Browsing by Author "Brijs, Bert"
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Publication 0.5 nm EOT low leakage ALD SrTiO3 on TiN MIM capacitors for DRAM applications
Proceedings paper2008, Technical Digest International Electron Devices Meeting - IEDM, 15/12/2008, p.929-632Publication A chemical role of refractory metal caps in Co silicidation: Evidence of SiO2 reduction by Ti cap
;Kondoh, Eiichi; ;Brijs, Bert ;Jin, S.; Journal article1999, J. Materials Research, (14) 11, p.4402-4408Publication A comparative study of copper drift diffusion in plasma deposited a-SiC : H and Silicon Nitride
Journal article2001, Microelectronic Engineering, (55) 1_4, p.329-335Publication A comparative study of copper drift diffusion in plasma deposited A-Sic:H and silicon nitride
Oral presentation2000, Materials for Advanced Metallization Conference - MAM; February 28 - March 1, 2000; Stresa, Italy.Publication A comparative study of the microstructure–dielectric properties of crystalline SrTiO3 ALD films obtained via seed layer approach
Journal article2011, Physica Status Solidi A, (208) 8, p.1920-1924Publication A fundamental multitechnique of SIMS depth profiling
Proceedings paper1994, Quantitative Surface Analysis Conference - QSA. 8th International Conference, 23/08/1994, p.I10Publication A mathematical description of atomic layer deposition (ALD), and its application to the nucleation and growth of HfO2 gate dielectric layers
Oral presentation2002, MRS Fall Meeting Symposium N: Novel Materials and Processes for Advanced CMOSPublication A new compact eucentric goniometer for RBS, HFS, PIXE, and channeling
;Strathman, M.Brijs, BertOral presentation1998, 15th International Conference on the Application of Accelerators in Research and Industry; 4-7 November 1998; Denton, TX, USA.Publication A new compact eucentric goniometer for RBS, HFS, PIXE, and channeling
;Strathman, M. D.Brijs, BertProceedings paper1999, Applications of Accelerators in Research and Industry: Proceedings of the 15th International Conference, 4/11/1998, p.850-853Publication A study of growth mechanism of TiN and WCN barrier films deposited by atomic layer deposition on different substrates
Meeting abstract2002, B-ALD-5: The 5th Baltic Symposium on Atomic Layer Deposition, 24/10/2002, p.21Publication A theoretical and experimental study of atomic-layer-deposited films onto porous dielectric substrates
Journal article2005-10, Journal of Applied Physics, (98) 8, p.083515-1-083515-9Publication (A)thermal migration of Ge during junction formation in a-Si layers grown on thin SiGe-buffer layers
Proceedings paper2004, High-Mobility Group-IV Materials and Devices, 12/04/2004, p.273-279Publication (A)thermal migration of Ge during junction formation in s-Si grown on thin SiGe-buffer layers
Oral presentation2004, Silicon Front-End Junction Formation - Physics and TechnologyPublication Accurate determination of Si sputter yield in the transient region
Oral presentation1999, SIMS XII; 5-10 September 1999; Brussel, Belgium.Publication Advanced capabilities and applications of a sputter-RBS system
Oral presentation1998, 15th International Conference on the Application of Accelerators in Research and Industry; 4-7 November 1998; Denton, TX, USA.Publication Advanced capabilities and applications of a sputter-RBS system
Proceedings paper1999, Applications of Accelerators in Research and Industry: Proceedings of the 15th International Conference, 4/11/1998, p.586-591Publication Advanced characterization of high-K materials: a nuclear approach
Journal article2002, Nuclear Instruments & Methods in Physics Research B, 190, p.505-509Publication Advanced RBS analysis of thin films in micro-electronics
Oral presentation2000, 16th International Conference on the Application of Accelerators in Research and Industry - CAARI; 1-4 November 2000; Denton, TXPublication Advanced RBS analysis of thin films in micro-electronics
Proceedings paper2001, Application of Accelerators in Research and Industry: Sixteenth International Conference; Denton, TX, USA, 1-5 Nov 2000., p.470-475Publication ALCVD hafnium silicates for low power gate stacks
Oral presentation2004, Atomic Layer Deposition Conference