Browsing Articles by imec author "0910cd803a555ff37cbb3478b7a1e20fbc642fbb"
Now showing items 21-40 of 60
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Effect of UV irradiation on modification and subsequent wet removal of model and post-etch fluorocarbon residues
Le, Quoc Toan; de Marneffe, Jean-Francois; Conard, Thierry; Vaesen, Inge; Struyf, Herbert; Vereecke, Guy (2012) -
Enhancing interface doping in graphene-metal hybrid devices using H-2 plasma clean
Achra, Swati; Akimoto, Tomoki; de Marneffe, Jean-Francois; Sergeant, Stefanie; Wu, Xiangyu; Nuytten, Thomas; Brems, Steven; Asselberghs, Inge; Tokei, Zsolt; Ueno, Kazuyoshi; Heyns, Marc (2021) -
Etching of low-k materials for microelectronics applications by means of a N2/H2 plasma: Modeling and experimental investigation
Samara, Vladimir; Van Laer, Koen; Tinck, Stefan; de Marneffe, Jean-Francois; Bogaerts, Annemie (2013) -
Experimental and theoretical study of RF capacitevely-coupled plasma in the Ar/CF4/CF3I mixtures
Proshina, O.; Rakhimova, T.; Lopaev, D.; Samara, V.; Baklanov, Mikhaïl; de Marneffe, Jean-Francois (2015) -
High-throughput process chain for single electron transistor devices based on field-emission scanning probe lithography and Smart Nanoimprint technology
Lenk, Claudia; Krivoshapkina, Yana; Hofmann, Martin; Lenk, Steve; Tzvetan, Ivanov; Rangelow, Ivo; Ahmad, Ahmad; Reum, Alexander; Holz, M; Glinsner, Thomas; Eibelhuber, Martin; Treiblmayr, Dominik; Schamberger, Barbara; Chan, BT; El Otell, Ziad; de Marneffe, Jean-Francois (2019) -
Improved plasma resistance for porous low-k dielectrics by pore stuffing approach
Zhang, Liping; de Marneffe, Jean-Francois; Heyne, Markus; Naumov, Sergej; Sun, Yiting; Zotovich, Alexey; El Otell, Ziad; Vaida, Selim; De Gendt, Stefan; Baklanov, Mikhaïl (2015) -
Influence of porosity on electrical properties of low-k dielectrics irradiated with vacuum-ultraviolet radiation
Choudhury, F.A.; Nguyen, H.M.; Baklanov, M.R.; de Marneffe, Jean-Francois; Li, W.; Pei, D.; Benjamin, D.I.; Zheng, H.; King, S.W.; Lin, Y.H.; Fung, H.S.; Chen, C.C.; Nishi, Y.; Shohet, J.L. (2016) -
Integration of porous low-k dielectrics using post porosity pore protection
Zhang, Liping; de Marneffe, Jean-Francois; Verdonck, Patrick; Heylen, Nancy; Wen, Liang Gong; Wilson, Chris; Tokei, Zsolt; Boemmels, Juergen; De Gendt, Stefan; Baklanov, Mikhail (2016) -
Low damage cryogenic etching of porous organosilicate low-k materials using SF6/O2/SiF4
Zhang, Liping; Ljazouli, Rami; Lefaucheux, Philippe; Tillocher, Thomas; Dussart, Remi; Mankelevich, Yuri; de Marneffe, Jean-Francois; De Gendt, Stefan; Baklanov, Mikhaïl (2013) -
Low damage ultra-low-k patterning using a high boiling point organic (HBPO) combined with NF3
Chanson, Romain; Tahara, Shigeru; Vanstreels, Kris; de Marneffe, Jean-Francois (2018) -
Low-k a-SiCO:H films as diffusion barriers for advanced interconnects
Van Besien, Els; Singh, Arjun; Barbarin, Yohan; Verdonck, Patrick; Dekkers, Harold; Vanstreels, Kris; de Marneffe, Jean-Francois; Baklanov, Mikhaïl; Van Elshocht, Sven (2014) -
Low-k integration: Gas screening for cryogenic etching and damage mitigation
Chanson, Romain; Dussart, Remi; Tillocher, Thomas; Lefaucheux, Philippe; Dussarrat, Christian; de Marneffe, Jean-Francois (2019) -
Mechanisms for plasma cryogenic etching of porous materials
Zhang, Quan-Zi; Tinck, Stefan; de Marneffe, Jean-Francois; Zhang, Liping; Bogaerts, Annemie (2017) -
Mechanisms of hydrogen atom interactions with MoS2 monolayer
Voronina, Ekaterina; Mankelevitch, Yuri; Novikov, Lev; Rakhimova, Tatyana; Marinov, Daniil; de Marneffe, Jean-Francois (2020) -
Metal barrier induced damage in self-assembly based organosilica low-k dielectrics and its reduction by organic template residues
Krishtab, Mikhail; de Marneffe, Jean-Francois; Armini, Silvia; Meersschaut, Johan; Bender, Hugo; Wilson, Chris; De Gendt, Stefan (2019) -
Method for in-situ etch uniformity monitoring using plasma emission interferometry
Samara, Vladimir; de Marneffe, Jean-Francois; El Otell, Ziad; Economou, Demetre (2015) -
Mitigation of plasma-induced damage in porous low-k dielectrics by cryogenic precursor condensation
Zhang, Liping; de Marneffe, Jean-Francois; Leroy, Florian; Lefaucheux, Philippe; Tillocher, Thomas; Dussart, Remi; Maekawa, Kaoru; yatsuda, koichi; Dussarrat, Christian; Goodyear, Andy; Cooke, Mike; De Gendt, Stefan; Baklanov, Mikhaïl (2016) -
Modification of post-etch residues by UV for wet removal
Le, Quoc Toan; Drieskens, Frederik; Conard, Thierry; Lux, Marcel; de Marneffe, Jean-Francois; Struyf, Herbert; Vereecke, Guy (2012) -
Multilayer MoS2 growth by metal and metal oxide sulfurization
Heyne, Markus; Chiappe, Daniele; Meersschaut, Johan; Nuytten, Thomas; Conard, Thierry; Richard, Olivier; Bender, Hugo; Moussa, Alain; Huyghebaert, Cedric; Radu, Iuliana; Caymax, Matty; de Marneffe, Jean-Francois; Neyts, Erik C.; De Gendt, Stefan (2016-01) -
Novel Low Thermal Budget CMOS RMG: Performance and Reliability Benchmark Against Conventional High Thermal Budget Gate Stack Solutions
Franco, Jacopo; Arimura, Hiroaki; de Marneffe, Jean-Francois; Brus, Stephan; Ritzenthaler, Romain; Croes, Kristof; Kaczer, Ben; Horiguchi, Naoto (2023)