Browsing by Author "van den Berg, J.A."
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Publication A comparative X-ray photoelectron spectroscopy and medium-energy ion-scattering study of ultra-thin, Hf-based high-k films
Journal article2010-03, Surface and Interface Analysis, (2010) 42, p.1057-1060Publication Advanced front-end processes for the 45nm CMOS technology node
Oral presentation2004, E-MRS Spring Meeting Symposium B: Materials Science Issues in Advanced CMOS Source-Drain EngineeringPublication Comparison of electrical measurements with structural analysis of thin high-k hafnium-based films
;Hourdakis, E. ;Theodoropoulou, M. ;Nassiopoulou, A.G. ;Parisini, A.Reading, M.A.Proceedings paper2009, Analytical Techniques for Semiconductor Materials and Process Characterization 6 - ALTECH, 4/10/2009, p.363-372Publication Comparison of electrical measurements with structural analysis of thin high-k hafnium-based films
;Hourdakis, E. ;Theodoropoulou, M. ;Nassiopoulou, A.G. ;Parisini, A.Reading, M.A.Meeting abstract2009, 216th ECS Meeting, 4/10/2009, p.1995Publication Damage accumulation and dopant migration during shallow As and Sb implantation into Si
Journal article2004, Nuclear Instruments & Methods in Physics Research B, 216, p.67-74Publication High depth resolution characterization of the damage and annealing behaviour of ultrashallow As-implants in Si
Proceedings paper2002, Proceedings 14th International Conference on Ion Implantation Technology Conference, 22/09/2002, p.597-600Publication High depth resolution depth profile analysis of ultra thin high-k Hf based films using MEIS compared with XTEM, XRF, SE and XPS
;van den Berg, J.A. ;Reading, M.A. ;Parisini, A. ;Kolbe, M. ;Beckhoff, B. ;Ladas, S.Petrik, P.Meeting abstract2009, 216th ECS Meeting, 4/10/2009, p.1994Publication High depth resolution depth profile analysis of ultra thin high-k Hf based films using MEIS compared with XTEM, XRF, SE and XPS
;van den Berg, J.A. ;Reading, M. A. ;Parisini, A. ;Kolbe, M. ;Beckhoff, B. ;Ladas, S.Fried, M.Proceedings paper2009, Analytical Techniques for Semiconductor Materials and Process Characterization 6, 4/10/2009, p.349-361Publication High resolution, quantitative depth profiling analysis of nm thin hgh-k dielectriclayers using medium energy ion scattering (MEIS)
Proceedings paper2009, 19th Ion Beam Analysis Conference - IBA, 7/09/2009Publication Nanolayer characterisation by reference-free X-ray fluorescence analysis with synchrotron radiation
Meeting abstract2009, 216th ECS Meeting, 4/10/2009, p.1975Publication Physical characterization of the metal/high-k layer interaction upon annealing
Meeting abstract2008, 214th ECS Meeting, 12/10/2008, p.1965Publication Quantitative analysis of thin dielectrica with ultra high resolution ERD, MEIS and RBS
Meeting abstract2007, International Workshop on High-Resolution Depth Profiling, 17/06/2007Publication Recent developments in nuclear methods in support of semiconductor characterization
Proceedings paper2003, Analytical Techniques for Semiconductor Materials and Processes, 27/04/2003, p.50-62Publication Sub nanometer depth resolution profiling of the evolution and annealing of damage and the dopant redistribution of ultra-shallow As and Sb implants in Si
Meeting abstract2003, Ultra Shallow Junctions. 7th Int. Worksh. Fabrication, Characterization and Modeling of Ultra Shallow Doping Profiles in Semic., 27/04/2003, p.446Publication TiN/STO/TiN MIMcaps nanolayers on silicon characterized by SIMS and AFM
Meeting abstract2011, 18th International Conference on Secondary Ion Mass Spectrometry - SIMS XVIII, 18/09/2011Publication Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
Journal article2015, Microelectronic Engineering, 147, p.108-112