Browsing by author "Niwa, Masaaki"
Now showing items 1-20 of 25
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Achieving 9ps unloaded ring oscillator delay in FuSI/HfSiON with 0.8 nm EOT
Rothschild, Aude; Shi, Xiaoping; Everaert, Jean-Luc; Kerner, Christoph; Chiarella, Thomas; Hoffmann, Thomas; Vrancken, Christa; Shickova, Adelina; Yoshinao, H.; Mitsuhashi, Riichirou; Niwa, Masaaki; Lauwers, Anne; Veloso, Anabela; Kittl, Jorge; Absil, Philippe; Biesemans, Serge (2007) -
Achieving low VT Ni-FUSI CMOS via lanthanide incorporation in the gate stack
Veloso, Anabela; Yu, HongYu; Lauwers, Anne; Chang, Shou-Zen; Adelmann, Christoph; Onsia, Bart; Demand, Marc; Brus, Stephan; Vrancken, Christa; Singanamalla, Raghunath; Lehnen, Peer; Kittl, Jorge; Kauerauf, Thomas; Vos, Rita; O'Sullivan, Barry; Van Elshocht, Sven; Mitsuhashi, Riichirou; Whittemore, G.; Yin, K.M.; Niwa, Masaaki; Hoffmann, Thomas; Absil, Philippe; Jurczak, Gosia; Biesemans, Serge (2007-09) -
Achieving low-VT Ni-FUSI CMOS via Lanthanide incorporation in the gate stack
Veloso, Anabela; Yu, HongYu; Lauwers, Anne; Chang, Shou-Zen; Adelmann, Christoph; Onsia, Bart; Demand, Marc; Brus, Stephan; Vrancken, Christa; Singanamalla, Raghunath; Lehnen, Peer; Kittl, Jorge; Kauerauf, Thomas; Vos, Rita; O'Sullivan, Barry; Van Elshocht, Sven; Mitsuhashi, Riichirou; Whittemore, G.; Yin, K.M.; Niwa, Masaaki; Hoffmann, Thomas; Absil, Philippe; Jurczak, Gosia; Biesemans, Serge (2008) -
Addressing key concerns for implementation of Ni FUSI into manufacturing for 45/32 nm CMOS
Shickova, Adelina; Kauerauf, Thomas; Rothschild, Aude; Aoulaiche, Marc; Sahhaf, Sahar; Kaczer, Ben; Veloso, Anabela; Torregiani, Cristina; Pantisano, Luigi; Lauwers, Anne; Zahid, Mohammed; Rost, Tim; Tigelaar, H.; Pas, M.; Fretwell, J.; McCormack, J.; Hoffmann, Thomas; Kerner, Christoph; Chiarella, Thomas; Brus, Stephan; Harada, Yoshinao; Niwa, Masaaki; Kaushik, Vidya; Maes, Herman; Absil, Philippe; Groeseneken, Guido; Biesemans, Serge; Kittl, Jorge (2007) -
ALD deposition of high-k and metal gate stacks for advanced CMOS applications
Heyns, Marc; Beckx, Stephan; Caymax, Matty; Claes, Martine; De Gendt, Stefan; Degraeve, Robin; Delabie, Annelies; Deweerd, Wim; Groeseneken, Guido; Hooker, Jacob; Houssa, Michel; Kwak, Dong Hwa; Lander, Rob; Lujan, Guilherme; Maes, Jan; Niwa, Masaaki; Pantisano, Luigi; Puurunen, R.; Ragnarsson, Lars-Ake; Rohr, Erika; Schram, Tom; Van Elshocht, Sven; Vandervorst, Wilfried (2004) -
Analysis of As, P diffusion and defect evolution during sub-millisecond non-melt laser annealing based on an atomistic kinetic Monte Carlo approach
Noda, Taiji; Vandervorst, Wilfried; Felch, S.; Parihar, V.; Cuperus, Aldert; Mcintosh, R.; Vrancken, Christa; Rosseel, Erik; Bender, Hugo; Van Daele, Benny; Niwa, Masaaki; Umimoto, H.; Schreutelkamp, Rob; Absil, Philippe; Jurczak, Gosia; De Meyer, Kristin; Biesemans, Serge; Hoffmann, Thomas Y. (2007) -
CMOS integration of dual work function phase controlled Ni FUSI with simultaneous integration of nMOS (NiSi) and pMOS (Ni-rich silicide) gates on HfSiON
Lauwers, Anne; Veloso, Anabela; Hoffmann, Thomas Y.; Van Dal, Mark; Vrancken, Christa; Brus, Stephan; Locorotondo, Sabrina; de Marneffe, Jean-Francois; Sijmus, Bram; Kubicek, Stefan; Chiarella, Thomas; Kmieciak, Malgorzata; Opsomer, Karl; Niwa, Masaaki; Mitsuhashi, Riichirou; Kottantharayil, Anil; Yu, HongYu; Demeurisse, Caroline; Verbeeck, Rita; de Potter de ten Broeck, Muriel; Absil, Philippe; Maex, Karen; Jurczak, Gosia; Biesemans, Serge; Kittl, Jorge (2005-12) -
Cost effective low Vt Ni-FUSI CMOS on SiON by means of Al implant (pMOS) and Yb+P implant (nMOS)
Lauwers, Anne; Veloso, Anabela; Chang, Shou-Zen; Yu, HongYu; Hoffmann, Thomas Y.; Kerner, Christoph; Demand, Marc; Rothschild, Aude; Niwa, Masaaki; Satoru, Ito; Mitshashi, Riichirou; Ameen, Mike; Whittemore, Graham; Pawlak, Malgorzata; Vrancken, Christa; Demeurisse, Caroline; Mertens, Sofie; Vandervorst, Wilfried; Absil, Philippe; Biesemans, Serge; Kittl, Jorge (2008) -
Current status and addressing the challenges of Hf-based gate stack toward 45nm-LSTP application
Niwa, Masaaki; Mitsuhashi, Riichirou; Yamamoto, K.; Hayashi, S.; Harada, Yoshinao; Rothschild, Aude; Hoffmann, Thomas Y.; Kubicek, Stefan; De Gendt, Stefan; Heyns, Marc; Biesemans, Serge; Kubota, M. (2005-10) -
Defect profiling and the role of nitrogen in lanthanum oxide-capped high-k dielectrics for nMOS applications
O'Sullivan, Barry; Mitsuhashi, Riichirou; Okawa, Hiroshi; Sengoku, Naohisa; Schram, Tom; Groeseneken, Guido; Biesemans, Serge; Nakabayashi, Takashi; Ikeda, Atsushi; Niwa, Masaaki (2008-09) -
Demonstration of Ni fully GermanoSilicide as a pFET gate electrode candidate on HfSiON
Yu, HongYu; Singanamalla, Raghunath; Opsomer, Karl; Augendre, Emmanuel; Simoen, Eddy; Kittl, Jorge; Kubicek, Stefan; Severi, Simone; Shi, Xiaoping; Brus, Stephan; Zhao, Chao; de Marneffe, Jean-Francois; Locorotondo, Sabrina; Shamiryan, Denis; Van Dal, Mark; Veloso, Anabela; Lauwers, Anne; Niwa, Masaaki; Maex, Karen; De Meyer, Kristin; Absil, Philippe; Jurczak, Gosia; Biesemans, Serge (2005) -
High-k dielectrics integration prospects
Kubicek, Stefan; Van Elshocht, Sven; Delabie, Annelies; Yamamoto, Kazuhiko; Beckx, Stephan; Claes, Martine; Van Hoornick, Nausikaa; Kwak, Dong Hwa; Hyun, Sangjin; Rothschild, Aude; Veloso, Anabela; Kottantharayil, Anil; Lujan, Guilherme; Kittl, Jorge; Lauwers, Anne; Kaushik, Vidya; Niwa, Masaaki; De Gendt, Stefan; Heyns, Marc; Jurczak, Gosia; Biesemans, Serge (2005) -
Laser annealed junctions: process integration sequence optimization for advanced CMOS technologies
Hoffmann, Thomas Y.; Noda, Taiji; Felch, S.; Severi, Simone; Parihar, V.; Forstner, H.; Vrancken, Christa; de Potter de ten Broeck, Muriel; Van Daele, Benny; Bender, Hugo; Niwa, Masaaki; Schreutelkamp, Rob; Vandervorst, Wilfried; Biesemans, Serge; Absil, Philippe (2007) -
Ni-FUSI on high-k as a candidate for 65nm LSTP CMOS
Kubicek, Stefan; Veloso, Anabela; Kottantharayil, Anil; Hayashi, Shigenori; Yamamoto, Kazuhiko; Mitsuhashi, Riichirou; Kittl, Jorge; Lauwers, Anne; Horii, S.; Harada, Y.; Kubota, M.; Niwa, Masaaki; De Gendt, Stefan; Heyns, Marc; Jurczak, Gosia; Biesemans, Serge (2005-04) -
Optimization of HfSiON using a design of experiment (DOE) approach
Rothschild, Aude; Mitsuhashi, Riichirou; Kerner, Christoph; Shi, Xiaoping; Everaert, Jean-Luc; Date, Lucien; Conard, Thierry; Richard, Olivier; Vrancken, Evi; Verbeeck, Rita; Veloso, Anabela; Lauwers, Anne; de Potter de ten Broeck, Muriel; Debusschere, Ingrid; Jurczak, Gosia; Niwa, Masaaki; Absil, Philippe; Biesemans, Serge (2007) -
Oxygen-vacancy-induced Vt shift in La-containing devices
O'Sullivan, Barry; Mitsuhashi, Riichirou; Pourtois, Geoffrey; Chang, Vincent; Adelmann, Christoph; Schram, Tom; Ragnarsson, Lars-Ake; Van der Heyden, Nikolaas; Cho, Hag-Ju; Harada, Y.; Veloso, Anabela; O'Connor, Robert; Pantisano, Luigi; Yu, HongYu; Groeseneken, Guido; Absil, Philippe; Biesemans, Serge; Ikeda, Atsushi; Niwa, Masaaki (2007) -
Prospect of Hf-based gate dielectric by PVD with FUSI gate for LSTP application
Niwa, Masaaki; Mitsuhashi, Riichirou; Yamamoto, Kazuhiko; Hayashi, S.; Harada, Y.; Kubota, M.; Rothschild, Aude; Hoffmann, Thomas Y.; Kubicek, Stefan; De Gendt, Stefan; Heyns, Marc; Biesemans, Serge (2005) -
PVD-HfSiON gate dielectrics with Ni-FUSI electrode for 65nm LSTP application
Yamamoto, Kazuhiko; Kubicek, Stefan; Rothschild, Aude; Mitsuhashi, Riichirou; Deweerd, Wim; Veloso, Anabela; Jurczak, Gosia; Biesemans, Serge; De Gendt, Stefan; Wickramanayaka, S.; Hayashi, S.; Niwa, Masaaki (2005-06) -
Quantification of MOSFET device reliability with low-Vt lanthanum-incorporated high permittivity dielectrics
O'Sullivan, Barry; Aoulaiche, Marc; Cho, Moon Ju; Kauerauf, Thomas; Degraeve, Robin; Okawa, Hiroshi; Schram, Tom; Hoffmann, Thomas Y.; Groeseneken, Guido; Biesemans, Serge; Nakabayashi, Takashi; Ikeda, Atsushi; Niwa, Masaaki (2009) -
Reliability study of La2O3 capped HfSiON high-permittivity n-type metal-oxide-semiconductor field-effect transistor devices with tantalum-rich electrodes
O'Sullivan, Barry; Mitsuhashi, Riichirou; Pourtois, Geoffrey; Aoulaiche, Marc; Houssa, Michel; Van der Heyden, Nikolaas; Schram, Tom; Harada, Yoshinao; Groeseneken, Guido; Absil, Philippe; Biesemans, Serge; Nakabayashi, Takashi; Ikeda, Atsushi; Niwa, Masaaki (2008)