Browsing by Author "Soltwisch, Victor"
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Publication Actinic characterization of EUV photomasks by EUV scatterometry
Proceedings paper2015, Lithography Workshop, 21/06/2015Publication Alternative materials for high numerical aperture extreme ultraviolet lithography mask stacks
Proceedings paper2015, Extreme Ultraviolet (EUV) Lithography VI, 22/02/2015, p.94220IPublication Characterization of Ru4-xTax (x = 1,2,3) alloy as material candidate for EUV low-n mask
Journal article2021, MICRO AND NANO ENGINEERING, 12, p.100089Publication Determination of optical constants of thin films in the EUV
Journal article2022, APPLIED OPTICS, (61) 8, p.2060-2078Publication Evaluation of Ta-Co alloys as novel high-k EUV mask absorber
Proceedings paper2022, Conference on Optical and EUV Nanolithography XXXV Part of SPIE Advanced Conference, APR 24-MAY 27, 2022, p.120510DPublication Evaluation of Ta-Co alloys as novel high-k extreme ultraviolet mask absorber
Journal article2023, JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, (22) 2, p.Art. 024403Publication High NA EUV lithography simulation using new calibrated mask model
Proceedings paper2019, 17th Fraunhofer IISB Lithography Simulation Workshop, 26/09/2019Publication Imaging impact of multilayer tuning in EUV masks, experimental validation
Proceedings paper2014, Photomask Technology 2014, BACUS, 16/09/2014, p.92350JPublication Improving EUV imaging at tighter pitch using a tuned-ML mask stack
Oral presentation2014, International Symposium on EUVLPublication Interface sharpness in stacked thin film structures: a comparison of soft X-ray reflectometry and transmission electron microscopy
Journal article2024, JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, (23) 4, p.Art. 041405Publication Mask absorber development to enable next-generation EUVL
; ; ; ; ; Detavernier, ChristopheProceedings paper2019, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology, 23/04/2019, p.111780FPublication Mask absorber for next generation EUV lithography
Proceedings paper2020, Conference on Extreme Ultraviolet Lithography, SEP 21-25, 2020Publication Nested Sampling aided determination of tantalum optical constants in the EUV spectral range
Journal article2022, APPLIED OPTICS, (61) 33, p.10032-10042Publication On the optical constants of cobalt in the M-absorption edge region
Journal article2023, OPTIK, (273) February, p.Art.: 170455Publication Optical constants for EUV scatterometry
Proceedings paper2021, Modeling Aspects in Optical Metrology VII, 21/06/2021, p.117830MPublication Precise optical constant determination in the soft X-ray, EUV, and VUV spectral range
Proceedings paper2023, Conference on Metrology, Inspection, and Process Control XXXVII, FEB 27-MAR 02, 2023, p.Art. 124963BPublication Precise optical constants: determination and impact on metrology, simulation and development of EUV masks
Publication Pushing the boundaries of EUV scatterometry: reconstruction of complex nanostructures for next-generation transistor technology
Proceedings paper2023, Conference on Metrology, Inspection, and Process Control XXXVII, FEB 27-MAR 02, 2023, p.Art. 124961MPublication Simulation of polychromatic effects in high NA EUV lithography
Publication Simultaneous Dimensional and Analytical Characterization of Ordered Nanostructures
Journal article2022, SMALL, (18) 6, p.2105776