Browsing by author "Hellin, David"
Now showing items 1-20 of 52
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15nm half-pitch patterning: EUV + SELF-aligned double patterning
Versluijs, Janko; Souriau, Laurent; Hellin, David; Orain, Isabelle; Kimura, Yoshie; Kunnen, Eddy; Dekkers, Harold; Shi, Xiaoping; Albert, Johan; Wiaux, Vincent; Xu, Kaidong (2012) -
15nm HP patterning with EUV and SADP: key contributors for improvement of LWR, LER, and CDU
Xu, Kaidong; Souriau, Laurent; Hellin, David; Versluijs, Janko; Wong, Patrick; Vangoidsenhoven, Diziana; Vandenbroeck, Nadia; Dekkers, Harold; Shi, Xiaoping; Albert, Johan; Tan, Chi Lim; Vertommen, Johan; Coenegrachts, Bart; Orain, I.; Kimura, Y.; Wiaux, Vincent; Boullart, Werner (2013) -
15nm HP patterning with EUV lithography and SADP
Souriau, Laurent; Hellin, David; Kunnen, Eddy; Versluijs, Janko; Dekkers, Harold; Albert, Johan; Orain, Isabelle; Yoshie, Kimura; Xu, Kaidong; Vertommen, Johan; Wiaux, Vincent; Boullart, Werner (2012) -
A Ge matrix removal method for metallic contamination analysis on Ge wafers using TXRF
Hellin, David; Geens, Veerle; Teerlinck, Ivo; Rip, Jens; Theuwis, Antoon; De Gendt, Stefan; Vinckier, Chris (2004) -
A novel concept for contact etch residue removal
Vos, Ingrid; Hellin, David; Demuynck, Steven; Richard, Olivier; Conard, Thierry; Vertommen, Johan; Boullart, Werner (2007) -
Advanced wafer surface cleaning technology
Mertens, Paul; Vos, Rita; Vereecke, Guy; Arnauts, Sophia; Bearda, Twan; De Waele, Rita; Eitoku, Atsuro; Fyen, Wim; Geckiere, J.; Hellin, David; Holsteyns, Frank; Kesters, Els; Claes, Martine; Kenis, Karine; Kraus, Harald; Malhouitre, Stephane; Lee, Kuntack; Kocsis, Michael; Onsia, Bart; Garaud, Sylvain; Rip, Jens; Snow, Jim; Teerlinck, I.; Van Hoeymissen, Jan; Barbagini, Francesca; Xu, Kaidong; Paraschiv, Vasile; De Gendt, Stefan; Mannaert, Geert; Heyns, Marc (2004) -
Challenges and approaches in advanced Fin patterning
Zhang, Liping; Hellin, David; Altamirano Sanchez, Efrain (2019) -
Chlorine detection and quantification in ALCVD HfO2 high-k dielectric films using total reflection X-ray fluorescence spectrometry
Hellin, David; Delabie, Annelies; Puurunen, Riikka; Conard, Thierry; De Gendt, Stefan; Vinckier, Chris (2003) -
Determination of metallic contaminants on Ge wafers using direct- and droplet sandwich etch- total reflection X-ray fluorescence spectrometry
Hellin, David; Bearda, Twan; Zhao, Chao; Raskin, G.; Mertens, Paul; De Gendt, Stefan; Heyns, Marc; Vinckier, Chris (2003-12) -
Fin bending in dimensional scaling
Zhang, Liping; Hellin, David; Sepulveda Marquez, Alfonso; Altamirano Sanchez, Efrain; Lazzarino, Frederic; Morin, Pierre; Wang, Shouhua; Hopf, Toby; Kenis, Karine; Lorant, Christophe; Sebaai, Farid; Batuk, Dmitry; Briggs, Basoene; Mertens, Hans; Demuynck, Steven (2020) -
Gate double patterning strategies for 10nm node FinFET devices
Hody, Hubert; Paraschiv, Vasile; Hellin, David; Vandeweyer, Tom; Boccardi, Guillaume; Xu, Kaidong (2014) -
Germanium deep-submicron p-FET and n-FET devices, fabricated on germanium-on-insulator substrates
Meuris, Marc; De Jaeger, Brice; Van Steenbergen, Jan; Bonzom, Renaud; Caymax, Matty; Houssa, Michel; Kaczer, Ben; Leys, Frederik; Martens, Koen; Opsomer, Karl; Pourghaderi, Mohammad Ali; Satta, Alessandra; Simoen, Eddy; Terzieva, Valentina; Van Moorhem, Els; Winderickx, Gillis; Loo, Roger; Clarysse, Trudo; Conard, Thierry; Delabie, Annelies; Hellin, David; Janssens, Tom; Onsia, Bart; Sioncke, Sonja; Mertens, Paul; Snow, Jim; Van Elshocht, Sven; Vandervorst, Wilfried; Zimmerman, Paul; Brunco, David; Raskin, G.; Letertre, F.; Akatsu, T.; Billon, T.; Heyns, Marc (2007) -
Grazing incidence X-ray fluorescence spectrometry for compositional analysis of nanometer-thin high-k dielectric HfO2 layers
Hellin, David; Delabie, Annelies; Puurunen, Riikka; Beaven, Peter; Conard, Thierry; Brijs, Bert; De Gendt, Stefan; Vinckier, Chris (2005-07) -
H2S exposure of a (100)Ge surfaces: evidences for a (2x1) electrically passivated surface
Houssa, Michel; Nelis, Daniel; Hellin, David; Pourtois, Geoffrey; Conard, Thierry; Paredis, K.; Vanormelingen, Koen; Vantomme, Andre; Van Bael, Marlies; Mullens, J.; Caymax, Matty; Meuris, Marc; Heyns, Marc (2007) -
Hafnium oxide films by atomic layer deposition for high-k gate dielectric applications: analysis of the density of nanometer-thin films
Puurunen, Riikka; Delabie, Annelies; Van Elshocht, Sven; Caymax, Matty; Green, Martin; Brijs, Bert; Richard, Olivier; Bender, Hugo; Conard, Thierry; Hoflijk, Ilse; Vandervorst, Wilfried; Hellin, David; Vanhaeren, Danielle; Zhao, Chao; De Gendt, Stefan; Heyns, Marc (2005) -
Impact of direct CMP on surface and bulk properties of high porosity low-k materials
Heylen, Nancy; Sinapi, Fabrice; Travaly, Youssef; Vereecke, Guy; Baklanov, Mikhaïl; Carbonell, Laure; Van Hoeymissen, Jan; Hellin, David; Hernandez, Jose Luis (2007) -
Implementation of a system for metal contamination control based on classification criteria
Bearda, Twan; Catana, Gabriela; Hellin, David; Vos, Rita (2008) -
Integration of high-K gate dielectrics - wet etch, cleaning and surface conditioning
De Gendt, Stefan; Beckx, Stephan; Caymax, Matty; Claes, Martine; Conard, Thierry; Delabie, Annelies; Deweerd, Wim; Hellin, David; Kraus, Harald; Onsia, Bart; Paraschiv, Vasile; Puurunen, Riikka; Rohr, Erika; Snow, Jim; Tsai, Wilman; Van Doorne, Patrick; Van Elshocht, Sven; Vertommen, Johan; Witters, Thomas; Heyns, Marc (2004) -
Interplay between dry etch and wet clean in patterning La2O3/HfO2-containing high-k/metal gate stacks
Vos, Ingrid; Hellin, David; Vrancken, Christa; Geypen, Jef; Bender, Hugo; Vecchio, Emma; Paraschiv, Vasile; Vertommen, Johan; Boullart, Werner (2009) -
Interplay of plasma etch, strip and wet clean in patterning La2O3/HfO2-containing high-k metal gate stacks
Vos, Ingrid; Hellin, David; Boullart, Werner; Vertommen, Johan (2011)