Browsing Conference contributions by imec author "83c6e39a2b4a17633480cf86c9ca752b3dab75e2"
Now showing items 1-20 of 26
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2D micro-chamber for DC plasma working at low power
Rochus, Veronique; Samara, Vladimir; Vereecke, Bart; Soussan, Philippe; Onsia, Bart; Rottenberg, Xavier (2014) -
A study of the influence of typical wet chemical treatments on the germanium wafer surface
Onsia, Bart; Conard, Thierry; De Gendt, Stefan; Heyns, Marc; Hoflijk, Ilse; Mertens, Paul; Meuris, Peter; Raskin, G.; Sioncke, Sonja; Teerlinck, Ivo; Theuwis, A.; Van Steenbergen, Jan; Vinckier, Chris (2005) -
Achieving low VT Ni-FUSI CMOS via lanthanide incorporation in the gate stack
Veloso, Anabela; Yu, HongYu; Lauwers, Anne; Chang, Shou-Zen; Adelmann, Christoph; Onsia, Bart; Demand, Marc; Brus, Stephan; Vrancken, Christa; Singanamalla, Raghunath; Lehnen, Peer; Kittl, Jorge; Kauerauf, Thomas; Vos, Rita; O'Sullivan, Barry; Van Elshocht, Sven; Mitsuhashi, Riichirou; Whittemore, G.; Yin, K.M.; Niwa, Masaaki; Hoffmann, Thomas; Absil, Philippe; Jurczak, Gosia; Biesemans, Serge (2007-09) -
Advanced single chemistry alkaline cleaning in a STEAG single tank tool
Onsia, Bart; Schellkes, E.; Vos, Rita; De Gendt, Stefan; Doll, O.; Fester, A.; Kolbesen, B. O.; Hoffman, M.; Hatcher, Z.; Wolke, K.; Mertens, Paul; Heyns, Marc (2001) -
Advanced single chemistry alkaline cleaning in a STEAG single tank tool
Onsia, Bart; Schellkes, E.; Vos, Rita; De Gendt, Stefan; Doll, O.; Fester, A.; Kolbesen, B.; Hoffman, M.; Hatcher, Z.; Wolke, K.; Mertens, Paul; Heyns, Marc (2002) -
Challenges with respect to high-k/metal gate stack etching and cleaning
Vos, Rita; Arnauts, Sophia; Bovie, Inge; Onsia, Bart; Garaud, Sylvain; Xu, Kaidong; Yu, HongYu; Kubicek, Stefan; Rohr, Erika; Schram, Tom; Veloso, Anabela; Conard, Thierry; Leunissen, Peter; Mertens, Paul (2007) -
Comparison of sub 1 nm TiN/HfO2 with Poly-Si/HfO2 gate stacks u sing scaled chemical oxide interfaces
Tsai, Wilman; Ragnarsson, Lars-Ake; Chen, P.J.; Onsia, Bart; Carter, Richard; Cartier, Eduard; Young, Edward; Green, Martin; Caymax, Matty; De Gendt, Stefan; Heyns, Marc (2003) -
From Piranha to Barracuda: mechanism of ozone and water vapor photoresistant strip in a wet bench
Riedel, T.; Wolke, K.; De Gendt, Stefan; Onsia, Bart (2001) -
High-k materials for advanced gate stack dielectrics: a comparison of ALCVD and MOCVD as deposition technologies
Caymax, Matty; Bender, Hugo; Brijs, Bert; Conard, Thierry; De Gendt, Stefan; Delabie, Annelies; Heyns, Marc; Onsia, Bart; Ragnarsson, Lars-Ake; Richard, Olivier; Vandervorst, Wilfried; Van Elshocht, Sven; Zhao, Chao; Maes, J.W.; Daté, L.; Pique, D.; Young, E.; Tsai, W.; Shimamoto, Y. (2003) -
Integration of high-k gate dielectrics - wet etch, cleaning and surface conditioning
De Gendt, Stefan; Beckx, Stephan; Caymax, Matty; Claes, Martine; Conard, Thierry; Delabie, Annelies; Deweerd, Wim; Kraus, Harald; Onsia, Bart; Paraschiv, Vasile; Puurunen, Riikka; Röhr, Erika; Snow, Jim; Tsai, Wilman; Van Doorne, Patrick; Van Elshocht, Sven; Vertommen, Johan; Witters, Thomas; Heyns, Marc (2003) -
Integration of high-K gate dielectrics - wet etch, cleaning and surface conditioning
De Gendt, Stefan; Beckx, Stephan; Caymax, Matty; Claes, Martine; Conard, Thierry; Delabie, Annelies; Deweerd, Wim; Hellin, David; Kraus, Harald; Onsia, Bart; Paraschiv, Vasile; Puurunen, Riikka; Rohr, Erika; Snow, Jim; Tsai, Wilman; Van Doorne, Patrick; Van Elshocht, Sven; Vertommen, Johan; Witters, Thomas; Heyns, Marc (2004) -
Introduction of high-k materials into wet processing, analysis and behavior
Onsia, Bart; Hellin, David; Claes, Martine; Maes, A.; De Gendt, Stefan; Heyns, Marc (2003) -
Low Vt Ni-FUSI CMOS technology using a DyO cap layer with either single or dual Ni-phases
Yu, HongYu; Chang, Shou-Zen; Veloso, Anabela; Lauwers, Anne; Adelmann, Christoph; Onsia, Bart; Van Elshocht, Sven; Singanamalla, Raghunath; Demand, Marc; Vos, Rita; Kauerauf, Thomas; Brus, Stephan; Shi, Xiaoping; Kubicek, Stefan; Vrancken, Christa; Mitsuhashi, Riichirou; Lehnen, Peer; Kittl, Jorge; Niwa, M.; Yin, K.M.; Hoffmann, Thomas; De Gendt, Stefan; Jurczak, Gosia; Absil, Philippe; Biesemans, Serge (2007) -
Metal deposition on Ge surfaces
Sioncke, Sonja; Onsia, Bart; Struys, K.; Rip, Jens; Vos, Rita; Meuris, Marc; Mertens, Paul; Theuwis, A. (2005) -
Metal gate technology using a Dy2O3 dielectric cap approach for multiple-VT in NMOS FinFETs
Ferain, Isabelle; Son, Nak Jin; Witters, Liesbeth; Collaert, Nadine; Onsia, Bart; Kaczer, Ben; Kauerauf, Thomas; Adelmann, Christoph; Richard, Olivier; Favia, Paola; Bender, Hugo; Vos, Rita; Van Elshocht, Sven; Lehnen, Peer; San Tamer, Kemal; De Meyer, Kristin; Biesemans, Serge; Jurczak, Gosia (2007) -
On the application of a thin ozone based wet chemical oxide as an interface for ALD high-k deposition
Onsia, Bart; Caymax, Matty; Conard, Thierry; De Gendt, Stefan; De Smedt, Frank; Delabie, Annelies; Gottschalk, C.; Green, M.; Heyns, Marc; Lin, S.; Mertens, Paul; Tsai, Wilman; Vinckier, Chris (2005) -
Performance comparison of sub 1nm sputtered TiN/HfO2 nMOS and pMOSFETs
Tsai, Wilman; Ragnarsson, Lars-Ake; Pantisano, Luigi; Chen, P.; Onsia, Bart; Schram, Tom; Cartier, E.; Kerber, Andreas; Young, Edward; Caymax, Matty; De Gendt, Stefan; Heyns, Marc (2003-12) -
Physical characterization of HfO2 deposited on Ge substrates by MOCVD
Van Elshocht, Sven; Brijs, Bert; Caymax, Matty; Conard, Thierry; De Gendt, Stefan; Kubicek, Stefan; Meuris, Marc; Onsia, Bart; Richard, Olivier; Teerlinck, Ivo; Van Steenbergen, Jan; Zhao, Chao; Heyns, Marc (2003) -
Physical characterization of HfO2 deposited on Ge substrates by MOCVD
Van Elshocht, Sven; Brijs, Bert; Caymax, Matty; Conard, Thierry; De Gendt, Stefan; Kubicek, Stefan; Meuris, Marc; Onsia, Bart; Richard, Olivier; Teerlinck, Ivo; Van Steenbergen, Jan; Zhao, Chao; Heyns, Marc (2004) -
Single chemistry cleaning solution for advanced wafer cleaning
Vos, Rita; Doll, O.; Fester, A.; Kolbesen, B. O.; Lux, Marcel; Kenis, Karine; Onsia, Bart; De Gendt, Stefan; Schellkes, E.; Hatcher, Z.; Mertens, Paul; Heyns, Marc (2001)