Browsing by Author "Soltwisch, Victor"
- Results per page
- Sort Options
Publication Actinic characterization of EUV photomasks by EUV scatterometry
Proceedings paper2015, Lithography Workshop, 21/06/2015Publication Alternative materials for high numerical aperture extreme ultraviolet lithography mask stacks
Proceedings paper2015, Extreme Ultraviolet (EUV) Lithography VI, 22/02/2015, p.94220IPublication Characterization of Ru4-xTax (x = 1,2,3) alloy as material candidate for EUV low-n mask
Journal article2021, MICRO AND NANO ENGINEERING, 12, p.100089Publication Determination of optical constants of thin films in the EUV
Journal article2022, APPLIED OPTICS, (61) 8, p.2060-2078Publication Effect of Thickness on the Optical Constants Determination of TiN Thin Films in the EUV/VUV Range
Publication Evaluation of Ta-Co alloys as novel high-k EUV mask absorber
Proceedings paper2022, Conference on Optical and EUV Nanolithography XXXV Part of SPIE Advanced Conference, APR 24-MAY 27, 2022, p.120510DPublication Evaluation of Ta-Co alloys as novel high-k extreme ultraviolet mask absorber
Journal article2023, JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, (22) 2, p.Art. 024403Publication High NA EUV lithography simulation using new calibrated mask model
Proceedings paper2019, 17th Fraunhofer IISB Lithography Simulation Workshop, 26/09/2019Publication Imaging impact of multilayer tuning in EUV masks, experimental validation
Proceedings paper2014, Photomask Technology 2014, BACUS, 16/09/2014, p.92350JPublication Improving EUV imaging at tighter pitch using a tuned-ML mask stack
Oral presentation2014, International Symposium on EUVLPublication Interface sharpness in stacked thin film structures: a comparison of soft X-ray reflectometry and transmission electron microscopy
Journal article2024, JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, (23) 4, p.Art. 041405Publication Mask absorber development to enable next-generation EUVL
; ; ; ; ; Detavernier, ChristopheProceedings paper2019, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology, 23/04/2019, p.111780FPublication Mask absorber for next generation EUV lithography
Proceedings paper2020, Conference on Extreme Ultraviolet Lithography, SEP 21-25, 2020Publication Nested Sampling aided determination of tantalum optical constants in the EUV spectral range
Journal article2022, APPLIED OPTICS, (61) 33, p.10032-10042Publication On the optical constants of cobalt in the M-absorption edge region
Journal article2023, OPTIK, (273) February, p.Art.: 170455Publication Optical constants for EUV scatterometry
Proceedings paper2021, Modeling Aspects in Optical Metrology VII, 21/06/2021, p.117830MPublication Optical constants of Sc, V, Cr, Co, Ni, Nb, Mo, Rh, Pd, Hf, W, Re, Os, Ir, Pt, Au, and ZrO2 in the extreme ultraviolet range
Publication Optical constants of TiN, amorphous SiO2, and SiN in the extreme ultraviolet range
Journal article2024, Applied Optics, (63) 36, p.9210-9222Publication Precise optical characterization of SiGe thin films for next generation transistor metrology
Proceedings paper2025, 40th European Mask and Lithography Conference (EMLC), 2025-06-16, p.137870TPublication Precise optical constant determination in the soft X-ray, EUV, and VUV spectral range
Proceedings paper2023, Conference on Metrology, Inspection, and Process Control XXXVII, FEB 27-MAR 02, 2023, p.Art. 124963B