Browsing by Author "Van Den Heuvel, Dieter"

157-nm photoresist process optimization for a full-field scanner

157nm full field imaging

157nm resist process performance and integration challenges on a full field scanner

A new paradigm for in-line detection and control of patterning defects

A year of new mask defectivity insights in imec's EUVL program

ABI tool performance confirmed by NXE3300 printing results

Additional evidence of EUV blank defects first seen by wafer printing

Analysis of the effect of point-of-use filtration on microbridging defectivity

Capture probability of assembly defects in 14 nm half-pitch line/space DSA patterns

Characterization of EUV resists for defectivity at 32nm

Characterizing immersion lithography micro bridge defects using advanced features of teh SEMVision G3 STAR FIB

Closing the gap for EUV mask repair

Comparison between existing inspection techniques for EUV mask defects

Correlation of actinic blank inspection and experimental phase defect printability study on NXE3x00 EUV scanner

Damage review on gate stack test structures after high-velocity aerosol cleaning

Defect capture sensitivity in 14 nm half-pitch line/space DSA patterns

Defect mitigation and root cause studies in 14 nm half-pitch chemo-epitaxy directed self-assembly LiNe flow

Defect mitigation and root cause studies in imec's 14 nm half-pitch chemo-epitaxy DSA flow

Defect reduction and defect stability in imec's 14nm half pitch chemo-epitaxy DSA flow

Defect source analysis of directed self-assembly process