Browsing by author "Luong, Vu"
Now showing items 1-20 of 20
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Advancing X-ray metrology for routine thin film analysis
Makhotkin, Igor; Fathabad, Zahra; Yakunin, Sergey; van de Kruijs, Robbert; Philipsen, Vicky; Luong, Vu; Bijkerk, Fred (2018) -
Alternative materials for high numerical aperture extreme ultraviolet lithography mask stacks
Wood, Obert; Raghunathan, Sudhar; Mangat, Pawitter; Philipsen, Vicky; Luong, Vu; Kearney, Patrick; Verduijn, Erik; Kumar, Aditya; Patil, Suraj; Laubis, Christian; Soltwisch, Victor; Scholze, Frank (2015) -
Assessing stability of metal tellurides as alternative photomask materials for extreme ultraviolet lithography
Luong, Vu; Philipsen, Vicky; Opsomer, Karl; Rip, Jens; Hendrickx, Eric; Heyns, Marc; Detavernier, Christophe; Laubis, Christian; Scholze, Frank (2019) -
Characterization and mitigation of 3D mask effects
Erdmann, Andreas; Xu, Dongbo; Evanschitzky, Peter; Philipsen, Vicky; Luong, Vu; Hendrickx, Eric (2017) -
Characterization and mitigation of 3D mask effects in EUV lithography
Erdmann, Andreas; Xu, Dongbo; Evanschitzky, Peter; Luong, Vu; Philipsen, Vicky; Hendrickx, Eric (2016) -
Characterization of optical material properties for alternative EUV mask absorber materials
Scholze, Frank; Laubis, Christian; Philipsen, Vicky; Luong, Vu; Edrisi, Arash; Van de Kruijs, Robbert (2016) -
Evaluation of optical material parameters for advanced absorbers on EUV masks
Scholze, Frank; Laubis, Christian; Philipsen, Vicky; Luong, Vu; Edrisi, Arash; van de Kruijs, Robbert (2016) -
Exploration of alternative absorber materials for EUV lithography: A simulation study
Erdmann, Andreas; Evanschitzky, Peter; Xu, Dongbo; Luong, Vu; Philipsen, Vicky; Hendrickx, Eric (2016) -
Improved Ru/Si multilayer reflective coatings for advanced extreme-ultraviolet lithography photomasks
Wood, Obert; Wong, Keith; Parks, Valentin; Kearney, Patrick; Meyer-Ilse, Julia; Luong, Vu; Philipsen, Vicky; Faheem, Mohammad; Liang, Yifan; Kumar, Ajay; Chen, Esther; Bennett, Corbin; Bianzhu, Fu; Gribelyuk, Michael; Zhao, Wayne; Mangat, Pawitter; van der Heide, Paul (2016) -
Integration and electrical evaluation of Epi-Si and Epi-SiGe channels for 3D NAND memory applications
Capogreco, Elena; Degraeve, Robin; Lisoni, Judit; Luong, Vu; Arreghini, Antonio; Toledano Luque, Maria; Hikavyy, Andriy; Numata, Toshinori; De Meyer, Kristin; Van den Bosch, Geert; Van Houdt, Jan (2015) -
Mask absorber development to enable next-generation EUVL
Philipsen, Vicky; Luong, Vu; Opsomer, Karl; Souriau, Laurent; Rip, Jens; Detavernier, Christophe; Erdmann, Andreas; Evanschitzky, Peter; Laubis, Christian; Hoenicke, Philipp; Soltwisch, Victor; Hendrickx, Eric (2019) -
Mitigating EUV mask 3D effects by alternative metal absorbers
Philipsen, Vicky; Luong, Vu; Hendrickx, Eric; Erdmann, Andreas; Dongbo, Xu; Evanschitzky, Peter; van de Kruijs, Robbert; Edrisi, Arash; Scholze, Frank; Laubis, Christian; Irmscher, Mathias; Naasz, Sandra (2016) -
Modeling EUV mask using alternative materials for mask 3D effect compensation
Luong, Vu; Philipsen, Vicky; Verduijn, Erik; Scholze, Frank; Hendrickx, Eric; Heyns, Marc; Wood, Obert (2015) -
Ni-Al alloys as alternative EUV mask absorber
Luong, Vu; Philipsen, Vicky; Hendrickx, Eric; Opsomer, Karl; Detavernier, Christophe; Laubis, Christian; Scholze, Frank; Heyns, Marc (2018) -
Novel EUV mask absorber evaluation in support of next-generation EUV imaging
Philipsen, Vicky; Luong, Vu; Opsomer, Karl; Detavernier, Christophe; Hendrickx, Eric; Erdmann, Andreas; Evanschitzky, Peter; van de Kruijs, Robbert; Heidarnia-Fathabad, Zahra; Scholze, Frank; Laubis, Christian (2018) -
NXE:3300 insertion for N7 : status and challenges
Philipsen, Vicky; Mochi, Iacopo; Van Look, Lieve; Lorusso, Gian; Luong, Vu; Hendrickx, Eric; Wittebrood, Friso; Schiffelers, Guido; van Setten, Eelco; Fliervoet, Timon; Dusa, Mircea (2015) -
Optimized EUV mask absorber stack for improved imaging by reducing roughness and crystallinity of alternative absorber materials
Luong, Vu; Philipsen, Vicky; Hendrickx, Eric; Scholze, Frank; van de Kruijs, Robbert; Edrisi, Arash; Wood, Obert; Heyns, Marc (2016) -
Reducing EUV mask 3D effects by alternative metal absorbers
Philipsen, Vicky; Luong, Vu; Souriau, Laurent; Erdmann, Andreas; Xu, Dongbo; Evanschitzky, Peter; Van de Kruijs, Robbert; Edrisi, Arash; Scholze, Frank; Laubis, Christian; Irmscher, Mathias; Naasz, Sandra; Reuter, Christian; Hendrickx, Eric (2017) -
Single element and metal alloy novel EUV mask absorbers for improved imaging
Philipsen, Vicky; Luong, Vu; Souriau, Laurent; Altamirano Sanchez, Efrain; Adelmann, Christoph; Hendrickx, Eric; Scholze, Frank; Laubis, Christian; Kruemberg, Jens; Reuter, Christian (2017) -
Statistical spectroscopy of switching traps in deeply scaled vertical poly-Si channel for 3D memories
Toledano Luque, Maria; Degraeve, Robin; Roussel, Philippe; Luong, Vu; Tang, Baojun; Lisoni, Judit; Tan, Chi Lim; Arreghini, Antonio; Van den Bosch, Geert; Groeseneken, Guido; Van Houdt, Jan (2013)