Browsing Articles by imec author "41e9f400e7d745491346dcae57e502d389464fd2"
Now showing items 1-18 of 18
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Advanced cleaning for the growth of ultrathin gate oxide
Mertens, Paul; Bearda, Twan; Houssa, Michel; Loewenstein, Lee; Cornelissen, Ingrid; De Gendt, Stefan; Kenis, Karine; Teerlinck, Ivo; Vos, Rita; Meuris, Marc; Heyns, Marc (1999) -
Analysis of trace metals in thin silicon nitride films by total-reflection X-ray fluorescence
Vereecke, Guy; Arnauts, Sophia; Van Doorne, Patrick; Kenis, Karine; Onsia, Bart; Verstraeten, K.; Schaekers, Marc; Van Hoeymissen, Jan; Heyns, Marc (2001) -
Buried power rail integration with FinFETs for ultimate CMOS scaling
Gupta, Anshul; Varela Pedreira, Olalla; Arutchelvan, Goutham; Zahedmanesh, Houman; Devriendt, Katia; Hanssen, Frederik; Tao, Zheng; Ritzenthaler, Romain; Wang, Shouhua; Radisic, Dunja; Kenis, Karine; Teugels, Lieve; Sebaai, Farid; Lorant, Christophe; Jourdan, Nicolas; Chan, BT; Subramanian, Sujith; Schleicher, Filip; Hopf, Toby; Peter, Antony; Rassoul, Nouredine; Debruyn, Haroen; Demonie, Ingrid; Siew, Yong Kong; Chiarella, Thomas; Briggs, Basoene; Zhou, Daisy; Rosseel, Erik; De Keersgieter, An; Capogreco, Elena; Dentoni Litta, Eugenio; Boccardi, Guillaume; Baudot, Sylvain; Mannaert, Geert; Bontemps, Noemie; Sepulveda Marquez, Alfonso; Mertens, Sofie; Kim, Min-Soo; Dupuy, Emmanuel; Vandersmissen, Kevin; Paolillo, Sara; Cousserier, Joris; Yakimets, Dmitry; Lazzarino, Frederic; Chehab, Bilal; Favia, Paola; Drijbooms, Chris; Jaysankar, Manoj; Morin, Pierre; Altamirano Sanchez, Efrain; Mitard, Jerome; Wilson, Chris; Holsteyns, Frank; Boemmels, Juergen; Demuynck, Steven; Tokei, Zsolt; Horiguchi, Naoto (2020) -
Electrical characteristics of P-type bulk Si fin field-effect transistor using solid-source doping with 1-nm phosphosilicate glass
Kikuchi, Yoshiaki; Chiarella, Thomas; De Roest, David; Blanquart, Timothee; De Keersgieter, An; Kenis, Karine; Peter, Antony; Ong, Patrick; Van Besien, Els; Tao, Zheng; Kim, Min-Soo; Kubicek, Stefan; Chew, Soon Aik; Schram, Tom; Demuynck, Steven; Mocuta, Anda; Mocuta, Dan; Horiguchi, Naoto (2016) -
Evaluation of time-of-flight secondary ion mass spectrometry for metal contamination monitoring on Si wafer surfaces
De Witte, Hilde; De Gendt, Stefan; Douglas, M.; Conard, Thierry; Kenis, Karine; Mertens, Paul; Vandervorst, Wilfried; Gijbels, Renaat (2000) -
High velocity aerosol cleaning with organic solvents: particle removal and substrate damage
Andreas, Michael; Wostyn, Kurt; Wada, Masayuki; Janssens, Tom; Kenis, Karine; Bearda, Twan; Mertens, Paul (2009) -
Impact of iron contamination and roughness generated in ammonia hydrogen peroxide mixtures (SC1) on 5nm gate oxides
De Gendt, Stefan; Knotter, D. M.; Kenis, Karine; Mertens, Paul; Heyns, Marc (1998) -
Impact of organic contamination on thin gate oxide quality
De Gendt, Stefan; Knotter, D. M.; Kenis, Karine; Depas, Michel; Meuris, Marc; Mertens, Paul; Heyns, Marc (1998) -
Model-free measurement of lateral recess in gate-all-around transistors with micro hard-X-ray fluorescence
Bogdanowicz, Janusz; Oniki, Yusuke; Kenis, Karine; Puttarame Gowda, Pallavi; Mertens, Hans; Shamieh, Basel; Leon, Yonatan; Wormington, Matthew; Van der Meer, Juliette; Charley, Anne-Laure (2023) -
New bending mode in SAQP Si fins and its mitigation
Sepulveda Marquez, Alfonso; Hellin, David; Zhang, Liping; Kenis, Karine; Batuk, Dmitry; Baudot, Sylvain; Briggs, Basoene; Mountsier, Tom; Barla, Kathy; Morin, Pierre; Altamirano Sanchez, Efrain (2022) -
Optimized post-CMP and pre-Epi cleans to enable smooth and high quality epitaxial strained Ge growth on SiGe strain relaxed buffers
Loo, Roger; Souriau, Laurent; Ong, Patrick; Kenis, Karine; Rip, Jens (2012) -
Particle removal efficiency and damage analysis on silicon wafers after megasonic cleaning in solvents
Barbagini, Francesca; Halder, Sandip; Janssens, Tom; Kenis, Karine; Wostyn, Kurt; Bearda, Twan; Le, Quoc Toan; Leunissen, Peter; Mertens, Paul; Kim, Kyung Hyun; Andreas, Michael (2009) -
Seeing through the haze: process monitoring and qualification using comprehensive surface data
Holsteyns, Frank; Roels, J.; Le, Quoc Toan; Kenis, Karine; Mertens, Paul (2004) -
Smooth and high quality epitaxial strained Ge grown on siGe strain relaxed buffers with 70-80% Ge
Loo, Roger; Souriau, Laurent; Ong, Patrick; Kenis, Karine; Rip, Jens; Peter, Storck; Buschhardt, Thomas; Vorderwestner, Martin (2011) -
Surface passivation for Si solar cells: a combination of advanced surface cleaning and thermal atomic layer deposition of Al2O3
Vermang, Bart; Rothschild, Aude; Kenis, Karine; Wostyn, Kurt; Bearda, Twan; Racz, A.; Loozen, Xavier; Mertens, Paul; Poortmans, Jef; Mertens, Robert (2012) -
The IMEC Clean: implementation in advanced CMOS manufacturing
Meuris, Marc; Arnauts, Sophia; Cornelissen, Ingrid; Kenis, Karine; Lux, Marcel; De Gendt, Stefan; Mertens, Paul; Teerlinck, Ivo; Vos, Rita; Loewenstein, Lee; Heyns, Marc (2000) -
The improvement of subthreshold slope and trans-conductance of P-type bulk Si field-effect-transistors by solid-source doping
Kikuchi, Yoshiaki; Chiarella, Thomas; De Roest, David; Kenis, Karine; Ong, Patrick; Horiguchi, Naoto (2017) -
Use of surface haze for evaluation of photoresist residue removal efficiency
Halder, Sandip; Vos, Rita; Wada, Masayuki; Kenis, Karine; Bearda, Twan; Radovanovic, Sanda; Dighe, Prasanna; Leunissen, Peter; Mertens, Paul (2009)