Browsing by author "Oniki, Yusuke"
Now showing items 21-40 of 40
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Isotropic etches for nanosheet device integration - Wet or dry?
Oniki, Yusuke; Kenis, Karine; Wostyn, Kurt; Altamirano Sanchez, Efrain; Holsteyns, Frank (2020) -
Isotropic Etches to Enable Forksheet FET Integration
Oniki, Yusuke; Mertens, Hans; Puttarame Gowda, Pallavi; Sebaai, Farid; Altamirano Sanchez, Efrain; Holsteyns, Frank; Horiguchi, Naoto (2021) -
Model-free measurement of lateral recess in gate-all-around transistors with micro hard-X-ray fluorescence
Bogdanowicz, Janusz; Oniki, Yusuke; Kenis, Karine; Puttarame Gowda, Pallavi; Mertens, Hans; Shamieh, Basel; Leon, Yonatan; Wormington, Matthew; Van der Meer, Juliette; Charley, Anne-Laure (2023) -
Nanosheet RMG: metal gate and interface dipole patterning
Oniki, Yusuke; Ragnarsson, Lars-Ake; Cott, Daire; Dekkers, Harold; Dentoni Litta, Eugenio; Altamirano Sanchez, Efrain; Holsteyns, Frank; Horiguchi, Naoto (2020) -
Novel forksheet device architecture as ultimate logic scaling device towards 2nm
Weckx, Pieter; Ryckaert, Julien; Dentoni Litta, Eugenio; Yakimets, Dmitry; Matagne, Philippe; Schuddinck, Pieter; Jang, Doyoung; Chehab, Bilal; Baert, Rogier; Gupta, Mohit; Oniki, Yusuke; Ragnarsson, Lars-Ake; Horiguchi, Naoto; Spessot, Alessio; Verkest, Diederik (2019) -
Optimization of post etch cobalt compatible clean by pH and oxidizer
Iino, H.; Ogawa, Y.; Masaoka, T.; Le, Quoc Toan; Kesters, Els; Rip, Jens; Oniki, Yusuke; Akanishi, Y.; Iwasaki, Akihisa; Holsteyns, Frank (2018) -
RMG patterning by digital wet etching of polycrystalline metal films
Oniki, Yusuke; Vereecke, Guy; Dentoni Litta, Eugenio; Ragnarsson, Lars-Ake; Dekkers, Harold; Schram, Tom; Holsteyns, Frank; Horiguchi, Naoto (2018) -
RMG wet process challenges and the patterning knobs towards N5 and beyond logic devices
Oniki, Yusuke; Ragnarsson, Lars-Ake; Vereecke, Guy; Sebaai, Farid; Dekkers, Harold; Dentoni Litta, Eugenio; Schram, Tom; Holsteyns, Frank; Horiguchi, Naoto (2018) -
Scaled FinFETs Connected by Using Both Wafer Sides for Routing via Buried Power Rails
Veloso, Anabela; Jourdain, Anne; Radisic, Dunja; Chen, Rongmei; Arutchelvan, Goutham; O'Sullivan, Barry; Arimura, Hiroaki; Stucchi, Michele; De Keersgieter, An; Hosseini, Maryam; Hopf, Toby; D'have, Koen; Wang, Shouhua; Dupuy, Emmanuel; Mannaert, Geert; Vandersmissen, Kevin; Iacovo, Serena; Marien, Philippe; Choudhury, Subhobroto; Schleicher, Filip; Sebaai, Farid; Oniki, Yusuke; Zhou, X.; Gupta, Anshul; Schram, Tom; Briggs, Basoene; Lorant, Christophe; Rosseel, Erik; Hikavyy, Andriy; Loo, Roger; Geypen, Jef; Batuk, Dmitry; Martinez Alanis, Gerardo Tadeo; Soulie, Jean-Philippe; Devriendt, Katia; Chan, BT; Demuynck, Steven; Hiblot, Gaspard; Van der Plas, Geert; Ryckaert, Julien; Beyer, Gerald; Dentoni Litta, Eugenio; Beyne, Eric; Horiguchi, Naoto (2022) -
Selective etches for gate-all-around (GAA) device integration: opportunities and challenges
Oniki, Yusuke; Altamirano Sanchez, Efrain; Holsteyns, Frank (2019) -
Selective etches for gate-all-around (GAA) device integration: opportunities and challenges
Oniki, Yusuke; Altamirano Sanchez, Efrain; Holsteyns, Frank (2019) -
Selective isotropic etching of Group IV semiconductors to enable gate all around device architectures
Kal, Subhadeep; Pereira, Cheryl; Oniki, Yusuke; Holsteyns, Frank; Smith, Jeffrey; Mosden, Aelan; Kumar, Kaushik; Biolsi, Peter; Hurd, Trace Q. (2018) -
Selective Si Etchant for Gate-All-Around Transistors with Si1-xGex Channel
Harada, Ken; Suzuki, Tatsunobu; Asano, Mari; Kakeshita, Kan; Puttarame Gowda, Pallavi; Oniki, Yusuke; Altamirano Sanchez, Efrain (2021) -
Si trim applications: benefits and challenges
Kal, Subhadeep; Oniki, Yusuke; Pereira, Cheryl; Holsteyns, Frank; Chanemougame, Daniel; Mosden, Aelan; Kumar, Kaushik; Biolsi, Peter; Hurd, Trace Q. (2019) -
Si1-xGex selective etchant for gate-all-around transistors
Harada, Ken; Suzuki, Tatsunobu; Kusano, Tomohiro; Takeshita, Kan; Oniki, Yusuke; Altamirano Sanchez, Efrain; Struyf, Herbert; Holsteyns, Frank (2021) -
Spectroscopy: A new route towards critical-dimension metrology of the cavity etch of nanosheet transistors
Bogdanowicz, Janusz; Oniki, Yusuke; Kenis, Karine; Muraki, Yusuke; Nuytten, Thomas; Sergeant, Stefanie; Franquet, Alexis; Spampinato, Valentina; Conard, Thierry; Hoflijk, Ilse; Meersschaut, Johan; Claessens, Niels; Moussa, Alain; Van Den Heuvel, Dieter; Hung, Joey; Koret, Roy; Charley, Anne-Laure; Leray, Philippe (2021) -
Study on La2O3 wet clean by pH controlled functional water
Ogawa, Yuichi; Hideaki, Iino; Fukui, Takeo; Oniki, Yusuke; Akanishi, Yuya; Altamirano Sanchez, Efrain; Holsteyns, Frank (2019) -
Study on La2O3 wet clean by pH controlled functional water
Ogawa, Yuichi; Iino, Hideaki; Fukui, Takeo; Oniki, Yusuke; Akanishi, Yuya; Altamirano Sanchez, Efrain; Holsteyns, Frank (2019) -
Two-level Semi-damascene interconnect with fully self-aligned Vias at MP18
Marti, Giulio; Pokhrel, Ankit; Murdoch, Gayle; Delie, Gilles; Gupta, Anshul; Marien, Philippe; Lesniewska, Alicja; Decoster, Stefan; Kundu, Souvik; Le, Quoc Toan; Oniki, Yusuke; Kenens, Bart; Hermans, Yannick; Park, Seongho; Tokei, Zsolt (2023) -
Wet process challenges for advanced logic device fabrication
Oniki, Yusuke (2019)