi, Davide (2012)

2D and 3D photoresist line roughness characterization

Vaglio Pret, Alessandro; Kunnen, Eddy; Gronheid, Roel; Pargon, Erwine; Luere, Olivier; Bianchi, Davide (2013)

A compact physical CD-SEM simulator for IC photolithography modeling applications

Fang, Chao; Smith, Mark D; Vaglio Pret, Alessandro; Biafore, John; Robertson, Steward A; Bekaert, Joost (2014)

Bridging lithography processes with NAND flash ECC complexity

Poliakov, Pavel; Blomme, Pieter; Vaglio Pret, Alessandro; Miranda Corbalan, Miguel; Van Houdt, Jan; Dehaene, Wim (2011-06)

Challenges in LER/CDU metrology in DSA: placement error and cross-line correlations

Constantoudis, Vassilios; Kuppuswamy, V.K.M.; Gogolides, Evangelos; Vaglio Pret, Alessandro; Pathangi Sriraman, Hari; Gronheid, Roel (2016)

Challenges in line edge roughness metrology in directed self-assembly lithography: placement errors and cross-line correlations

Constantoudis, Vassilios; Papvieros, George; Gogolides, Evangelos; Vaglio Pret, Alessandro; Pathangi Sriraman, Hari; Gronheid, Roel (2017)

Characterizing and modeling electrical response to light for metal based EUV photoresists

Vaglio Pret, Alessandro; Kocsis, Michael; De Simone, Danilo; Vandenberghe, Geert; Stowers, Jason; Giglia, Angelo; De Schepper, Peter; Mani, Antonio; Biafore, John J. (2016)

Comparative stochastic process variation bands for N7, N5, and N3 at EUV

Vaglio Pret, Alessandro; Graves, Trey; Blankenship, David; Bai, Kunlun; Robertson, Stewart; De Bisschop, Peter; Biafore, J. (2018)

Contact edge roughness and CD uniformity in EUV: effect of photo acid generator and sensitizer

Kuppuswamy, Vijaya-Kumar Murugesan; Constantoudis, Vassilios; Gogolides, Evangelos; Vaglio Pret, Alessandro; Gronheid, Roel (2012)

Contact edge roughness: effects of dose and PAG concentration in EUV lithography

Kuppuswamy, Vijaya Kumar Murugesan; Constantoudis, Vassilios; Gogolides, Evangelos; Vaglio Pret, Alessandro; Gronheid, Roel (2011)

Contact-edge roughness (CER) characterization and modeling: effect of dose on CER and crtitical dimension uniformity

Kuppuswamy, Vijaya-Kumar Murugesan; Constantoudis, Vassilios; Gogolides, Evangelos; Gronheid, Roel; Vaglio Pret, Alessandro (2011)

Critical dimension uniformity and contact edge roughness in extreme ultraviolet lithography: effect of photoacid generator, sensitizer and quencher

Murugesan Kuppuswamy, Vijaya-Kumar; Constantoudis, Vassilios; Gogolides, Evangelos; Vaglio Pret, Alessandro; Gronheid, Roel (2013)