Browsing by Author "Menou, Nicolas"
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Publication 0.5 nm EOT low leakage ALD SrTiO3 on TiN MIM capacitors for DRAM applications
Proceedings paper2008, Technical Digest International Electron Devices Meeting - IEDM, 15/12/2008, p.929-632Publication ALD strontium titanates and their characterization
Oral presentation2010, International Workshop on Power Supply On ChipPublication Alternative high-k dielectrics for semiconductor applications
Journal article2009, Journal of Vacuum Science and Technology B, (27) 1, p.209-213Publication Alternative high-k dielectrics for semiconductor applications
Oral presentation2008, 15th Workshop on Dielectrics in Microelectronics - WODIMPublication Atomic layer deposition of hafnium titanates dielectric layers
Proceedings paper2008, 8th International Conference on Atomic Layer Deposition - ALD, 29/06/2008Publication Atomic layer deposition of strontium titanate films using Sr(tBu3Cp)2 and Ti(OMe)4
Journal article2010, Journal of the Electrochemical Society, (157) 1, p.G1-G6Publication Composition influence on the physical and electrical properties of SrxTi1-xOy-based MIM capacitors prepared by Atomic Layer Deposition using TiN bottom electrodes
Journal article2009, Journal of Applied Physics, (106) 9, p.94101Publication Comprehensive investigation of trap-assisted conduction in ultra-thin SrTiO3 layers
Journal article2009, Microelectronic Engineering, (86) 7_9, p.1815-1817Publication Crystallization study of thin ZrO2 ALD films on Al203 and on TiN for DRAM MIMCAP applications
;Pawlak, Malgorzata ;Menou, Nicolas ;Wang, Xin Peng ;Dilliway, G. ;Pierreux, D.Fischer, P.Oral presentation2008, MRS Spring Meeting Symposium H: Materials Science of High-k Dielectric StacksPublication Effect of deposition and anneal temperature on batch-ALD deposited ZrO2/Al2O3/ZrO2 films for DRAM MIM capacitor applications
;Dilliway, G. ;Pierreux, D. ;Fischer, P. ;Menou, Nicolas ;Pawlak, MalgorzataWang, Xin PengProceedings paper2008, 8th International Conference on Atomic Layer Deposition - ALD, 29/06/2008Publication Effect of the composition on the bandgap width of high-k MexTiyOz (Me=Hf,Ta, Sr)
Journal article2011, Thin Solid Films, (519) 17, p.5730-5733Publication Growth and layer characterization of SrTiO3 by atomic layer deposition using Sr(tBu3Cp)2 and Ti(OMe)4
Proceedings paper2009, CMOS Gate-Stack Scaling - Materials, Interfaces and Reliability Implications, 13/04/2009, p.1155-C08-03Publication Growth and material characterization of hafnium titanates deposited by atomic layer deposition
Journal article2009, Journal of the Electrochemical Society, (156) 10, p.G145-G151Publication High-k dielectrics and metal gates for future generation memory devices
;Kittl, Jorge; ; ;Menou, Nicolas; Wang, Xin PengMeeting abstract2009, 215th ECS Meeting, 24/05/2009, p.690Publication High-k dielectrics and metal gates for future generation memory devices
;Kittl, Jorge; ; ;Menou, Nicolas; Wang, Xin PengProceedings paper2009, Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-based CMOS. 5: New Materials, Processing, and Equipment, 24/05/2009, p.29-40Publication High-k dielectrics for future generation memory devices
;Kittl, Jorge; ; ;Menou, Nicolas; Wang, Xin PengJournal article2009, Microelectronic Engineering, (86) 7_9, p.1789-1795Publication Impact of thermal treatment upon morphology and crystallinity of strontium titanate films deposited by atomic layer deposition
Journal article2011, Journal of Vacuum Science and Technology B, (29) 1, p.01A304Publication Impact of thermal treatment upon morphology and crystallinity of strontium titanate films deposited by atomic layer deposition
Meeting abstract2010, 16th Workshop on Dielectrics in Microelectronics - WODIM, 28/06/2010Publication Integrated functional oxides in non-volatile memory devices
Meeting abstract2008, Workshop Oxydes Fontionnels pour l'Integration en Micro- et Nano-Electronique, 16/03/2008Publication Nano beam diffraction: crystal structure and strain analysis at the nano-scale
Meeting abstract2010, 218th ECS Meeting: High Purity Silicon 11, 10/10/2010, p.1572