Browsing by Author "Chen, Jerry"
- Results Per Page
- Sort Options
Publication Compatibility of polysilicon with HfO2-based gate dielectrics for CMOS applications
Proceedings paper2003, ULSI Process Integration III, 28/04/2003, p.391-396Publication Effect of N2 annealing on AlxZryOz oxide
Oral presentation2002, AVS 49th International SymposiumPublication Effect of N2 annealing on AlZrO oxide
Journal article2003, Journal of Vacuum Science & Technology A, (21) 4, p.1482-1487Publication Effect of postdeposition anneal conditions on defect density of HfO2 layers measured by wet etching
Journal article2004, Journal of the Electrochemical Society, (151) 11, p.F269-F275Publication Growth and characterization of single and mixed metal oxides by ALCVD on various surfaces for high-k gate stack applications
Oral presentation2002, Atomic Layer Deposition Conference - ALDPublication Implementation of high-k gate dielectrics - a status update
Proceedings paper2003, Extended Abstracts of International Workshop on Gate Insulator - IWGI, 6/11/2003, p.10-14Publication Interface state passivation in conventional SiO2/HfO2 p-channel FETs
Oral presentation2003, Insulating Films on Semiconductors - INFOS. 13th Bi-Annual ConferencePublication Investigation of poly-Si/HfO2 gate stacks in a self-aligned 70nm MOS process flow
Proceedings paper2003, 33rd European Solid-State Devices Research Conference - ESSDERC, 16/09/2003, p.251-254Publication Issues, achievements and challenges towards integration of high-k dielectrics
Proceedings paper2002, Frontiers in Electronics. Future Chips. Proceedings of the 2002 Workshop, 6/01/2002, p.?-?Publication Performance improvement of self-aligned HfO2/TaN and SiON/TaN nMOS transistors
Journal article2005-03, Microelectronics Reliability, (45) 5_6, p.779-782Publication Physical characterisation of high-gate stacks
Oral presentation2002, MRS Fall Meeting Symposium N: Novel Materials and Processes for Advanced CMOSPublication Physical characterization of ultrathin high k dielectrics
Proceedings paper2003, 8th International Symposium on Plasma-and Process-Induced Damage, 24/04/2003, p.40-50Publication Scaling of Hf-based gate dielectrics - integration with polysilicon gates
; ; ; ; Meeting abstract2003, 204th Meeting of the Electrochemical Society: 2nd Int. Symp. on High Dielectric Constant Materials, 13/10/2003Publication Scaling of high-k dielectrics towards sub-1nm EOT
Proceedings paper2003, IEEE International Symposium on VLSI Technology, Systems, and Applications, 23/04/2003, p.251-254Publication Screening the high-k layer quality by means of open circuit potential analysis and wet chemical etching
Proceedings paper2003, Novel Materials and Processes for Advanced CMOS, 2/12/2002, p.15-20Publication The influence of defects on campatibility and yield of the HfO2-polysilicon gate stack for CMOS integration
Proceedings paper2003, Novel Materials and Processes for Advanced CMOS, 2/12/2002, p.335-340Publication Thermal stability and scalability of zr-aluminate-based high-k gate stacks