Browsing Conference contributions by imec author "c30f16620323628cf391d29809be5c5894e1ab9e"
Now showing items 1-20 of 33
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A million wafer, virtual fabrication approach to determine process capability requirements for an industry-standard 5nm BEOL two-level metal flow
Clark, William; Juncker, Aurelie; Paladugu, E.; Fried, David; Wilson, Chris; Pourtois, Geoffrey; Gallagher, Emily; de Jamblinne de Meux, Albert; Piumi, Daniele; Boemmels, Juergen; Tokei, Zsolt; Mocuta, Dan (2016) -
ABI tool performance confirmed by NXE3300 printing results
Jonckheere, Rik; Takagi, Noriaki; Watanabe, Hidehiro; Yamane, Takeshi; Van Den Heuvel, Dieter; Gallagher, Emily (2015-10) -
Assist features: placement, impact and relevance
Mochi, Iacopo; Philipsen, Vicky; Gallagher, Emily; Hendrickx, Eric; Lyakhova, Kateryna; Wittebrood, Friso; Schiffelers, Guido; Fliervoet, Timon; Wang, Shibing; Hsu, Stephen; Plachecki, Vince; Baron, Stan; Laenens, Bart (2016) -
Characterization of pellicle membranes by lab-based spectroscopic reflectance and transmittance measurements in the extreme ultraviolet
Bahrenberg, Lukas; Danylyuk, Serhiy; Brose, Sascha; Pollentier, Ivan; Timmermans, Marina; Gallagher, Emily; Stollenwerk, Jochen; Loosen, Peter (2017) -
CNT EUV pellicle tunability and performance in a scanner-like environment
Timmermans, Marina; Pollentier, Ivan; Korytov, Maxim; Nuytten, Thomas; Sergeant, Stefanie; Conard, Thierry; Meersschaut, Johan; Zhang, Yide; Dialameh, Masoud; Alaerts, Wilfried; Jazaeri, Ehsan; Spampinato, Valentina; Franquet, Alexis; Brems, Steven; Huyghebaert, Cedric; Gallagher, Emily (2021) -
CNT EUV pellicle:moving towards a full-size solution
Timmermans, Marina; Pollentier, Ivan; Lee, Jae Uk; Meersschaut, Johan; Richard, Olivier; Adelmann, Christoph; Huyghebaert, Cedric; Gallagher, Emily (2017) -
CNT pellicles: Imaging results of the first full-field EUV exposures
Bekaert, Joost; Gallagher, Emily; Jonckheere, Rik; Van Look, Lieve; Aubert, Remko; Klein, Alexander; Yegen, Gokay; Broman, Par; Felix, Nelson M.; Lio, Anna; Nair, Vineet Vijayakrishnan; Timmermans, Marina; Pollentier, Ivan; Hendrickx, Eric (2021) -
CNTs in the context of EUV pellicle history
Gallagher, Emily; Timmermans, Marina; Pollentier, Ivan; Lee, Jae Uk; Mariano Juste, Marina; Adelmann, Christoph; Huyghebaert, Cedric; Scholze, Frank; Laubis, Christian (2018) -
Co-optimizatin of RegC and TWINSCANTM corrections to improve the intra-field on-product overlay performance
Gorhad, Kujan; Sharon, Ofir; Dmitriev, Vladimir; Cohen, Avi; van Haren, Richard; Roelofs, Christian; Cekli, H.E.; Gallagher, Emily; Leray, Philippe; Beyer, Dirk; Trautsch, Thomas; Steinert, Steffen (2016) -
Correlation of actinic blank inspection and experimental phase defect printability study on NXE3x00 EUV scanner
Jonckheere, Rik; Van Den Heuvel, Dieter; Takagi, Noriaki; Watanabe, Hidehiro; Gallagher, Emily (2015) -
Defectivity evaluation of EUV reticles with etched multilayer image border by wafer printing analysis
Jonckheere, Rik; Verduijn, Erik; Watanabe, Genta; Fukugami, Norihito; Sakata, Yo; Kodera, Yutaka; Gallagher, Emily (2015-07) -
Enabling Non-Actinic EUV Mask Inspection using CNT Pellicle
Keshet, Mor; Gershon, Dor; Malul, Uriel; Blinder, Yaniv; Orr, Yonatan; Tam, Aviram; Santoro, Gaetano; Houchens, Kevin; Gallagher, Emily; Timmermans, Marina; Frommhold, Andreas; Lorusso, Gian (2021) -
EUV lithography and the materials that propel it forward
Gallagher, Emily; Hendrickx, Eric; Kim, Ryan Ryoung han; Leray, Philippe; Philipsen, Vicky; Pollentier, Ivan; Rincon Delgadillo, Paulina; Ronse, Kurt; Timmermans, Marina; De Simone, Danilo (2020) -
EUV lithography imaging using novel pellicle membranes
Pollentier, Ivan; Vanpaemel, Johannes; Lee, Jae Uk; Adelmann, Christoph; Zahedmanesh, Houman; Huyghebaert, Cedric; Gallagher, Emily (2016) -
EUV optical characterization of alternative membrane materials
Scholze, Frank; Laubis, Christian; Krumrey, Michael; Timmermans, Marina; Pollentier, Ivan; Gallagher, Emily (2017) -
EUV scanner printability evaluation of natural blank defects detected by actinic blank inspection
Takagi, Noriaki; Watanabe, Hidehiro; Van Den Heuvel, Dieter; Jonckheere, Rik; Gallagher, Emily (2015-07) -
EUV scattering from CNT pellicles: measurement and control
Pollentier, Ivan; Luettgenau, Bernhard; Brose, Sascha; Timmermans, Marina; Huyghebaert, Cedric; Brems, Steven; Gallagher, Emily (2021) -
EUVL is being inserted in HVM in 2019 : what are the mask related challenges remaining ?
Ronse, Kurt; Jonckheere, Rik; Gallagher, Emily; Philipsen, Vicky; Van Look, Lieve; Hendrickx, Eric; Kim, Ryan Ryoung han (2019) -
Evaluation of local CD and placement distribution on EUV mask and its impact on wafer
Vaenkatesan, Vidya; Van Adrichem, Paul; Kooiman, Marleen; Kubis, Michael; Van Look, Lieve; Frommhold, Andreas; Gallagher, Emily; Nam, DS; Mulkens, Jan; Finders, Jo; Rispens, Gijsbert (2019) -
Free-standing carbon nanotube films for extreme ultraviolet pellicle application
Timmermans, Marina; Pollentier, Ivan; Mariano, Marina; Korytov, Maxim; Liebens, Maarten; Schapmans, Elie; Huyghebaert, Cedric; Gallagher, Emily (2019)